公开(公告)号：US20160020067A1

公开(公告)日：2016-01-21

申请号：US14799856

申请日：2015-07-15

Applicant: JEOL Ltd.

Inventor： Yorinobu Iwasawa

IPC: H01J37/244 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/22 ,  H01J37/28 ,  H01J2237/10 ,  H01J2237/2445

Abstract: A radiation analyzer includes a primary ray source that generates primary rays, an optical system applies the primary rays emitted from the primary ray source to a sample, an energy-dispersive radiation detector that detects radiation that has been generated from the sample when the primary rays have been applied to the sample, and a support that supports the radiation detector so that the tilt of the center axis (C) of the radiation detector with respect to the optical axis (Z) of the optical system can be changed.

Abstract translation: 辐射分析仪包括产生一次射线的一次射线源，一个光学系统将从一次射线源射出的一次射线施加到一个样本上，一个能量分散辐射探测器，用于检测从原始射线 已经被应用于样品，以及支撑体，其支撑放射线检测器，使得可以改变辐射检测器相对于光学系统的光轴（Z）的中心轴线（C）的倾斜。

公开(公告)号：US20150332888A1

公开(公告)日：2015-11-19

申请号：US14653138

申请日：2014-02-14

Applicant: LAWRENCE LIVERMORE NATIONAL SECURITY, LLC

Inventor： Bryan W. REED ,  William J. DEHOPE ,  Glenn HUETE ,  Thomas B. LAGRANGE ,  Richard M. SHUTTLESWORTH

IPC: H01J37/073 ,  H01J37/10 ,  H01J37/147 ,  H01J37/21

CPC classification number: H01J37/073 ,  H01J37/10 ,  H01J37/147 ,  H01J37/21 ,  H01J37/22 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/06333 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/2626 ,  H01J2237/2802

Abstract: An electron microscope is disclosed which has a laser-driven photocathode and an arbitrary waveform generator (AWG) laser system (“laser”). The laser produces a train of temporally-shaped laser pulses each being of a programmable pulse duration, and directs the laser pulses to the laser-driven photocathode to produce a train of electron pulses. An image sensor is used along with a deflector subsystem. The deflector subsystem is arranged downstream of the target but upstream of the image sensor, and has a plurality of plates. A control system having a digital sequencer controls the laser and a plurality of switching components, synchronized with the laser, to independently control excitation of each one of the deflector plates. This allows each electron pulse to be directed to a different portion of the image sensor, as well as to enable programmable pulse durations and programmable inter-pulse spacings.

Abstract translation: 公开了一种具有激光驱动光电阴极和任意波形发生器（AWG）激光系统（“激光”）的电子显微镜。 激光器产生一系列时间成形的激光脉冲，每个激光脉冲具有可编程脉冲持续时间，并将激光脉冲引导到激光驱动的光电阴极以产生一系列电子脉冲。 图像传感器与偏转器子系统一起使用。 偏转器子系统布置在目标的下游，但是在图像传感器的上游，并且具有多个板。 具有数字定序器的控制系统控制激光器和与激光器同步的多个开关部件，以独立地控制每个偏转板的激励。 这允许每个电子脉冲被引导到图像传感器的不同部分，以及使能可编程脉冲持续时间和可编程脉冲间隔。

公开(公告)号：US08507857B2

公开(公告)日：2013-08-13

申请号：US12653013

申请日：2009-12-07

Applicant: Keisuke Itou ,  Toshimichi Iwai

Inventor： Keisuke Itou ,  Toshimichi Iwai

IPC: G21K7/00

CPC classification number: H01J37/28 ,  G01B15/00 ,  H01J37/20 ,  H01J37/266 ,  H01J2237/0041 ,  H01J2237/10

Abstract: A charged particle beam inspection apparatus includes: an electron gun emitting an electron beam; first and second condenser lenses used to focus the electron beam; a beam control panel disposed between the first and second condenser lenses; and a control unit performing stabilizing processing in which excitation currents respectively supplied to the first condenser lens and the second condenser lens are set to have predetermined values, thereby the current amount of the electron beam passing through an opening of the beam control panel is regulated so that the electron beam to be emitted onto the sample has a larger current amount than that at a measurement, and then the electron beam is emitted onto the sample for a predetermined time period. After the stabilizing processing, the control unit sets the values of the excitation currents back to values for the measurement in order to measure dimensions of the sample, the excitation currents respectively supplied to the first and second condenser lenses.

