公开(公告)号：CN103969963A

公开(公告)日：2014-08-06

申请号：CN201310167352.1

申请日：2013-05-08

Applicant: 台湾积体电路制造股份有限公司

Inventor： 余振华 ,  包天一 ,  吕志伟 ,  许照荣 ,  林世杰 ,  林本坚

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/702 ,  H01J37/00 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/31789

Abstract: 图案生成器包括：具有平面镜的平面镜阵列板、设置在平面镜阵列板上方的至少一个电极板、设置在平面镜上方的小透镜、以及夹置在平面镜阵列板和电极板之间的至少一个绝缘层。电极板包括第一导电层和第二导电层。小透镜具有在电极板中形成的非竖直侧壁。图案生成器进一步包括夹置在两个电极板之间的至少一个绝缘体。非竖直侧壁可以是U形侧壁或L形侧壁。本发明还提供了用于光刻系统的图案生成器。

公开(公告)号：CN101946300A

公开(公告)日：2011-01-12

申请号：CN200980104780.1

申请日：2009-02-11

Applicant: 普度研究基金会

Inventor： 欧阳证 ,  积逊·哈珀 ,  尼古拉斯·查理珀 ,  罗伯特·库克斯

IPC: H01J49/00

CPC classification number: H01J37/32009 ,  H01J27/022 ,  H01J37/00 ,  H01J37/32348 ,  H01J49/02 ,  H01J49/105 ,  H01J49/142 ,  H01J2237/0044 ,  H05H1/24 ,  H05H1/2406 ,  H05H1/30 ,  H05H2001/2412 ,  H05H2001/2443 ,  H05H2240/10 ,  H05H2240/20 ,  Y10T436/145555 ,  Y10T436/147777 ,  Y10T436/173076 ,  Y10T436/203332 ,  Y10T436/24

Abstract: 本发明总体涉及用于解吸并电离样品材料中的至少一种分析物的低温等离子体探针及其使用方法。在一个实施方案中，本发明总体涉及一种低温等离子体探针，其包括：具有放电气体入口的外壳、探针针尖、两个电极、以及电介质阻挡层，其中所述两个电极被所述电介质阻挡层分隔开，并且其中由电源施加的电压形成低温等离子体，并且其中通过电场和/或放电气流将所述低温等离子体驱出放电区域。

公开(公告)号：CN101523592A

公开(公告)日：2009-09-02

申请号：CN200780036531.4

申请日：2007-09-13

Applicant: 朗姆研究公司

Inventor： 英岩艾伯特·王 ,  罗伯特·谢彼

IPC: H01L21/76

CPC classification number: H01J37/16 ,  H01J37/00 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32834

Abstract: 一种用于钝化和/或剥除形成在半导体基片上的光刻胶层的真空室。该室包括内部室体，其形成腔体以围绕该基片并且具有贯穿延伸至该腔体的多个气体通道以及一个或多个加热器以加热该内部室体。该内部室体可滑动地安装在外部室体上，其围绕该内部室的侧面，其间具有间隙。该装置还包括：排气单元，其运转以从该腔体泵出气体；室顶部，安装在该内部室体上以覆盖该内部室体的顶部表面，其间具有间隙，该室顶部具有开口，其与该气体通道流体连通；以及等离子源，其运转以将该气体激发为等离子态并且连接至该开口以与该腔体流体连通。

公开(公告)号：EP0011414B1

公开(公告)日：1983-07-20

申请号：EP79302391.2

申请日：1979-10-31

Applicant: Tetra Laval Holdings & Finance SA

Inventor： Cheever, Richard Norcross

IPC: A61L2/08 ,  H01J37/00

CPC classification number: H01J37/00 ,  A61L2/08

公开(公告)号：EP0054016A3

公开(公告)日：1983-06-22

申请号：EP82100887

申请日：1979-10-31

Applicant: Tetra Pak Développement SA

Inventor： Cheever, Richard Norcross

IPC: A61L02/08 ,  H01J33/00 ,  G21K05/02

CPC classification number: H01J37/00 ,  A61L2/08

Abstract: This disclosure is concerned with a process of and apparatus for producing relatively low energy electron beams through pulsed cold-cathode beam generation in a mode of operation involving an important intermediate region of a substantially linear depth-dose profile characteristic that reduces the sensitivity to possible voltage variations, and with improved triggering structures that significantly improve reliability and minimize erractic pulse genera- _ tion and missing pulses, thus particularly adapting the process and apparatus for such stringent applications as production-line steritization of surfaces, materials or workpieces passed by the apparatus.

