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公开(公告)号：KR100471190B1
公开(公告)日：2005-02-21
申请号：KR1020040083686
申请日：2004-10-19
Applicant: 삼성전자주식회사
IPC: H01L21/304
Abstract: 반도체기판의 세정/건조 공정에 사용되는 웨이퍼 가이드를 제공한다. 이 웨이퍼 가이드는 수평면과 평행한 지지판넬 및 상기 지지판넬의 일면에 부착된 적어도 3개의 평행한 수직판넬들을 구비한다. 상기 수직 판넬들의 각각은 수직한 바디판넬 및 상기 바디 판넬의 상부면으로부터 상부로 연장된 복수개의 돌출부들을 갖는다. 상기 돌출부들 사이의 갭 영역들은 웨이퍼들을 홀딩하는 슬롯들의 역할을 한다. 상기 돌출부들은 소수성 물질(hydrophobic material)로 이루어지고, 상기 수직한 바디 판넬은 친수성 물질(hydrophilic material)로 이루어진다.
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公开(公告)号：KR100456527B1
公开(公告)日：2004-11-09
申请号：KR1020010078159
申请日：2001-12-11
Applicant: 삼성전자주식회사
IPC: H01L21/304
CPC classification number: H01L21/67034
Abstract: A drying system for drying a semiconductor substrate is provided. The drying system includes: a chamber for housing a vapor distributor and a fluid bath, said fluid bath being disposed in a lower portion of the chamber and said distributor being disposed in an upper portion of the chamber for distributing vapor for drying the substrate; and a fluid flow system for supplying fluid flow into said fluid bath for cleaning and drying the substrate and for draining said fluid from the fluid bath, wherein the chamber includes a plurality of exhaust vents disposed at the upper portion for venting the vapor.
Abstract translation: 提供了用于干燥半导体衬底的干燥系统。 所述干燥系统包括：用于容纳蒸气分配器和流体浴的腔室，所述流体浴布置在所述腔室的下部中，并且所述分配器布置在所述腔室的上部中以分配用于干燥所述基底的蒸气; 以及流体流动系统，用于将流体流供应到所述流体浴中以用于清洁和干燥所述基体并用于从所述流体浴排出所述流体，其中所述室包括布置在所述上部用于排出所述蒸气的多个排气口。
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公开(公告)号：KR1020040093652A
公开(公告)日：2004-11-06
申请号：KR1020040083684
申请日：2004-10-19
Applicant: 삼성전자주식회사
IPC: H01L21/304
CPC classification number: H01L21/68785
Abstract: PURPOSE: A wafer guide used for cleaning/drying processes of a semiconductor substrate is provided to minimize contact surface between wafers by forming roundly a sidewall and a bottom of a guide slot. CONSTITUTION: A wafer guide includes a support panel and at least two vertical panels attached to one side of the support panel. Each vertical panel has a body part and a plurality of protrusions(5a,5b,5c) for defining a plurality of slots. Both sidewalls(5s) and a bottom of each slot have convex shaped profiles. A central panel is located between the two vertical panels.
Abstract translation: 目的：提供用于半导体衬底的清洁/干燥工艺的晶片引导件，以通过圆形地形成引导槽的侧壁和底部来最小化晶片之间的接触表面。 构成：晶片引导件包括支撑面板和至少两个连接到支撑面板一侧的垂直面板。 每个垂直面板具有用于限定多个槽的主体部分和多个突起（5a，5b，5c）。 两个侧壁（5s）和每个槽的底部具有凸形轮廓。 中央面板位于两个垂直面板之间。
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公开(公告)号：KR1020040091607A
公开(公告)日：2004-10-28
申请号：KR1020040083688
申请日：2004-10-19
Applicant: 삼성전자주식회사
IPC: H01L21/304
CPC classification number: H01L21/02057 , H01L21/02052
Abstract: PURPOSE: Wafer guides used in a process for cleaning and drying a semiconductor substrate are provided to improve drying efficiency of wafers by minimizing a contact area between a wafer guide and the wafers and by uniformly controlling the intervals between the wafers while using an auxiliary wafer guide broader than a main wafer guide or a wafer aligning unit. CONSTITUTION: The main wafer guide(10) holds semiconductor wafers(63). The auxiliary wafer guide(61) has a width greater than that of the main wafer guide. The auxiliary wafer guide includes an auxiliary supporter and a pair of parallel wafer supporters. The auxiliary supporter has a width greater than that of the main wafer guide. The pair of parallel wafer supporters additionally hold the semiconductor wafers, positioned on both edges of the auxiliary supporter, respectively.