Abstract translation: 带电粒子束检查装置包括：发射电子束的电子枪; 用于聚焦电子束的第一和第二聚光透镜; 设置在第一和第二聚光透镜之间的光束控制面板; 以及执行稳定处理的控制单元，其中分别提供给第一聚光透镜和第二聚光透镜的激励电流被设置为具有预定值，从而将通过光束控制面板的开口的电子束的电流量调节为 要发射到样品上的电子束具有比测量时更大的电流量，然后电子束在样品上发射预定时间段。 在稳定处理之后，控制单元将激励电流的值设置为测量值，以便测量样品的尺寸，分别提供给第一和第二聚光透镜的激励电流。

公开(公告)号：US5136167A

公开(公告)日：1992-08-04

申请号：US638241

申请日：1991-01-07

Applicant: Guenther O. Langner ,  Paul F. Petric

Inventor： Guenther O. Langner ,  Paul F. Petric

IPC: G03F7/20 ,  H01J37/147 ,  H01J37/30 ,  H01L21/027 ,  H01L21/30

CPC classification number: H01J37/1472 ,  H01J37/3007 ,  H01J2237/10 ,  H01J2237/3175

Abstract: A charged particle beam deflection system provides a three or more level charged particle beam deflection arrangement and is therefore capable of extremely high speed and positional accuracy. The system preferably employs a major/minor magnetic deflection arrangement as well as orthogonal electrostatic deflectors at a level of speed and positional accuracy and which minimizes the need for dynamic correction to achieve high linearity and positioning accuracy at extremely low aberration levels. The system can also be made relatively noise insensitive by providing one or more split deflectors which are also useful in providing increased speed and adjustment of radial and azimuthal telecentricity. The use of a transfer lens allows the cluster and subfield deflectors to be optimally placed to exploit different forms of LAD to obtain telecentricity at all levels of the deflection hierarchy. The use of such lens assisted deflection allows the electron optical system and drivers therefor to be minimized in number or enabled noise to be reduced and adjustments of telecentricity to be made without increase of complexity over the prior art. By employing the deflection arrangement of the present invention in electron beam lithography apparatus, the throughput of such apparatus can be greatly improved.

Abstract translation: 带电粒子束偏转系统提供三级或更多级带电粒子束偏转装置，因此能够极高的速度和位置精度。 该系统优选地采用主/次磁偏转装置以及正交静电偏转器，其速度和位置精度水平，并且最小化动态校正的需要，以在极低的像差水平下实现高线性度和定位精度。 还可以通过提供一个或多个分流偏转器使系统相对噪声不敏感，这也可用于提供增加的速度和径向和方位远心度的调节。 使用转移透镜允许群集和子场偏转器被最佳地放置以利用不同形式的LAD以在偏转层级的所有水平处获得远心。 使用这种透镜辅助偏转允许使电子光学系统和驱动器在数量上最小化，或者使得噪声降低，并且在不增加现有技术的复杂性的情况下进行远心度的调节。 通过在电子束光刻装置中采用本发明的偏转装置，可以大大提高这种装置的生产量。

公开(公告)号：US20230260748A1

公开(公告)日：2023-08-17

申请号：US18148761

申请日：2022-12-30

Applicant: NuFlare Technology, Inc.

Inventor： Kota IWASAKI

IPC: H01J37/317

CPC classification number: H01J37/3177 ,  H01J2237/0437 ,  H01J2237/31764 ,  H01J2237/10

Abstract: A multi-electron beam writing apparatus includes a light source array to include plural light sources and generate plural first lights, a multi-lens array to include plural first lenses, and to divide the plural first lights into plural second lights by that each of the plural first lights illuminates a corresponding lens set of plural lens sets each composed of plural second lenses being a portion of the plural first lenses and by that each of lenses, being at least a part of the plural second lenses, is irradiated with two or more first lights of the plural first lights, a photoemissive surface to receive the plural second lights through its upper surface, and emit multiple photoelectron beams from its back surface, and a blanking aperture array mechanism to perform an individual blanking control by individually switching between ON and OFF of each of the multiple photoelectron beams.

