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公开(公告)号：JP2007011329A
公开(公告)日：2007-01-18
申请号：JP2006164126
申请日：2006-06-14
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
IPC: G03F7/20
CPC classification number: G03F7/70508 , G03F7/70291
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which data processing is more efficiently managed. SOLUTION: The lithographic apparatus includes a data path for converting a representation of a requested dose pattern to a sequence of control data suitable for controlling an array of individually controllable elements, wherein the data path comprises a plurality of data manipulation devices and a calculation load controller for balancing a calculation load between the data manipulation devices. The device manufacturing method is carried out by using elements of the lithographic apparatus. A flat panel display and an integrated circuit device are manufactured by using the above method. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供一种更有效地管理数据处理的光刻设备。 解决方案：光刻设备包括用于将请求的剂量图案的表示转换成适于控制单独可控元件的阵列的控制数据序列的数据路径，其中数据路径包括多个数据操纵装置和 计算负载控制器，用于平衡数据处理设备之间的计算负载。 器件制造方法通过使用光刻设备的元件进行。 通过使用上述方法制造平板显示器和集成电路器件。 版权所有（C）2007，JPO＆INPIT
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公开(公告)号：JP2006186371A
公开(公告)日：2006-07-13
申请号：JP2005373094
申请日：2005-12-26
Applicant: ASML NETHERLANDS BV
Inventor： BONTEKOE MARCEL , TINNEMANS PATRICIUS ALOYSIUS J , KESSELS LAMBERTUS G M , VAN HASSEL MARCO CORNELIS J M , MULCKHUYSE WOUTER FRANS WILLEM
IPC: H01L21/027 , G03F7/20
Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus more efficiently using a bandwidth available within a data path inside a maskless lithographic system, and also to provide a device manufacturing method. SOLUTION: The lithography apparatus includes: a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested dose pattern is built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times, and in which each localized exposure is produced by one of the sub-beams of radiation. The lithography apparatus also includes: a rasterizer device arranged to convert data; and also a data manipulation device arranged to constitute a control signal suitable for controlling the array of individually controllable elements. COPYRIGHT: (C)2006,JPO&NCIPI
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公开(公告)号：JP2006173620A
公开(公告)日：2006-06-29
申请号：JP2005360344
申请日：2005-12-14
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide equipment and method of reducing the pollution of immersion fluid in the lithographic equipment when confining the liquid in a liquid supply system using a lock out surface. SOLUTION: According to the invention, a lock out surface is maintained at a place far by a predetermined distance from a liquid supply system, collision between the lock out surface and the liquid supply system is eliminated, and liquid is still confined in order to avoid or reduce the pollution by a particle generated by the collision of the lock out surface and the liquid supply system. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract translation: 要解决的问题：提供在使用锁定表面将液体限制在液体供应系统中时减少平版印刷设备中的浸液的污染的设备和方法。 解决方案：根据本发明，锁定表面保持在远离液体供应系统的预定距离的位置，消除了锁定表面和液体供应系统之间的碰撞，并且液体仍然被限制在 以避免或减少由锁定表面和液体供应系统碰撞产生的颗粒的污染。 版权所有（C）2006，JPO＆NCIPI
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44.发明专利
公开(公告)号：JP2004343047A
公开(公告)日：2004-12-02
申请号：JP2004007053
申请日：2004-01-14
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： TINNEMANS PATRICIUS ALOYSIUS J
IPC: G03F7/20 , G03F9/00 , H01L21/027 , H01L21/67 , H01L21/68
CPC classification number: G03F7/707 , G03F7/7085
Abstract: PROBLEM TO BE SOLVED: To measure the electrostatic capacitance of a support structure with high accuracy. SOLUTION: The support structure includes an electrode 25, a cable 29 and a control device 37. The cable 29 has a first conductor 28 and a second conductor 26. The first conductor 28 is connected to an AC power source 33 which is connected to a DC power source 31 in series. The control device controls the DC power source 31 to apply a prescribed DC voltage on the electrode 25 to give holding power to an object, and applies on the electrode 25 a predetermined first AC voltage having a first amplitude and a first phase via a first conductor by controlling the first AC power source so as to detect the object by measuring the electrostatic capacitance. The detection assembly includes a second AC power source 35 connected to the second conductor, and the control device controls the second AC power source so as to apply on a second conductor a predetermined second AC voltage having a second amplitude and a second phase respectively equal to the first amplitude and the first phase. COPYRIGHT: (C)2005,JPO&NCIPI
