Abstract:
A stylus profilometer having a counterbalanced stylus with a motion transducer using a vane (41) moving between parallel, spaced-apart, conductive plates (35 and 37) which damp the motion of the vane by means of trapped air. The vane forms an electrode with the plates so that the combination is a pair of capacitors in a balanced bridge arrangement. Motion of the stylus causes an unbalance of the bridge indicative of the extent of stylus motion. A lever arm (59) associated with the stylus has a tip (57) influenced by a magnetic field which biases the stylus or controls force on a surface to be measured. The entire assembly has a very low moment of inertia to reduce the effects of vibration on the stylus and thereby increase resolution of the device and reduce damage to the substrate.
Abstract:
A high sensitivity and high throughput surface inspection system directs a focused beam of light (38) at a grazing angle towards the surface to be inspected (40). Relative motion is caused between the beam (38) and the surface (40) so that the beam (38) scans a scan path covering substantially the entire surface and light scattered along the path is collected for detecting anomalies. The scan path comprises a plurality of arrays of straight scan path segments. The focused beam of light (38) illuminates an area of the surface between 5-15 microns in width and this system is capable of inspecting in excess of about 40 wafers per hour for 150 millimeter diameter wafers (6-inch wafers), in excess of about 20 wafers per hour for 200 millimeter diameter wafers (8-inch wafers) and in excess of about 10 wafers per hour for 300 millimeter diameter wafers (12-inch wafers).
Abstract:
A stylus profilometer having a counterbalanced stylus with a motion transducer using a vane (41) moving between parallel, spaced-apart, conductive plates (35 and 37) which damp the motion of the vane by means of trapped air. The vane forms an electrode with the plates so that the combination is a pair of capacitors in a balanced bridge arrangement. Motion of the stylus causes an unbalance of the bridge indicative of the extent of stylus motion. A lever arm (59) associated with the stylus has a tip (57) influenced by a magnetic field which biases the stylus or controls force on a surface to be measured. The entire assembly has a very low moment of inertia to reduce the effects of vibration on the stylus and thereby increase resolution of the device and reduce damage to the substrate.
Abstract:
An apparatus and method for inspecting a substrate (14), such as a semiconductor wafer, includes crossed cylindrical optical elements (44) that form an elliptical beam (40) that is caused to scan in parallel fashion at an oblique angle to the substrate (14). Preferably, the smaller dimension of the elliptical beam (40) is perpendicular to the direction of the scan of the beam across the wafer. A reflector (38) converts an angularly varying beam to a telecentrically scanning beam and also provides focusing only in the direction parallel to the telecentric scan.
Abstract:
Mit dieser Einrichtung lassen sich Oberflächen zerstörungsfrei und ganzflächig auf Defekte und Kontaminationen untersuchen, wobei sowohl mikroskopisch kleine punkt- oder linienförmige Defekte als auch feinste makroskopische Inhomogenitäten erfasst werden. Zu diesem Zweck ist im Strahlengang zwischen Lichtquelle (2) und Objektiv (9) ein astigmatisches Linsensystem (5) angeordnet, das ein zigarrenförmiges Zwischenbild (31) erzeugt, wobei in Abhängigkeit von dem Zwischenbild (31) der Vorschub beim Abtasten der Oberfläche (10) der auf diese Oberfläche (10) projizierten Länge des Zwischenbildes (31) entspricht. Eine im Strahlengang zwischen Linsensystem (5) und Objektiv (9) angeordnete Dunkelfeldstop-Baugruppe (18) mit einer einstellbaren Dunkelfeldumlenkung (8) , richtet den Beleuchtungsstrahl (1) nach der Umlenkung exakt zentrisch im rechten Winkel durch das Objektiv (9) auf die Oberfläche (10) . Das von der Oberfläche (10) abgestrahlte, im Objektiv (9) gesammelte Licht ist auf einen Photodetektor (19) gerichtet. Eine Auswerteelektronik (21) zerlegt die verstärkten Ausgangssignale des Photodetektors (19) in Messwerte, die von punktförmigen, linienförmigen und flächenförmigen Defekten herrühren. Die Auswerteelektronik (21) ist über eine Recheneinheit (22) mit Peripheriegeräten (23, 24, 25) verbunden, mittels welchen die Gesamtheit aller Messwerte einer Messung dargestellt werden kann.
Abstract:
In an optical scanning system (200) for detecting particles and pattern defects on a sample surface (240), a light beam (238) is focused to an illuminated spot on the surface and the spot is scanned across a scan line. A detector (11b) is positioned adjacent to the surface to collect scattered light from the spot where the detector includes a one- or two-dimensional array of sensors. Light scattered from the illuminated spot at each of a plurality of positions along the scan line is focused onto a corresponding sensor in the array. A plurality of detectors symmetrically placed with respect to the illuminating beam detect laterally and forward scattered light from the spot.
Abstract:
A surface height detection and positioning device for use in a surface inspection system. A light beam (25) impinges obliquely upon the surface (22), and a position detector (38) with a mechanical window (45) defining an aperture (46) receives specularly reflected light (33) producing a plurality of electrical signals. The aperture's width (46), along a scan direction, is of sufficient size to create a train of signals from each of the plurality of signals, having a frequency equal to the scan frequency. These signals carry information responsive to the position of the reflected beam (33) impinging on the detector and the beam's intensity. To abrogate information responsive to intensity variations at the detector, an electronic circuit (100) determines the sum and the difference of the plurality of signals, producing a summed signal and a difference signal, respectively. The difference signal is divided by the summed signal, thereby producing a normalized signal which represents the height of the surface.