公开(公告)号：US20180166253A1

公开(公告)日：2018-06-14

申请号：US15837587

申请日：2017-12-11

Applicant: VG Systems Limited

Inventor： Zoran PESIC ,  Chris STEPHENS ,  Austin DAY ,  Bryan BARNARD

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/224 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/295 ,  H01J2237/024 ,  H01J2237/10 ,  H01J2237/2443 ,  H01J2237/24475 ,  H01J2237/2804 ,  H01J2237/2805

Abstract: The invention relates to an image capture assembly and method for use in an electron backscatter diffraction (EBSD) system. An image capture assembly comprises a scintillation screen (10) including a predefined screen region (11), an image sensor (20) comprising an array of photo sensors and a lens assembly (30). The image capture assembly is configured to operate in at least a first configuration or a second configuration. In the first configuration the lens assembly (30) projects the predefined region (11) of the scintillation screen (10) onto the array and in the second configuration the lens assembly (30) projects the predefined region (11) of the scintillation screen (10) onto a sub-region (21) of the array. In each of the first and second configurations the field of view of the lens assembly (30) is the same.

公开(公告)号：US20170011898A1

公开(公告)日：2017-01-12

申请号：US15150090

申请日：2016-05-09

Applicant: Kingstone Semiconductor Limited Company

Inventor： Jiong Chen ,  Junhua Hong ,  Jin Zhang ,  Jeff Boeker

IPC: H01J49/00 ,  H01J37/147 ,  H01J49/06 ,  H01J37/317

CPC classification number: H01J37/147 ,  H01J37/3007 ,  H01J37/3171 ,  H01J49/06 ,  H01J2237/10 ,  H01J2237/15

Abstract: A beam current transmission system and method are disclosed. The beam current transmission system comprises an extraction device, a mass analyzer, a divergent element, a collimation element and a speed change and turning element, wherein an analysis plane of the mass analyzer is perpendicular to a convergent plane of the extracted beam, and after entering an entrance, the beam is converged on a convergent point in a plane perpendicular to the analysis plane, and then is diverged from the convergent point and transmitted to the divergent element from an exit; the collimation element is used for parallelizing the beam in a transmission plane of the beam; and the speed change and turning element is used for enabling the beam to change speed so as to achieve a target energy while the beam is deflected so that the transmission direction of the beam changes by a first pre-set angle. Through the coordinated cooperation among a plurality of beam current optical elements, a relatively wider distribution can be formed in a vertical plane, so the invention is suitable to the processing of a wafer with a large size and also ensure better injection uniformity on the premise of avoiding energy contamination.

Abstract translation: 公开了一种射束电流传输系统和方法。 射束电流传输系统包括提取装置，质量分析器，发散元件，准直元件和变速和转动元件，其中质量分析器的分析平面垂直于提取的光束的会聚平面，之后 进入入口时，光束会聚在与分析平面垂直的平面上的会聚点上，然后从会聚点发散，并从出口传递到发散元件; 准直元件用于在光束的透射平面中平行化光束; 并且速度改变和转动元件用于使光束能够改变速度，以便在光束被偏转时实现目标能量，使得光束的透射方向改变第一预设角度。 通过多个光束电流光学元件之间的协调配合，可以在垂直平面上形成相对较宽的分布，因此本发明适用于具有大尺寸的晶片的加工，并且还可以在 避免能量污染。

公开(公告)号：US20160260577A1

公开(公告)日：2016-09-08

申请号：US15061372

申请日：2016-03-04

Applicant: KLA-Tencor Corporation

Inventor： Sean X. Wu ,  Kini Vivekanand

IPC: H01J37/22 ,  H01J37/285 ,  H01J37/06 ,  H01J37/29

CPC classification number: H01J37/222 ,  H01J37/06 ,  H01J37/265 ,  H01J37/285 ,  H01J37/292 ,  H01J2237/10 ,  H01J2237/202 ,  H01J2237/2813 ,  H01J2237/2817 ,  H01L22/12

