公开(公告)号：JPH03234979A

公开(公告)日：1991-10-18

申请号：JP2849490

申请日：1990-02-09

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  OZAWA KUNITAKA ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: F16K3/18 ,  H01L21/027

Abstract: PURPOSE:To eliminate a generation of dust by providing a partition wall furnishing an opening, a valve main body moving along the partition wall and opening and closing the opening, a driving means, and a pressing means to squeeze the valve main body to the partition wall side and to allow to project to and retreat from the valve main body side. CONSTITUTION:When a pressured air is led in to a piping 37, a pressing rod 33 moves to the right against a spring 34 so as to occupy a position retreating from a side wall 41, and when the pressured air is led in to a piping 38, the rod 33 moves to the left to occupy a projecting position. When a wafer is processed in a precess chamber 11, a valve main body 14 is made in the closing position by a cylinder 15, and when a pressing cylinder 26 is driven to project the rod 33, the rod 33 is inserted to a recess 42 of the valve main body 14, to press and contact the valve main body 14 to the side wall 41 (partition wall), a seal member 20 seals an opening 13, and the chamber 11 and a prelimenary chamber 12 are partitioned airtight. When the opening 13 is opened, the rod 33 is moved to the retreating position by the cylinder 26, then the valve main body 14 is made in the opening position, and then, the rod 33 is projected to press the valve main body 14.

公开(公告)号：JPH03135049A

公开(公告)日：1991-06-10

申请号：JP27304689

申请日：1989-10-19

Applicant: CANON KK

Inventor： MARUMO KOJI ,  TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  IWAMOTO KAZUNORI ,  MATSUI SHIN ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: B23Q3/08 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68 ,  H01L21/683

Abstract: PURPOSE:To realize a reliable delivery operation by a method wherein the following are installed on respective branched pipelines: opening and shutting valves which open and shut the pipelines and conductance-regulating valves which adjust a conductance of the pipelines. CONSTITUTION:First, a vacuum is produced by means of a vacuum pump 15, a valve 4 of an orientation-flat inspection chuck 1 is opened; a wafer is sucked. In order to attache the wafer to a hand chuck 2 in this state, a valve 5 in opened. At this time, a conductance is reduced and a fluid resistance is increased by using a fluid-regulating valve 8; a difference in a pressure is increased; as a result, an influx of a gas from the chuck 2 can be reduced, and the wafer can be held at the chuck 1. The chuck 2 is approached to the wafer from this state, and the wafer is sucked to the chuck 2. Then, a vacuum of the chuck 1 is released, and the wafer is sucked only to the chuck 2. Then, when the wafer which has been sucked to the chuck 2 is sucked to a wafer chuck 3, the operation if performed likewise.

公开(公告)号：JPH03135010A

公开(公告)日：1991-06-10

申请号：JP27187789

申请日：1989-10-20

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  UZAWA SHUNICHI ,  AMAMIYA MITSUAKI

IPC: G21K5/00 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To preponderantly control an essential part in an atmosphere of helium by a method wherein a supply port, a discharge port and a pressure detection port of helium are installed near an X-ray irradiation passage, from a light- shielding window to a wafer, through which X-rays are passed. CONSTITUTION:A wafer 15 is exposed, via a mask 13 in a stage-housing chamber 19, to X-rays from an X-ray source via a light-shielding window 6. The air inside the chamber 19 is replaced with helium of a required pressure; after that, helium is supplied to keep a purity of helium against a leak or the like of the air into a seal of the chamber 19; then, a pressure of the helium in an X-ray irradiation passage is controlled to be definite via a variable valve 10. A helium supply port 3, a helium discharge port 4 and a helium pressure inspection port 7 which are used to control the helium are installed near the X-ray irradiation passage from the window 6 to the wafer 15; an atmosphere of helium in an essential part is controlled preponderantly. Thereby, a high-accuracy exposure operation is executed. When a thin film is installed at the side of the X-ray source from the mask, it is possible to prevent a vibration of the mask by an air current of helium.

