PROFILOMETER STYLUS ASSEMBLY INSENSITIVE TO VIBRATION
    52.
    发明授权
    PROFILOMETER STYLUS ASSEMBLY INSENSITIVE TO VIBRATION 失效
    振动RESISTANTS TASTSTIFTANORDNUNG轮廓曲线

    公开(公告)号:EP0673498B1

    公开(公告)日:1999-12-15

    申请号:EP93922797.1

    申请日:1993-09-30

    CPC classification number: G01B7/34

    Abstract: A stylus profilometer having a counterbalanced stylus with a motion transducer using a vane (41) moving between parallel, spaced-apart, conductive plates (35 and 37) which damp the motion of the vane by means of trapped air. The vane forms an electrode with the plates so that the combination is a pair of capacitors in a balanced bridge arrangement. Motion of the stylus causes an unbalance of the bridge indicative of the extent of stylus motion. A lever arm (59) associated with the stylus has a tip (57) influenced by a magnetic field which biases the stylus or controls force on a surface to be measured. The entire assembly has a very low moment of inertia to reduce the effects of vibration on the stylus and thereby increase resolution of the device and reduce damage to the substrate.

    SCANNING SYSTEM FOR INSPECTING ANOMALIES ON SURFACES
    53.
    发明公开
    SCANNING SYSTEM FOR INSPECTING ANOMALIES ON SURFACES 失效
    RASTERVORRICHTUNG ZUR UNTERSUCHUNG VONOBERFLÄCHENANOMALITÄTEN

    公开(公告)号:EP0797763A4

    公开(公告)日:1999-03-24

    申请号:EP95943768

    申请日:1995-12-08

    Abstract: A high sensitivity and high throughput surface inspection system directs a focused beam of light (38) at a grazing angle towards the surface to be inspected (40). Relative motion is caused between the beam (38) and the surface (40) so that the beam (38) scans a scan path covering substantially the entire surface and light scattered along the path is collected for detecting anomalies. The scan path comprises a plurality of arrays of straight scan path segments. The focused beam of light (38) illuminates an area of the surface between 5-15 microns in width and this system is capable of inspecting in excess of about 40 wafers per hour for 150 millimeter diameter wafers (6-inch wafers), in excess of about 20 wafers per hour for 200 millimeter diameter wafers (8-inch wafers) and in excess of about 10 wafers per hour for 300 millimeter diameter wafers (12-inch wafers).

    Abstract translation: 一种用于检测表面(40)上的异常(例如颗粒或图案缺陷)的光学系统,包括:光学器件(22,26,34,36),其布置成提供以倾斜角照射表面的辐射束(38) ; 至少两个检测器(110a,110b,111a,111b); 布置成收集从表面散射的辐射的至少两个光学元件(110a,110b,111a,111b),每个光学元件布置成将所收集的散射辐射引导到相应的一个检测器,使得检测器提供输出信号 响应于此,其中光学元件被定位成使得每个检测器感测从表面沿不同方向散射的辐射; 一种装置,包括使所述梁和所述表面之间相对运动的移动台(124); 以及处理器(200)处理来自所述检测器输出信号的信息,所述信号涉及从所述检测器的不同方向从所述表面的不同部分散射的辐射,并且被布置为识别异常; 所述装置还包括声光偏转器(30),使得每个移动台和声光偏转器引起光束和表面之间的相对运动,使得光束扫描覆盖基本上整个表面的扫描路径,所述扫描路径 所述扫描路径段包括扫描路径段(50,50',50“,50”)的多个阵列,其中所述扫描路径段中的至少一些具有比所述表面(40)的尺寸短的跨度,并且因此 使光束照射表面的不同部分,并且使得检测器响应于由光束照射的表面的不同部分的辐射而提供输出信号。

    PROFILOMETER STYLUS ASSEMBLY INSENSITIVE TO VIBRATION.
    54.
    发明公开
    PROFILOMETER STYLUS ASSEMBLY INSENSITIVE TO VIBRATION. 失效
    VIBRATIONSUNEMPFINDLICHE TASTSTIFTANORDNUNG EINES PROFILOMETERS。

