公开(公告)号：CA2079562C

公开(公告)日：1997-01-07

申请号：CA2079562

申请日：1992-09-30

Applicant: CANON KK

Inventor： KASUMI KAZUYUKI ,  ABE NAOTO ,  EBINUMA RYUICHI ,  HASEGAWA TAKAYUKI

IPC: G03F7/20 ,  H05G1/00 ,  H01L21/027

Abstract: An X-ray apparatus is disclosed which includes a mirror having a reflection surface, for expanding an X-ray beam in a predetermined direction, a detecting device for detecting a relative positional relationship between the X-ray beam and the reflection surface with respect to a direction perpendicular to the reflection surface, and an adjusting device for adjusting the relative position of the X-ray beam and the reflection surface on the basis of the detection. Also disclosed is an exposure apparatus and a semiconductor device manufacturing method using the Xray apparatus.

公开(公告)号：DE3855083D1

公开(公告)日：1996-04-11

申请号：DE3855083

申请日：1988-11-11

Applicant: CANON KK

Inventor： MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI ,  CHIBA YUJI

IPC: B41J2/165 ,  B41J29/17

Abstract: An ink jet recording apparatus comprising: a non-contact print mode in which medium to be recorded and conveyed to a region in which printing can be performed is subjected to be recording by discharging ink in a non-contact manner from a recording head (IJH) confronting the medium to be recorded at a predetermined interval; and a contact cleaning mode in which a cleaning sheet (CP) which has been conveyed into the region in which printing can be performed by using at least a part of a conveyance route for the medium to be recorded is brought into contact with the recording head (IJH) and then the cleaning sheet is discharged from the region in which printing can be performed.

公开(公告)号：DE68922798T2

公开(公告)日：1995-11-16

申请号：DE68922798

申请日：1989-07-31

Applicant: CANON KK

Inventor： IWAMOTO KAZUNORI ,  UZAWA SHUNICHI ,  KARIYA TAKAO ,  EBINUMA RYUICHI ,  CHIBA HIROSHI ,  OHKAWA SHINKICHI

IPC: G03F7/20 ,  G12B5/00

Abstract: A method of supporting or mounting a precision instrument for supporting a mask and a wafer in a vacuum container. It is particularly applicable to a SOR-X ray exposure apparatus wherein the mask and the wafer are disposed in a desired level of the reduced pressure, and exposure energy such as X-rays contained in synchrotron radiation is projected onto the wafer through the mask to print the pattern of the mask onto the wafer. In x-y-z coordinates with the x direction being vertical, the precision instrument in hung at at least two points which are spaced in the x direction, to the inside wall of the vacuum container. At one of the supporting points, the precision instrument is given latitude of x, y and z direction movement, and at the other supporting point, the precision instrument is fixed or is given a latitude only in the x direction. By this, when the vacuum container deforms by the difference between the internal and external pressures, the precision instrument can be supported correctly.

公开(公告)号：DE3851870D1

公开(公告)日：1994-11-24

申请号：DE3851870

申请日：1988-11-11

Applicant: CANON KK

Inventor： MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI ,  CHIBA YUJI

IPC: B41J2/165

Abstract: An ink jet recording apparatus comprising: a non-contact print mode in which medium to be recorded and conveyed to a region in which printing can be performed is subjected to be recording by discharging ink in a non-contact manner from a recording head (IJH) confronting the medium to be recorded at a predetermined interval; and a contact cleaning mode in which a cleaning sheet (CP) which has been conveyed into the region in which printing can be performed by using at least a part of a conveyance route for the medium to be recorded is brought into contact with the recording head (IJH) and then the cleaning sheet is discharged from the region in which printing can be performed.

公开(公告)号：CA2081642A1

公开(公告)日：1993-05-02

申请号：CA2081642

申请日：1992-10-28

Applicant: CANON KK

Inventor： EBINUMA RYUICHI

IPC: G21K5/04 ,  G03F7/20 ,  H01L21/027 ,  H01L21/70

Abstract: X-rays enter an airtight chamber (4) through a beam duct (15), pass through a transmission window (5), and expose a wafer (1) and mask (3) disposed outside the airtight chamber. The wafer and mask are held by a wafer chuck (2a) and a mask holder (6), respectively. The mask holder includes a pressure sensor (7), which detects variations in the atmospheric pressure. An output from the pressure sensor is converted into a change in the intensity of the x-rays by an arithmetic unit (17), and is transmitted to a control unit (19), which controls a driving unit (18) of a shutter (8). By thus controlling the moving speed of the shutter in accordance with variations in the atmospheric pressure, it is possible to prevent variations in the amount of x-ray exposure of the wafer.