公开(公告)号：JPH03101216A

公开(公告)日：1991-04-26

申请号：JP23730089

申请日：1989-09-14

Applicant: CANON KK

Inventor： MATSUI SHIN ,  TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  UDA KOJI ,  UZAWA SHUNICHI

IPC: G21K5/00 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To maintain accuracy of the parts installed in a stage housing chamber with high accuracy and to suppress transmissivity fluctuation of X-rays by controlling differential pressure between the inside and the outside of a stage housing chamber by means of the inner pressure of the stage housing chamber for adjusting the exposure time according to the inner pressure. CONSTITUTION:Evacuation inside a stage housing chamber 1 is performed up to prescribed pressure while introducing helium until differential pressure between the inside of the stage housing chamber 1 and the open air becomes prescribed differential pressure followed by continuing supply of a fixed amount of helium while constantly detecting differential pressure by means of a differential pressure sensor 17 so that differential pressure inside and outside the stage chamber is not changed due to the fluctuation of atmospheric pressure in order to perform pressure adjustment so that the differential pressure may always be constant. When at this time, for instance, atmospheric pressure is fluctuated, an absolute pressure sensor 15 constantly detects the pressure inside the stage housing chamber 1 while feeding back this to a motor 8 driving a shutter 7 through a controller 18 to correct the switching time of the shutter, that is, the exposure amount for suppressing X-ray transmissivity fluctuation.

公开(公告)号：JP2002015989A

公开(公告)日：2002-01-18

申请号：JP2001112742

申请日：2001-04-11

Applicant: CANON KK

Inventor： FUJIOKA HIDEHIKO ,  HASEGAWA TAKAYUKI ,  TANAKA YUTAKA

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/304 ,  H01L21/677 ,  H01L21/68

Abstract: PROBLEM TO BE SOLVED: To suppress degradation of atmosphere within a chamber and also to suppress changes in position and attitude of a processing device which is built in the chamber. SOLUTION: The processing system comprises a processing device, a chamber which incorporates the processing device and keeps airtightness within it, a support means for supporting the chamber, a frame on which the processing device is placed, an air mount which is provided outside the chamber and supports the frame separately from the chamber, and an elastic airtightness keeping means which connects the frame to the chamber in airtightnessly. The air mount is provided outside the chamber to suppress degradation of atmosphere in the chamber, while the elastic airtightness keeping means is inserted to reduce the effects of deformation of the chamber on position and attitude of the processing device.

公开(公告)号：JP2001015432A

公开(公告)日：2001-01-19

申请号：JP2000185819

申请日：2000-06-21

Applicant: CANON KK

Inventor： FUJIOKA HIDEHIKO ,  HASEGAWA TAKAYUKI ,  TANAKA YUTAKA

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a treatment system which is provided with a plurality of chambers and capable of performing various kinds of treatments, such as high-accuracy exposure, thin-film formation, etc. SOLUTION: A treatment system is provided with a first chamber which incorporates a treatment device and can be maintained in an airtight state, a second chamber which is provided with a loading chamber 102a and an unloading chamber 102b, and a supplying/discharging system, which independently manages the atmospheres in the first and second chambers. The system is also provided with a transport robot which transports samples between the first and second chambers, an openable/closable gate valve provided between the first and second chambers, and a controller which introduces the next sample to the loading chamber and sets the sample in a waiting state, while a sample is treated by means of the treatment device incorporated in the first chamber by controlling the actions of the supplying/discharging system, transport robot, and gate valve.

公开(公告)号：JPH09275062A

公开(公告)日：1997-10-21

申请号：JP10480596

申请日：1996-04-03

Applicant: CANON KK

Inventor： MATSUI SHIN ,  CHIBA YUJI ,  TANAKA YUTAKA

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To suppress runout error or exposuring inequality by supporting an alignment measuring part which performs position adjusting measurement of a wafer and a mask, a position measuring means of a wafer stage part and the mask by a different supporting system from a stepper main body, even if each X-ray axis side and an aligner main unit slip out of positions. SOLUTION: An auto-alignment unit 139 is supported by an AA frame 143 and is provided on an AA tilt stage which can be driven to a rotating direction around an axis of two axes perpendicularly crossing an exposuring axis and on an AA stage 156 which can be transferred to the two-axis directions crossing exposureing light axis and to the rotating direction around the X-ray axis via an AA fixing member 157. A laser interference meter 148 which is a position measuring means for a wafer six-axis stage 142 is fixed with interference meter fixing member 158 which is expanding member of AA fixing member 157, a mask 123 is supported by a mask fastener and is composed of a different supporting system from an aligner main unit 109 used as a stepper.