    公开(公告)号:EP0673498A4

    公开(公告)日:1996-12-11

    申请号:EP93922797

    申请日:1993-09-30

    CPC classification number: G01B7/34

    Abstract: A stylus profilometer having a counterbalanced stylus with a motion transducer using a vane (41) moving between parallel, spaced-apart, conductive plates (35 and 37) which damp the motion of the vane by means of trapped air. The vane forms an electrode with the plates so that the combination is a pair of capacitors in a balanced bridge arrangement. Motion of the stylus causes an unbalance of the bridge indicative of the extent of stylus motion. A lever arm (59) associated with the stylus has a tip (57) influenced by a magnetic field which biases the stylus or controls force on a surface to be measured. The entire assembly has a very low moment of inertia to reduce the effects of vibration on the stylus and thereby increase resolution of the device and reduce damage to the substrate.

    Abstract translation: 一种具有带有运动传感器的平衡触针的触针表面轮廓仪,该触针使用在平行的,间隔开的导电板(35和37)之间移动的叶片(41),所述导电板借助于捕获的空气阻尼叶片的运动。 叶片与平板形成一个电极,因此该组合是平衡桥布置中的一对电容器。 手写笔的运动导致桥梁的不平衡,指示手写笔运动的程度。 与触针相关联的杠杆臂(59)具有受磁场影响的尖端(57),所述磁场偏置触针或控制待测表面上的力。 整个组件具有非常低的惯性矩,以减小振动对触针的影响,从而提高设备的分辨率并减少对基板的损坏。

    SURFACE SCANNING APPARATUS AND METHOD USING CROSSED-CYLINDER OPTICAL ELEMENTS
    55.
    发明公开
    SURFACE SCANNING APPARATUS AND METHOD USING CROSSED-CYLINDER OPTICAL ELEMENTS 失效
    DEVICE AND METHOD FOR表面扫描使用巡航,圆柱光学组件

    公开(公告)号:EP0742895A1

    公开(公告)日:1996-11-20

    申请号:EP95942393.0

    申请日:1995-11-03

    CPC classification number: G01N21/9501 G01N21/8806

    Abstract: An apparatus and method for inspecting a substrate (14), such as a semiconductor wafer, includes crossed cylindrical optical elements (44) that form an elliptical beam (40) that is caused to scan in parallel fashion at an oblique angle to the substrate (14). Preferably, the smaller dimension of the elliptical beam (40) is perpendicular to the direction of the scan of the beam across the wafer. A reflector (38) converts an angularly varying beam to a telecentrically scanning beam and also provides focusing only in the direction parallel to the telecentric scan.

    Einrichtung für Oberflächeninspektionen
    56.
    发明公开
    Einrichtung für Oberflächeninspektionen 失效
    EinrichtungfürOberflächeninspektionen。

    公开(公告)号:EP0524348A1

    公开(公告)日:1993-01-27

    申请号:EP91122162.0

    申请日:1991-12-23

    Abstract: Mit dieser Einrichtung lassen sich Oberflächen zerstörungsfrei und ganzflächig auf Defekte und Kontaminationen untersuchen, wobei sowohl mikroskopisch kleine punkt- oder linienförmige Defekte als auch feinste makroskopische Inhomogenitäten erfasst werden. Zu diesem Zweck ist im Strahlengang zwischen Lichtquelle (2) und Objektiv (9) ein astigmatisches Linsensystem (5) angeordnet, das ein zigarrenförmiges Zwischenbild (31) erzeugt, wobei in Abhängigkeit von dem Zwischenbild (31) der Vorschub beim Abtasten der Oberfläche (10) der auf diese Oberfläche (10) projizierten Länge des Zwischenbildes (31) entspricht. Eine im Strahlengang zwischen Linsensystem (5) und Objektiv (9) angeordnete Dunkelfeldstop-Baugruppe (18) mit einer einstellbaren Dunkelfeldumlenkung (8) , richtet den Beleuchtungsstrahl (1) nach der Umlenkung exakt zentrisch im rechten Winkel durch das Objektiv (9) auf die Oberfläche (10) . Das von der Oberfläche (10) abgestrahlte, im Objektiv (9) gesammelte Licht ist auf einen Photodetektor (19) gerichtet. Eine Auswerteelektronik (21) zerlegt die verstärkten Ausgangssignale des Photodetektors (19) in Messwerte, die von punktförmigen, linienförmigen und flächenförmigen Defekten herrühren. Die Auswerteelektronik (21) ist über eine Recheneinheit (22) mit Peripheriegeräten (23, 24, 25) verbunden, mittels welchen die Gesamtheit aller Messwerte einer Messung dargestellt werden kann.

