中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

57 records (took 0.023 seconds)

    ELECTROPHOTOGRAPHIC RECORDING MATERIAL
    41.
    发明专利
    ELECTROPHOTOGRAPHIC RECORDING MATERIAL 未知

    公开(公告)号：DE3660409D1

    公开(公告)日：1988-08-25

    申请号：DE3660409

    申请日：1986-04-16

    Applicant: BASF AG

    Inventor： HOFFMANN GERHARD DR ,  LEYRER REINHOLD J DR ,  NEUMANN PETER DR

    IPC: G03G13/28 ,  G03G5/05 ,  G03G5/06 ,  G03G5/10 ,  G03G13/26

    Abstract: An electrophotographic recording material contains, as charge carrier-transporting compounds in the photoconductor layer, a mixture of one or more compounds of the formula (I) and one or more compounds of the formula (II) in a ratio of from 9:1 to 0.6:1, preferably from 2.3:1 to 0.8:1. In the formulae, R1 and R2 independently of one another are each alkyl, allyl, phenylalkyl or unsubstituted or substituted phenyl, R3 and R4 independently of one another are each hydrogen, alkyl, alkoxy or halogen, and R6, R7, R8 and R9 independently of one another are each alkyl, phenylalkyl or cyclohexyl. When the mixture of (I) and (II) is present in an appropriate concentration, the recording materials are highly photosensitive, although the problems usually encounted in the case of high concentrations of charge carrier-transporting compounds do not arise.

    45.
    发明专利
    未知

    公开(公告)号：DE3231145A1

    公开(公告)日：1984-02-23

    申请号：DE3231145

    申请日：1982-08-21

    Applicant: BASF AG

    Inventor： LEYRER REINHOLD J DR ,  SAENGER DIETRICH DR ,  KLINSMANN UWE DR

    IPC: G03F7/038 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38 ,  G03F7/10 ,  G03C1/71

    Abstract: Relief images or resist images are produced by a negative-working process, using a photosensitive resist layer which is applied on a base and contains a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups as well as a crosslinking compound possessing two or more reactive groups which are capable, under the action of heat, of reacting with carboxyl groups to form a covalent chemical bond. To produce the relief images or resist images, the photosensitive resist layer is first exposed imagewise to actinic light, the exposed areas of this layer are subjected to selective thermal hardening and crosslinking and the resist layer is then post-exposed uniformly to actinic light and finally washed out with an aqueous developer.

    PROCESS FOR THE PRODUCTION OF RESIST IMAGES AND DRY RESIST FILM FOR THIS PROCESS
    48.
    发明专利
    PROCESS FOR THE PRODUCTION OF RESIST IMAGES AND DRY RESIST FILM FOR THIS PROCESS 未知

    公开(公告)号：DE3473065D1

    公开(公告)日：1988-09-01

    申请号：DE3473065

    申请日：1984-11-22

    Applicant: BASF AG

    Inventor： LEYRER REINHOLD J DR ,  WEGNER GERHARD PROF DR ,  MUELLER MICHAEL

    IPC: G03F7/039 ,  G03F7/10

    Abstract: In the production of resist images by application of a radiation-sensitive positive-working resist layer based on degradable polymers onto a substrate, imagewise exposure of the resist layer to actinic radiation and removal of the irradiated parts of the layer with development of the resist image, the radiation-sensitive resist layer used is composed of poly(diacetylenes), in particular soluble ones. Preferably, the radiation-sensitive resist layer based on the poly(diacetylenes) contains sensitizers which can be activated by actinic radiation and which, after being activated, induce or accelerate molecular degradation of the poly(diacetylenes). Dry film resists comprise a temporary dimensionally stable base and a radiation-sensitive resist layer which is applied on the base, can be degraded by exposure to actinic radiation and is based on poly(diacetylenes), in particular soluble ones, with or without a cover sheet on top of the said resist layer.

Patent Agency Ranking