公开(公告)号：FR2585289A1

公开(公告)日：1987-01-30

申请号：FR8610685

申请日：1986-07-23

Applicant: CANON KK

Inventor： ICHIHASHI HIROO ,  OZAWA MASAKAZU ,  EBINUMA RYUICHI ,  SAITO ATSUSHI

IPC: B41J2/165 ,  B41J2/175 ,  B41J3/04 ,  B41J29/00

Abstract: An ink jet recording apparatus has a recording head for discharging ink and effecting recording, a recording flow path communicating the recording head with one end of a first ink tank, a pump side flow path communicating the first ink tank with the recording head through a pump and, together with the recording flow path, constituting an ink circulation path through the head and the first ink tank, and a secnd ink tank for supplying ink to the first ink tank. Normally open electrical opening-closing means (FIG. 11) are provided in the recording flow path and in a tube for opening the first ink tank to atmosphere. Another normally open electrical opening-closing means and a check valve permitting the passage of ink from the pump only to the recording head, this latter opening-closing means and the check valve being interposed in series in the pump side flow path between the pump and the recording head. The apparatus also may include an overflow sensor (FIGS. 9 and 10) for detecting the amount of ink that has overflowed from the first ink tank and a water hammer damper (FIG. 14) that absorbs fluid shocks in the pump side flow path. The second ink tank may have excised portions (FIGS. 15, 16 and 18) to ensure that color ink tanks are properly mounted to the apparatus.

公开(公告)号：DE68929187D1

公开(公告)日：2000-04-27

申请号：DE68929187

申请日：1989-08-31

Applicant: CANON KK

Inventor： KUROSAWA HIROSHI ,  AMEMIYA MITSUAKI ,  TERASHIMA SHIGERU ,  UDA KOJI ,  SHIMODA ISAMU ,  UZAWA SHUNICHI ,  OZAWA KUNITAKA ,  HARA SHINICHI ,  KAWAKAMI EIGO ,  MIZUSAWA NOBUTOSHI ,  MORI MAKIKO ,  EBINUMA RYUICHI

IPC: G03F7/20

Abstract: An exposure apparatus usable with synchrotron radiation source (201) wherein the synchrotron radiation (202,204) is generated by electron injection (210) into a ring (201). The exposure apparatus is to transfer a semiconductor element pattern of a mask (208) onto a semiconductor wafer (209) by the synchrotron radiation. The apparatus includes a shutter (207) for controlling the exposure of the wafer (209). The shutter (207) controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined (206,211,216) in response to the electron injection (210), and thereafter, the illuminance distribution is corrected (216,215,213,207) in a predetermined manner. By this, the illuminance distribution data for controlling (213,215) the shutter (207) always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer (209) are exposed with high precision.

公开(公告)号：DE69032988D1

公开(公告)日：1999-04-15

申请号：DE69032988

申请日：1990-08-29

Applicant: CANON KK

Inventor： KUROSAWA HIROSHI ,  UDA KOJI ,  OZAWA KUNITAKA ,  UZAWA SHUNICHI ,  EBINUMA RYUICHI ,  KARIYA TAKAO

IPC: G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68 ,  H01L21/00

Abstract: An alignment system usable in an exposure apparatus for printing a pattern of a mask on a wafer, for aligning the mask and the wafer, is disclosed. The system includes a plurality of position detecting devices; a plurality of driving stages corresponding to the position detecting devices, respectively, each driving stage being adapted to move corresponding one of the position detecting devices two-dimensionally along a plane which is substantially opposed to the mask; a plurality of contacts corresponding to the position detecting devices, respectively, each contact being provided at an end portion of corresponding one of the position detecting devices, along the plane and facing to the pattern side; a detecting device for detecting mutual approach of the position detecting devices through at least one of contacts; and a control device for controlling movement of at least one of the driving stages in accordance with the detection by the detecting device.

公开(公告)号：DE69032861D1

公开(公告)日：1999-02-11

申请号：DE69032861

申请日：1990-03-07

Applicant: CANON KK

Inventor： MOCHIZUKI NORITAKA ,  EBINUMA RYUICHI

IPC: G03F7/20

Abstract: A reflecting device (2) includes a reflection surface for reflecting light from a predetermined direction; and a driving mechanism for moving the reflection surface without causing a change in a direction of reflection and a position (6,7) of reflection of the input light.

公开(公告)号：DE3752179T2

公开(公告)日：1998-08-20

申请号：DE3752179

申请日：1987-12-09

Applicant: CANON KK

Inventor： EBINUMA RYUICHI ,  MIZUSAWA NOBUTOSHI ,  CHIBA YUJI

IPC: B41J2/165 ,  B41J2/175 ,  B41J11/14 ,  B41J29/02 ,  B41J29/377 ,  G03G21/16 ,  H04N1/00