    Abstract translation: 可以使用该装置在整个区域上以非破坏性方式检查表面的缺陷和污染物,微观上小的点状或线性缺陷以及正在检测的最佳的宏观不均匀性。 为此,在光源(2)和透镜(9)之间的光束路径中布置产生雪茄状中间像(31)的像散透镜系统(5),在扫描表面(10 )对应于所述中间图像(31)的长度的函数,投影到所述中间图像(31)的所述表面(10)上。 布置在透镜系统(5)和透镜(9)之间的光束路径中并且具有可调整的暗场偏转系统(8)的暗场子组件(18)引导照射光束(1) 通过透镜(9)以正确的角度精确地中心偏转到表面(10)上。 从表面(10)发射并收集在透镜(9)中的光被引导到光电检测器(19)上。 评估电子系统(21)将光电检测器(19)的放大的输出信号分解成来自扁平,线性和平面缺陷的测量值。 评估电子系统(21)经由计算机单元(22)连接到外围设备(23,24,25),通过它们可以表示测量的所有测量值的总和。

    OPTICAL SCANNING SYSTEM FOR SURFACE INSPECTION
    57.
    发明公开
    OPTICAL SCANNING SYSTEM FOR SURFACE INSPECTION 失效
    OPTISCHE RASTERVORRICHTUNG FUR OBERFLAECHENPRUEFUNG

    公开(公告)号:EP0979398A4

    公开(公告)日:2000-02-16

    申请号:EP97929786

    申请日:1997-06-03

    CPC classification number: G01N21/95607 G01N21/94 G01N21/9501

    Abstract: In an optical scanning system (200) for detecting particles and pattern defects on a sample surface (240), a light beam (238) is focused to an illuminated spot on the surface and the spot is scanned across a scan line. A detector (11b) is positioned adjacent to the surface to collect scattered light from the spot where the detector includes a one- or two-dimensional array of sensors. Light scattered from the illuminated spot at each of a plurality of positions along the scan line is focused onto a corresponding sensor in the array. A plurality of detectors symmetrically placed with respect to the illuminating beam detect laterally and forward scattered light from the spot.

    Abstract translation: 在用于检测样本表面(240)上的粒子和图案缺陷的光学扫描系统(200)中,光束(238)被聚焦到表面上的照亮点,并且该点在扫描线上被扫描。 检测器(11b)定位在表面附近以收集来自检测器包括传感器的一维或二维阵列的点的散射光。 在沿着扫描线的多个位置中的每一个处从照明点散射的光被聚焦到阵列中的相应传感器上。 相对于照明光束对称放置的多个检测器检测来自该点的横向和前向散射光。

    OPTICAL WAFER POSITIONING SYSTEM
    59.
    发明公开
    OPTICAL WAFER POSITIONING SYSTEM 失效
    光学基片定位系统

    公开(公告)号:EP0804713A1

    公开(公告)日:1997-11-05

    申请号:EP95916365.0

    申请日:1995-04-13

    CPC classification number: G01N21/9501 G01N21/94 G01N21/956

    Abstract: A surface height detection and positioning device for use in a surface inspection system. A light beam (25) impinges obliquely upon the surface (22), and a position detector (38) with a mechanical window (45) defining an aperture (46) receives specularly reflected light (33) producing a plurality of electrical signals. The aperture's width (46), along a scan direction, is of sufficient size to create a train of signals from each of the plurality of signals, having a frequency equal to the scan frequency. These signals carry information responsive to the position of the reflected beam (33) impinging on the detector and the beam's intensity. To abrogate information responsive to intensity variations at the detector, an electronic circuit (100) determines the sum and the difference of the plurality of signals, producing a summed signal and a difference signal, respectively. The difference signal is divided by the summed signal, thereby producing a normalized signal which represents the height of the surface.

Patent Agency Ranking