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公开(公告)号：SG123689A1
公开(公告)日：2006-07-26
申请号：SG200507862
申请日：2005-12-06
Applicant: ASML NETHERLANDS BV
Inventor： BONTEKOE MARCEL , TINNEMANS PATRICIUS ALOYSIUS J , KESSELS LAMBERTUS GERARDUS MAR , HASSEL VAN MARCO CORNELIS JACO , MULCKHUYSE WOUTER FRANS WILLEM
Abstract: A lithography apparatus including a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested dose pattern is built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times and in which each localized exposure is produced by one of the sub-beams of radiation. The lithography apparatus also includes a rasterizer device arranged to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence ofpoints within the pattern, and also a data manipulation device arranged to receive the sequence of data and constitute a control signal suitable for controlling the array of individually controllable elements.
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Patent Agency Ranking
公开(公告)号：SG123687A1
公开(公告)日：2006-07-26
申请号：SG200507860
申请日：2005-12-06
Applicant: ASML NETHERLANDS BV
Abstract: The present invention relates to the method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system, the closing surface is maintained at a distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined.
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47.发明专利
公开(公告)号：SG123595A1
公开(公告)日：2006-07-26
申请号：SG200400116
申请日：2004-01-13
Applicant: ASML NETHERLANDS BV
Inventor： TINNEMANS PATRICIUS ALOYSIUS J
IPC: G03F7/00 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/67
Abstract: An assembly for capacitively detecting an object on a support structure includes at least one electrode being arranged in the vicinity of the support structure, and at least one cable being connected to the at least one electrode. The at least one cable has a first conductor and a second conductor. The first conductor is connected to a series connection of a DC source and a first AC source. A control device is arranged to control the DC source to provide a predetermined DC voltage to the at least one electrode to provide a clamping force on the object, and control the first AC source to provide a predetermined first AC voltage with a first amplitude and a first phase via the first conductor to the at least one electrode for capacitively detecting the object. The assembly includes a second AC source connected to the second conductor and the control device is arranged to control the second AC source to provide a predetermined second AC voltage to the second conductor. The second AC voltage has a second amplitude and a second phase, respectively, which are substantially equal to the first amplitude and first phase, respectively.
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公开(公告)号：SG121969A1
公开(公告)日：2006-05-26
申请号：SG200506523
申请日：2005-10-13
Applicant: ASML NETHERLANDS BV
Inventor： MERTENS JEROEN JOHANNES SOPHIA , DONDERS SJOERD NICOLAAS LAMBER , GRAAF DE ROELOF FREDERIK , HOOGENDAM CHRISTIAAN ALEXANDER , NET VAN DER ANTONIUS JOHANNES , TEUNISSEN FRANCISCUS JOHANNES , TINNEMANS PATRICIUS ALOYSIUS J , VERHAGEN MARTINUS CORNELIS MAR , VERSPAY JACOBUS JOHANNUS LEONA , GOMPEL VAN EDWIN AUGUSTINUS MA
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公开(公告)号：DE602005020893D1
公开(公告)日：2010-06-10
申请号：DE602005020893
申请日：2005-12-09
Applicant: ASML NETHERLANDS BV
IPC: G03F7/20
Abstract: The present invention relates to the method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system, the closing surface is maintained at a distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined.
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