Abstract: One embodiment relates to a method of automated inspection of scattered hot spot areas on a manufactured substrate using an electron beam apparatus. A stage holding the substrate is moved along a swath path so as to move a field of view of the electron beam apparatus such that the moving field of view covers a target area on the substrate. Off-axis imaging of the hot spot areas within the moving field of view is performed. A number of hot spot areas within the moving field of view may be determined, and the speed of the stage movement may be adjusted based on the number of hot spot areas within the moving field of view. Another embodiment relates to an electron beam apparatus for inspecting scattered areas on a manufactured substrate. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及一种使用电子束装置自动检查制造的衬底上的散射热点区域的方法。 保持基板的台阶沿着条带路径移动，以便移动电子束装置的视野，使得移动视场覆盖基板上的目标区域。 执行移动视野内的热点区域的离轴成像。 可以确定运动视场内的多个热点区域，并且可以基于运动视场内的热点区域的数量来调整平台运动的速度。 另一实施例涉及一种用于检查制造的基板上的散射区域的电子束装置。 还公开了其它实施例，方面和特征。

公开(公告)号：US09343262B2

公开(公告)日：2016-05-17

申请号：US14468844

申请日：2014-08-26

Applicant: Sumitomo Heavy Industries Ion Technology Co., Ltd.

Inventor： Takanori Yagita ,  Mitsuaki Kabasawa ,  Haruka Sasaki

IPC: H01J37/00 ,  H01J37/24 ,  H01J37/317

CPC classification number: H01J37/243 ,  H01J37/3171 ,  H01J2237/047 ,  H01J2237/10 ,  H01J2237/30472

Abstract: An ion implantation apparatus includes a beam parallelizing unit and a third power supply unit. The beam parallelizing unit includes an acceleration lens, and a deceleration lens disposed adjacent to the acceleration lens in an ion beam transportation direction. The third power supply unit operates the beam parallelizing unit under one of a plurality of energy settings. The plurality of energy settings includes a first energy setting suitable for transport of a low energy ion, and a second energy setting suitable for transport of a high energy ion beam. The third power supply unit is configured to generate a potential difference in at least the acceleration lens under the second energy setting, and generate a potential difference in at least the deceleration lens under the first energy setting. A curvature of the deceleration lens is smaller than a curvature of the acceleration lens.

Abstract translation: 离子注入装置包括光束并联单元和第三电源单元。 光束并行化单元包括加速透镜和在离子束输送方向上与加速透镜相邻设置的减速透镜。 第三电源单元在多个能量设置之一下操作光束并联单元。 多个能量设置包括适于运输低能量离子的第一能量设定和适于运输高能离子束的第二能量设定。 第三电源单元被配置为在第二能量设定下至少在加速透镜中产生电位差，并且在第一能量设定下产生至少减速透镜的电位差。 减速透镜的曲率小于加速度透镜的曲率。

公开(公告)号：US20140261171A1

公开(公告)日：2014-09-18

申请号：US13833668

申请日：2013-03-15

Applicant: NISSIN ION EQUIPMENT CO., LTD.

Inventor： Sami K. Hahto ,  Nariaki Hamamoto ,  Tetsuya Igo

IPC: H05H7/00 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/3007 ,  H01J2237/047 ,  H01J2237/10 ,  H01J2237/24542 ,  H01J2237/30472

Abstract: In some aspects, an ion implantation system is disclosed that includes an ion source for generating a ribbon ion beam and at least one corrector device for adjusting the current density of the ribbon ion beam along its longitudinal dimension to ensure that the current density profile exhibits a desired uniformity. The ion implantation system can further include other components, such as an analyzer magnet, and electrostatic bend and focusing lenses, to shape and steer the ion beam to an end station for impingement on a substrate. In some embodiments, the present teachings allows the generation of a nominally one-dimensional ribbon beam with a longitudinal size greater than the diameter of a substrate in which ions are implanted with a high degree of longitudinal profile uniformity.

Abstract translation: 在一些方面，公开了一种离子注入系统，其包括用于产生带状离子束的离子源和用于调节带状离子束沿其纵向尺寸的电流密度的至少一个校正器装置，以确保电流密度分布呈现 所需均匀度。 离子注入系统还可以包括其它组件，例如分析器磁体，以及静电弯曲和聚焦透镜，以将离子束成形和转向终端站以冲击衬底。 在一些实施例中，本发明允许产生具有大于其中注入离子的衬底的直径的纵向尺寸的标称一维带状束，并具有高度的纵向轮廓均匀性。