Abstract:
Provided is a method of fabricating a probe for a scanning probe microscope (SPM) having a field effect transistor (FET) channel structure utilizing a self-aligned fabrication. The provided method includes a first step of forming a first-shaped mask layer on a substrate and forming a source region and a drain region in regions of the substrate except for the mask layer; a second step of patterning a first-shaped photoresist in a perpendicular direction to the mask layer and performing an etching process to form a second-shaped mask layer; and a third step of etching the regions of the substrate except for the mask layer to form a probe. The provided method aligns the center of a tip with the center of a channel existing between the source region and the drain region to realize a tip having a size of tens of nanometers. Thus, a nano-device can be easily manufactured using the probe having the tip.
Abstract:
PURPOSE: A method for manufacturing a probe of a scanning probe microscope having a FET(Field Effect Transistor) channel structure using a self-alignment process is provided to be capable of aligning the center portion of a channel to the end portion of a tip by forming a predetermined source and drain at the end portion of the tip. CONSTITUTION: After forming stripe type mask layer(33g) on the surface of a semiconductor substrate(31), a source and drain region(32,34) are formed by implanting doped dopants and carrying out a heat treatment at the predetermined portion of the semiconductor substrate except the mask layer. After forming a stripe type photoresist layer across the mask layer, a rectangle type mask layer is formed by carrying out an etching process. Then, a probe is formed by selectively etching the resultant structure.
Abstract:
Disclosed are an optical bio sensor for measuring the concentration of bio substances based on optical phenomenon and an operation method thereof. The optical bio sensor according to an embodiment of the present invention comprises a bio sensing part for receiving first and second light signals generated by phase-modulated light signals, outputting a sensing signal by transmitting the first light signal through a first light path having a sensing resonator, and outputting a reference signal by transmitting the second light signal through a second light path having a reference resonator; a detection part receiving the sensing signal and the reference signal, detecting the phase components of the sensing signal and the reference signal through signal demodulating operation, and detecting the phase difference between the sensing signal and the reference signal according to the detected phase components; and a signal processing part for calculating the concentration of bio substances based on the detected phase difference.
Abstract:
The present invention relates to a method for sensing an image sensor including pixels individually connected to column lines and row lines. The method for sensing an image sensor includes a step of connecting a pair of the column lines among a plurality of the column lines by corresponding to switch signals and a step of sensing a first pixel signal determined according to a first signal and a second signal individually outputted from a first pixel and a second pixel connected to each column line.
Abstract:
A semiconductor device according to the present invention includes a plurality of banks; and a control unit which receives a command from an external device and controls the banks individually. Each bank includes a pixel array which includes a plurality of pixels; a row decoder which activates word lines connected to the pixels according to the control of the control unit; a column decoder which activates bit lines connected to the pixels according to the control of the control unit; a sensing amplifier and a writing driver which control the voltages of the activated bit lines; and an input and output buffer which outputs the data states of the pixels based on a change in the amplified voltage. The command includes at least one operation mode information on a bank among the banks. The operation mode information includes image sensor mode or memory mode information.
Abstract:
PURPOSE: A sensor, a data processing system having the same, and a method for operating the same are provided to make multiple color pixels and multiple deep pixels a single chip. CONSTITUTION: A pixel array deeply includes a depth pixel(Z) and a color pixel(R,G,B). The first signal line group includes the multiple signal lines for supplying multiple first control signals(RG,TG,SEL) for controlling the color pixel. The second signal line group includes the multiple signal lines for supplying multiple second signals(RG1,DG,TG1,SEL1) for controlling the depth pixel.
Abstract:
개시된 전기장 센서는 전기장 센서는, 최상층에 불순물이 고농도로 도핑된 저저항 반도체층이 마련된 기판과, 저저항 반도체층 위의 일부 영역에 위치되며 불순물이 저농도로 도핑된 고저항 반도체층과, 고저항 반도체층 위에 위치되는 도전층을 포함하여, 저저항 반도체층, 고저항 반도체층, 및 도전층을 통하여 흐르는 전류의 변화에 의하여 전기장의 변화를 검출한다.
Abstract:
Provided is an electric field information reading head for reading information from a surface electric charge of an information storage medium, the electric field information reading head comprising a semiconductor substrate having a resistance region formed in a central part at one end of a surface facing a recording medium, the resistance region being lightly doped with impurities, and source and drain regions formed on both sides of the resistance region, the source region and the drain region being more highly doped with impurities than the resistance region. The source region and the drain region extend along the surface of the semiconductor substrate facing the recording medium, and electrodes are connected electrically with the source region and the drain region respectively. In addition, provided is a method of fabricating the electric field information reading head and a method of mass-producing the electric field information reading head on a wafer.
Abstract:
A read/write head structure of an information storage device and a manufacturing method thereof are provided to form an external interconnection pad easily by installing a metal pad electrically connected to a read/write head. A method for manufacturing a read/write head structure of an information storage device comprises the steps of: patterning an etching mask on a silicon wafer; slantly etching the silicon wafer in the sectional direction through dry or wet process using the patterned etching mask; removing the etching mask; forming a read/write head(13) on the upper part of the silicon wafer; forming a metal pad(15) electrically connected with the read/write head on a slant surface(14); and splitting the read/write head by cutting the slant surface of the silicon wafer.