公开(公告)号：JPH07142559A

公开(公告)日：1995-06-02

申请号：JP23237593

申请日：1993-08-25

Applicant: CANON KK

Inventor： CHIBA YUJI ,  MARUMO KOJI ,  MATSUI SHIN ,  HARA SHINICHI ,  MIZUSAWA NOBUTOSHI ,  IWAMOTO KAZUNORI ,  TANAKA YUTAKA ,  KUROSAWA HIROSHI

IPC: B23Q3/08 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683 ,  H01L21/68

Abstract: PURPOSE:To realize a substrate holder not only capable of ensuring sufficient suction force even in a decompression chamber but also capable of miniaturizing a mechanism rolling a substrate and an exposure device using the substrate holder. CONSTITUTION:A bearing 1b supported to a baseplate 1 rotatably supports a rotor 3 unified with a first suction plate 4, and the rotor 3 is rotated by a DC servomotor 7. A second suction plate 6 arranged outside the first suction plate 4 is supported to the baseplate 1 through a double acting cylinder 5. The second suction plate is retreated by the double acting cylinder 5, and the central section of a substrate is sucked onto the first suction plate 4. The positional displacement of the substrate is detected, the DC servomotor 7 is driven, the first suction plate 4 is turned, the positional displacement of the substrate is removed, the double acting cylinder 5 is driven, the second suction plate 6 is moved forward, and the outer circumferential section of the substrate is sucked.

公开(公告)号：JPH0587298A

公开(公告)日：1993-04-06

申请号：JP24973091

申请日：1991-09-27

Applicant: CANON KK

Inventor： FUJIOKA HIDEHIKO ,  TANAKA YUTAKA ,  CHIBA YUJI ,  SUDO YUJI

IPC: C23C14/00 ,  C23C16/44 ,  C23C16/455 ,  C30B25/14 ,  F17D1/02 ,  H01L21/027 ,  H01L21/205 ,  H01L21/22 ,  H01L21/265 ,  H01L21/302 ,  H01L21/304 ,  H01L21/3065 ,  H01L21/31 ,  H01L21/324

Abstract: PURPOSE:To provide gas supplying method/device in such a way that ultra-high purity gas can be supplied stably even after replacement of a gas cylinder. CONSTITUTION:Before ultra-high purity helium gas is supplied from a first gas cylinder 101 to a chamber 1 after the first gas cylinder 101 is replaced, a piping for connecting the first gas cylinder 101 to a three-way valve 9 is partitioned into two closed spaces by means of a first control valve 131, and the closed space on the first gas cylinder 101 side is exhausted to vacuum by means of a high-vacuum pump 16 and first and second oil-rotary pumps 151, 152. Next, a first control valve 131 is opened, so that ultra-high purity helium gas is supplied from the first gas cylinder 101 to the inside of the piping. After this, the inside of the piping is exhausted to vacuum by means of the high vacuum pump 16 and the first and second oil-rotary pumps 151, 152.

公开(公告)号：JPH0298120A

公开(公告)日：1990-04-10

申请号：JP24990288

申请日：1988-10-05

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  AMAMIYA MITSUAKI ,  KARIYA TAKUO ,  SHIMODA ISAMU

IPC: G21K5/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To make it possible to correct any decline in helium purity due to air leakage as well as to avoid the decline in X-ray transmittivity by a method where in a means to constantly feed a specified amount of helium is provided in a stage containing chamber. CONSTITUTION:An X-ray source containing chamber 3 is exhausted by a high vacuum pump 13 with a partition valve 7 closed and a bypass valve 26 opened. On the other hand, a stage containing chamber 5 is exhausted by a low vacuum pimp 14 down to the pressure not exceeding 0.029Torr. At thin time, the bypass valve 26 is closed to exhaust the X-ray source containing chamber 3 down to the final pressure not exceeding 10 Torr. Later, the stage containing chamber 5 is fed with helium in purity of 99.9999% up to internal pressure of 150Torr. Thereafter, the pressure inside the stage containing chamber 5 is kept at 150Torr avoiding the dispersion thereof by a controller 21 and a variable valve 22 to continue the feeding of specified amount of helium corresponding to any air leakage amount.