公开(公告)号：DE602006021380D1

公开(公告)日：2011-06-01

申请号：DE602006021380

申请日：2006-10-21

Applicant: ASML NETHERLANDS BV

Inventor： SIMON KLAUS

IPC: G03F7/00

公开(公告)号：DE60319658D1

公开(公告)日：2008-04-24

申请号：DE60319658

申请日：2003-11-27

Applicant: ASML NETHERLANDS BV

Inventor： SIMON KLAUS ,  LOF JOERI ,  MINNAERT ARTHUR WINIFRED EDUAR ,  SMEETS ERIK MARIE JOSE

IPC: G03F7/20 ,  B01J19/00 ,  B81C1/00 ,  C40B60/14

Abstract: A flowcell including a plurality of separate chambers is provided on the substrate table so that a fluid can be brought into contact with exposed areas of the substrate to interact therewith. A series of exposures and chemical processes can thereby be carried out without removing the substrate from the substrate table.

公开(公告)号：SG121822A1

公开(公告)日：2006-05-26

申请号：SG200306810

申请日：2003-11-07

Applicant: ASML NETHERLANDS BV

Inventor： LOF JOERI ,  SMIT DE JOANNES THEODOOR ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  MEIJER HENDRICUS JOHANNES MARI ,  LOOPSTRA ERIK ROELOF

IPC: G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

公开(公告)号：SG121818A1

公开(公告)日：2006-05-26

申请号：SG200306755

申请日：2003-11-11

Applicant: ASML NETHERLANDS BV

Inventor： LOF JOERI ,  DERKSEN ANTONIUS THEODORUS ANN ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  SMIT DE JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  SANTEN VAN HELMAR

IPC: G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.