Abstract translation: 目的：提供用于清洁和干燥半导体衬底的工艺中的晶片引导件，以通过使晶片引导件和晶片之间的接触面积最小化并且通过在使用辅助晶片引导件的同时均匀地控制晶片之间的间隔来提高晶片的干燥效率 比主晶片引导件或晶片对准单元宽。 构成：主晶片引导件（10）保持半导体晶片（63）。 辅助晶片引导件（61）的宽度大于主晶片引导件的宽度。 辅助晶片引导件包括辅助支撑件和一对平行晶片支撑件。 辅助支架的宽度大于主晶片导轨的宽度。 该对平行晶片支架分别保持位于辅助支架的两个边缘上的半导体晶片。
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公开(公告)号：KR1020030050098A
公开(公告)日：2003-06-25
申请号：KR1020010080490
申请日：2001-12-18
Applicant: 삼성전자주식회사
IPC: H05H1/00
Abstract: PURPOSE: A plasma measurement apparatus provided with an optical emission spectrometer is provided to detect the concentration of the plasma for each positions of the plasma chamber. CONSTITUTION: A plasma measurement apparatus provided with an optical emission spectrometer includes an optical transmission block(18) for converging the plasma light in the chamber and for transmitting the converged plasma light, a photoelectrical convert system(23) for converting the plasma light transmitted through the optical transmission block(18) into an electrical signal and a processor(26) for analyzing the electrical signal converted at the photoelectrical convert system(23). The optical transmission block(18) is provided with a lens unit having a predetermined focal length, a collimator for making the light parallel after passing therethrough and an optical fiber for transmitting the collimated light passing through the collimator to the photoelectrical convert system(23).
Abstract translation: 目的：提供具有光发射光谱仪的等离子体测量装置，以检测等离子体室的每个位置的等离子体的浓度。 构成：具有光发射光谱仪的等离子体测量装置包括：光传输块（18），用于会聚等离子体光在腔室中并用于透射会聚的等离子体光;光电转换系统（23），用于转换透射的等离子体光 所述光传输块（18）变为电信号，以及用于分析在所述光电转换系统（23）处转换的电信号的处理器（26）。 光传输块（18）设置有具有预定焦距的透镜单元，用于使光通过后的光平行的准直仪和用于将通过准直仪的准直光传输到光电转换系统（23）的光纤， 。
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Patent Agency Ranking
公开(公告)号：KR1020030047511A
公开(公告)日：2003-06-18
申请号：KR1020010078159
申请日：2001-12-11
Applicant: 삼성전자주식회사
IPC: H01L21/304
CPC classification number: H01L21/67034
Abstract: PURPOSE: A drying equipment and method are provided to be capable of maximizing Marangoni effect by controlling the flow and exhaust of liquid using a gas distributor and a liquid flow system. CONSTITUTION: A chamber is provided with a hood(11) and a cover(13). A gas distributor(15) is installed in the upper portion of the chamber for drying semiconductor substrate(9) using gas. A liquid storing bath(3a) is installed in the lower portion of the chamber for cleaning the semiconductor substrates. A liquid flow system is connected with the liquid storing bath for flowing liquid into the liquid storing bath and exhausting the liquid from the liquid storing bath. The chamber further includes a plurality of exhaust ports(11a) located opposite to each other. Preferably, Marangoni drying principle is achieved by controlling the flow and exhaust of the liquid using the gas distributor and the liquid flow system. Preferably, the liquid flow system includes a flexible pipe(19).
Abstract translation: 目的：提供一种干燥设备和方法，以通过使用气体分配器和液体流动系统控制液体的流动和排出来最大化马兰戈尼尼效应。 构成：室具有罩（11）和罩（13）。 气体分配器（15）安装在用于使用气体干燥半导体衬底（9）的室的上部。 液体储存槽（3a）安装在用于清洁半导体衬底的室的下部。 液体流动系统与储液槽连接，用于将液体流入液体储存槽并从储液槽中排出液体。 所述室还包括彼此相对定位的多个排气口（11a）。 优选地，Marangoni干燥原理通过使用气体分配器和液体流动系统控制液体的流动和排出来实现。 优选地，液体流动系统包括柔性管（19）。
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公开(公告)号：KR1020120026872A
公开(公告)日：2012-03-20
申请号：KR1020100089047
申请日：2010-09-10
Applicant: 삼성전자주식회사
CPC classification number: H05H1/0031 , H05H1/2406 , H05H2001/2431 , H01L22/26 , H01L21/67253
Abstract: PURPOSE: A process monitoring device and a semiconductor process apparatus with the same, and a process monitoring method are provided to monitor a semiconductor manufacturing process regardless of pressure by extending the pressure range of the process monitoring device. CONSTITUTION: A housing(411) comprises an upper wall(411a), a bottom wall(411b), and a sidewall(411c). A plasma unit(420) generates plasma by ionizing a discharge gas. The plasma unit comprises a first electrode(422), a second electrode(424), and a power supply unit(426). The power supply unit applies the power to one of the first electrode and the second electrode. An optical emission spectrum unit(440) analyzes the light of the plasma generated from the plasma unit.