公开(公告)号：EP0011414A1

公开(公告)日：1980-05-28

申请号：EP79302391.2

申请日：1979-10-31

Applicant: Tetra Laval Holdings & Finance SA

Inventor： Cheever, Richard Norcross

IPC: A61L2/08 ,  H01J37/00

CPC classification number: H01J37/00 ,  A61L2/08

Abstract: This disclosure is concerned with a process of and apparatus for producing relatively low energy electron beams through pulsed cold-cathode beam generation in a mode of operation involving an important intermediate region of a substantially linear depth-dose profile characteristic that reduces the sensitivity to possible voltage variations, and with improved triggering structures that significantly improve reliability and minimize erratic pulse generation and missing pulses, thus particularly adapting the process and apparatus for such stringent applications as production-line sterilization of surfaces, materials orworkpieces passed by the apparatus.

公开(公告)号：WO2017084811A1

公开(公告)日：2017-05-26

申请号：PCT/EP2016/074575

申请日：2016-10-13

Applicant: ARCAM AB

Inventor： FAGER, Mattias

IPC: H01J37/075 ,  H01J37/07 ,  B22F3/105 ,  B29C67/00

CPC classification number: B22F3/1055 ,  B22F3/1017 ,  B22F2003/1056 ,  B22F2003/1057 ,  B22F2998/10 ,  B22F2999/00 ,  B23K15/0086 ,  B23K15/02 ,  B29C64/153 ,  B29C64/393 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  H01J29/46 ,  H01J37/07 ,  H01J37/242 ,  H01J37/3178 ,  H01J2237/06308 ,  H01J2237/065 ,  Y02P10/295 ,  H01J37/00 ,  B22F2203/00

Abstract: The present invention relates to a method of forming a three- dimensional article through successively depositing individual layers of powder material that are fused together so as to form the article, comprising a method of operating a triode electron beam source including a cathode (102), a grid (104) and an anode (106) with the following steps: (a) setting an electron beam current, a cathode heating power, a grid potential Ug and a cathode potential Uc to predetermined start values; (b) reducing the cathode heating power and decreasing a Ug - Uc potential difference for mainintainig a predetermined electron beam current; (c) detecting an X-ray signal emanating from the electron beam source with at least one X-ray detector (190); (d) repeating said reducing and detecting steps until the detected X- ray signal is above a predetermined value; and (e) increasing the cathode heating power by a predetermined safety value above the heating power value which resulted in X-ray signals above said predetermined value. Thereby, the lowest acceptable cathode heating power without affacting the electron beam current is determined and thus the lifetime of the cathode element is prolonged.

Abstract translation: 本发明涉及一种通过连续沉积熔合在一起以形成制品的单独的粉末材料层来形成三维制品的方法，该方法包括操作三极电子束 其包括阴极（102），栅极（104）和阳极（106），其具有以下步骤：（a）将电子束电流，阴极加热功率，栅极电势Ug和阴极电势Uc设置为预定的开始 值; （b）降低阴极加热功率并降低用于保持预定电子束电流的Ug-Uc电位差; （c）用至少一个X射线检测器（190）检测从电子束源发出的X射线信号; （d）重复所述减少和检测步骤，直到检测到的X射线信号高于预定值; 和（e）将阴极加热功率增加高于导致X射线信号高于所述预定值的加热功率值的预定安全值。 因此，确定了最低可接受的阴极加热功率而不影响电子束电流，从而延长了阴极元件的寿命。

公开(公告)号：WO2014014641A1

公开(公告)日：2014-01-23

申请号：PCT/US2013/048835

申请日：2013-06-30

Applicant: TRIBOFILM RESEARCH, INC.

Inventor： THORNTON, Jackson ,  SAKHRANI, Vinay ,  TOMASINO, Charles ,  MINEO, Robert

IPC: H05H7/12

CPC classification number: C10M107/50 ,  A61M5/3129 ,  A61M5/31513 ,  A61M2005/3131 ,  C10M107/38 ,  C10M147/04 ,  C10M155/02 ,  C10M177/00 ,  C10M2213/0606 ,  C10M2229/0405 ,  C10M2229/0415 ,  C10N2230/06 ,  C10N2240/66 ,  C10N2280/00 ,  H01J37/00 ,  H01J37/321 ,  H01J37/32192 ,  H05H2001/466 ,  H05H2001/4667

Abstract: The present application is directed to methods and devices for altering material properties of lubricants and other cross-linkable compounds comprising organic or organometallic materials through exposure to energized gaseous species. The energized gaseous species may create reactive sites among lubricant molecules that may alter their material properties by cross-linking at least a portion of the lubricant molecules. The cross-linked lubricant may reduce the ability of the lubricant to migrate away when force is applied between lubricated sliding friction surfaces.