Abstract translation: 目的：提供一种过程监视装置及其半导体处理装置，以及处理监视方法，通过扩展处理监视装置的压力范围来监视半导体制造过程，不管压力如何。 构成：外壳（411）包括上壁（411a），底壁（411b）和侧壁（411c）。 等离子体单元（420）通过电离放电气体来产生等离子体。 等离子体单元包括第一电极（422），第二电极（424）和电源单元（426）。 电源单元向第一电极和第二电极之一施加电力。 光发射光谱单元（440）分析从等离子体单元产生的等离子体的光。
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公开(公告)号：KR1020110103723A
公开(公告)日：2011-09-21
申请号：KR1020100022927
申请日：2010-03-15
Applicant: 삼성전자주식회사
IPC: H01L21/66 , H01L21/3065
CPC classification number: G01J3/443 , H01J37/32834 , H01J37/32935 , H01J37/32972
Abstract: 공정 모니터링 장치와, 이를 이용한 공정 모니터링 방법이 제공된다. 공정 모니터링 장치는 유전체 장벽 방전(DBD) 방식을 이용하여 챔버의 배기 가스로부터 플라즈마를 발생하고, 플라즈마 방출 광의 분광 스펙트럼을 분석하여 챔버 내에서 진행되는 반도체 제조 공정을 모니터링한다.
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公开(公告)号：KR1020090061354A
公开(公告)日：2009-06-16
申请号：KR1020070128340
申请日：2007-12-11
Applicant: 삼성전자주식회사
IPC: H01L21/304
CPC classification number: C11D11/0047 , H01L21/02068
Abstract: A cleaning solution for removing impurity, a substrate cleaning method, and a manufacturing method of a semiconductor device using the same are provided to effectively remove impurity without damage to a conductive structure by using a cleaning solution including an etching accelerator. A cleaning solution for removing impurity of a semiconductor substrate is prepared, and includes hydroxide alkyl ammonium compound 0.5-5 weight%, fluoric compound 0.1-3 weight%, buffer agent 0.1-3 weight%, etching accelerator 0.5-5 weight%, and extra water(S110). The impurity is removed from the substrate by performing a cleaning process using the cleaning solution for removing the impurity about a semiconductor substrate in which a conductive structure having the impurity is formed(S120). The semiconductor substrate is rinsed(S130). The semiconductor substrate is dried(S140). The cleaning process of the substrate is performed in a single type cleaning device for 30-90 minutes.
Abstract translation: 提供一种用于除去杂质的清洁溶液，基板清洁方法和使用其的半导体器件的制造方法，以通过使用包括蚀刻加速器的清洁溶液来有效地去除杂质而不损坏导电结构。 制备用于除去半导体衬底的杂质的清洁溶液，并且包括0.5-5重量％的氢氧化烷基铵化合物，0.1-3重量％的氟化合物，0.1-3重量％的缓冲剂，0.5-5重量％的蚀刻加速剂和 额外的水（S110）。 通过使用清除溶液除去杂质，从而从形成有杂质的导电结构的半导体衬底的周围除去杂质（S120）来除去杂质。 漂洗半导体衬底（S130）。 将半导体基板干燥（S140）。 基板的清洗过程在单一型清洁装置中进行30-90分钟。
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公开(公告)号：KR100849634B1
公开(公告)日：2008-08-01
申请号：KR1020070014462
申请日：2007-02-12
Applicant: 삼성전자주식회사
IPC: G01N27/411 , G01N21/00 , G01N21/59 , B82Y20/00
Abstract: A method for detecting a metal concentration is provided to detect a concentration of metal contaminants contained in the air inside a space such as a clean room. A method for detecting a metal concentration comprises the steps of: dissolving a metal in the air in a solvent by extracting air from a space and supplying it to the solvent; irradiating light to mixed liquid prepared by mixing the solution containing the dissolved metal with a reagent chemically combined with the metal; and detecting the metal concentration by using a light absorption degree of the mixed liquid.
Abstract translation: 提供了用于检测金属浓度的方法，以检测包含在诸如洁净室的空间内的空气中的金属污染物的浓度。 检测金属浓度的方法包括以下步骤：通过从空间中提取空气并将其供给溶剂将金属溶解在空气中; 向通过将含有溶解金属的溶液与与金属化学结合的试剂混合而制备的混合液体照射光; 并通过使用混合液的光吸收度来检测金属浓度。
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