Abstract translation: 本申请涉及用于通过暴露于通电的气态物质来改变润滑剂和包括有机或有机金属材料的其它可交联化合物的材料性质的方法和装置。 激发的气态物质可以在润滑剂分子之间产生可能通过交联至少一部分润滑剂分子来改变其材料性质的反应性位点。 当在润滑的滑动摩擦表面之间施加力时，交联润滑剂可以降低润滑剂迁移的能力。

公开(公告)号：WO2008042091A1

公开(公告)日：2008-04-10

申请号：PCT/US2007/019886

申请日：2007-09-13

Applicant: LAM RESEARCH CORPORATION ,  WANG, Ing-Yann Albert ,  CHEBI, Robert

Inventor： WANG, Ing-Yann Albert ,  CHEBI, Robert

IPC: H01L21/76

CPC classification number: H01J37/16 ,  H01J37/00 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32834

Abstract: A vacuum chamber for passivation and/or stripping a photoresist layer formed on a semiconductor substrate. The chamber includes an internal chamber body that forms a cavity to surround the substrate and has a plurality of gas passages extending therethrough to the cavity and one or more heaters to heat the internal chamber body. The internal chamber body is slidably mounted on an external chamber body that surrounds a side of the internal chamber with a gap therebetween. The device also includes: an exhaust unit operative to pump the gas from the cavity; a chamber top mounted on the internal chamber body to cover a top surface of the internal chamber body with a gap therebetween and having an opening in fluid communication with the gas passages; and a plasma source operative to energize the gas into a plasma state and coupled to the opening for fluid communication with the cavity.

Abstract translation: 一种用于钝化和/或剥离形成在半导体衬底上的光致抗蚀剂层的真空室。 腔室包括一个内部腔体，它形成一个空腔以围绕衬底，并具有多个通过其延伸到空腔的气体通道和一个或多个加热器来加热内部腔体。 内部室主体可滑动地安装在外部室主体上，该外部室主体围绕内部腔室的一侧具有间隙。 该装置还包括：排气单元，用于从空腔泵送气体; 安装在内部室主体上的室顶部，以覆盖内部室主体的顶表面，其间具有间隙，并具有与气体通道流体连通的开口; 以及等离子体源，用于将气体激发成等离子体状态并且耦合到开口以与空腔流体连通。

公开(公告)号：EP3033613A4

公开(公告)日：2017-06-14

申请号：EP14835869

申请日：2014-08-08

Applicant: SWINBURNE UNIV OF TECH

Inventor： JUODKAZIS SAULIUS ,  GERVINSKAS GEDIMINAS ,  SENIUTINAS GEDIMINAS

IPC: G01N23/225 ,  B82Y40/00 ,  G03F7/20 ,  G21K1/00 ,  G21K5/00 ,  H01J37/26 ,  H01J37/28 ,  H01J37/30

CPC classification number: H01J37/265 ,  B82Y40/00 ,  G01N23/225 ,  G01N2223/073 ,  G01N2223/351 ,  G01N2223/611 ,  G21K5/00 ,  H01J37/00 ,  H01J37/263 ,  H01J37/28 ,  H01J37/3002 ,  H01J2237/004 ,  H01J2237/0047 ,  H01J2237/28

Abstract: An apparatus for imaging or fabrication using charged particles, the apparatus including: a charged particle source configured to generate a charged particle beam of ions or electrons; a sample holder mounted relative to the charged particle source to hold a sample in the charged particle beam for the imaging or fabrication; and an optical source system configured to generate an optical beam, wherein the optical source system is mounted relative to the sample holder to direct the optical beam onto the sample to modify an electric charge of the sample during the imaging or fabrication to improve spatial resolution of the imaging or fabrication.

Abstract translation: 一种使用带电粒子进行成像或制造的设备，所述设备包括：带电粒子源，其被配置为产生离子或电子的带电粒子束; 相对于带电粒子源安装的样品架，以将样品保持在带电粒子束中用于成像或制造; 以及配置成产生光束的光源系统，其中所述光源系统相对于所述样本保持器安装以将所述光束引导到所述样本上以在所述成像或制造期间修改所述样本的电荷以改善 成像或制造。