公开(公告)号：JPH04297013A

公开(公告)日：1992-10-21

申请号：JP8436091

申请日：1991-03-26

Applicant: CANON KK

Inventor： AMAMIYA MITSUAKI ,  MIYAKE AKIRA

IPC: G03F7/20 ,  G21K1/06 ,  H01L21/027 ,  H01L21/30 ,  H05H13/04

Abstract: PURPOSE:To provide an X-ray aligned capable of eliminating X-ray intensity unevenness with the nonuniformity of a window material, the shape error of an X-ray mirror and surface roughness unevenness. CONSTITUTION:In an X-ray aligned, in which synchrotron emitted light is reflected by an X-ray mirror 101 and projected into an exposure chamber 106 through a window 103 and exposure is connected, the X-ray mirror 101 is constituted rotatably centering around a specified axis so that the reflecting region of X-rays 102 is expanded, and the reflecting point of X-rays 102 in the X-ray mirror 101 is separated from the foot of a perpendicular line dropped from said specified axis to the surface of the X-ray mirror only by a predetermined distance.

公开(公告)号：JPH04280619A

公开(公告)日：1992-10-06

申请号：JP6753291

申请日：1991-03-08

Applicant: CANON KK

Inventor： SAKAMOTO EIJI ,  AMAMIYA MITSUAKI ,  HARA SHINICHI

IPC: H01L21/30 ,  H01L21/027 ,  H01L21/68 ,  H01L21/683

Abstract: PURPOSE:To improve accuracy of transfer of a mask pattern by suppressing the temperature rise and thermal strain of a wafer being exposed. CONSTITUTION:Four suction regions 4, divided by partition walls 1, are formed on the wafer suction surface of a main structural member 3. A vacuum piping 5 is independently connected to each suction region 4, an outside air introducing pipe 7 and a vacuum source 8 are connected to each vacuum piping 5 respectively through the intermediary of three-way valves 11. A valve controller 12 is connected to each three-way valve 11. Each suction region 4 can be selectively communicated independently to the outside air introducing pipe 7 or the vacuum source 8 in a selective manner by switching the three-way valves 11 using a valve controller 12.

公开(公告)号：JPH0493686A

公开(公告)日：1992-03-26

申请号：JP20670790

申请日：1990-08-06

Applicant: CANON KK

Inventor： MIYAKE AKIRA ,  AMAMIYA MITSUAKI ,  WATANABE YUTAKA

IPC: G01J1/00 ,  G01J1/02 ,  G01T1/29

Abstract: PURPOSE:To increase the extent of position detecting sensitivity by installing a fluorescent X-ray radiator on an optical axis of synchrotron radiation light, detecting the fluorescent X-ray being emitted with two detectors each, and finding a beam position from each output signal. CONSTITUTION:A copper rod 1 or a fluorescent X-ray radiator makes an angle on an optical axis acute with a triangular section doubling as a linear symmetry to the optical axis of synchrotron radiation light correctly irradiates the copper rod 1 without entailing any dislocation, each quantity of both first and second fluorescent X-rays being detected by first and second detectors 2, 3 is the same, so that each of output signals (a), (b) of these two detectors 2, 3 becomes equalized. Accordingly, with an output signal out of an arithmetic circuit 4 monitored, a beam position of the synchrotron radiation light is accurately detectable.

公开(公告)号：JPH0448716A

公开(公告)日：1992-02-18

申请号：JP15561190

申请日：1990-06-15

Applicant: CANON KK

Inventor： AMAMIYA MITSUAKI ,  HARA SHINICHI ,  SAKAMOTO EIJI

IPC: H01L21/027 ,  G03F7/20

Abstract: PURPOSE:To obtain a substrate holder, in which contact heat resistance can be lowered and the accuracy of pattern transfer is improved, by providing a control means controlling the opening and closing of a blow-off quantity adjusting valve and a suction-quantity adjusting valve from the output signal of a pressure sensor. CONSTITUTION:In the substrate holder, a plurality of blow-off ports 7 and a plurality of suction ports 3 are formed to the chuck surface 6 of a susceptor l, and the pressure of a fine space formed between the rear of a substrate 51 and the chuck surface 52 of a susceptor 50 is detected by a pressure sensor 11. The pressure of the fine space is kept at a constant value or more by opening and closing a blow-off quantity adjusting valve 14 installed on its midway of a blow-off pipe g connecting a plurality of the blow-off ports and outside space or a in response to detecting pressure and a suction-quantity adjusting valve 10 mounted on its midway of a suction pipe 4 connecting a plurality of the suction ports and a vacuum source 9 by control means 15, 16, thus keeping contact heat resistance between the substrate and the susceptor at a constant value or less.

公开(公告)号：JPH03118500A

公开(公告)日：1991-05-21

申请号：JP25529089

申请日：1989-10-02

Applicant: CANON KK

Inventor： SAKAMOTO EIJI ,  EBINUMA RYUICHI ,  AMAMIYA MITSUAKI ,  UZAWA SHUNICHI ,  UDA KOJI

IPC: G21K5/00 ,  G03F1/22 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H05K7/20

Abstract: PURPOSE:To find out water leakage in a sealed vessel in early stage and to prevent deterioration of its function by providing a mean to detect water content of a gas in the sealed vessel which is prepared for an X-ray exposure. CONSTITUTION:A helium gas is supplied into a sealed vessel 1 from a gas feed pipe 15 and the vessel is controlled in its inner pressure to be around 10Torr by a pressure gause 11, a pressure controller 12 and a flow control valve 13, and subsequently its humidity is 0%. To an object 5 for a temperature control, temperature controlling water is circulated through a temperature controlling water circulation device 3. During an ordinary condition, valves 6 and 7 are in an open condition and a valve 8 is in a closed condition. In case that water leakage occurs in the vessel 1, the water immediately evaporates and a humidity in the vessel 1 rises, as a saturation water vapor pressure at a room temperature is around 20Torr. As a detecting sensor 2 for water content is provided to the vessel 1, the rising humidity by the water leakage is detected and water supply to the object 5 for temperature control is shut out.

公开(公告)号：JPH0362920A

公开(公告)日：1991-03-19

申请号：JP19795789

申请日：1989-08-01

Applicant: CANON KK

Inventor： AMAMIYA MITSUAKI ,  SAKAMOTO EIJI ,  UDA KOJI ,  OZAWA KUNITAKA ,  IWAMOTO KAZUNORI ,  UZAWA SHUNICHI ,  MARUMO KOJI

IPC: H01L21/30 ,  G03F7/20 ,  H01L21/00 ,  H01L21/027 ,  H01L21/687

Abstract: PURPOSE:To prevent vibration due to flow of constant temperature water and to alleviate burden with respect to temperature control of the constant temperature water at the same time at a wafer mounting stage by regulating the flow rate of a temperature regulating medium flowing through a circulating flow path with a flow rate regulating valve, and controlling the temperature of a wafer without vibration. CONSTITUTION:As information for controlling the temperature of a wafer, the temperature of the wafer is measured with a detecting element 9. A signal indicating the result of measurement is sent into a Peltier-element controlling part 18 from a temperature measuring part 16. When the signal is received, the Peltier-element controlling part 18 actuates a Peltier element 7 through a Peltier-element driving part 17 so that the temperature of the wafer 4 becomes the temperature determined by a CPU 20 e.g. 23+ or -0.01 deg.C all the time. Meanwhile, constant temperature water whose temperature is controlled at, e.g. 23.1+ or -0.1 deg.C is sent from a constant temperature circulating device 13. The water is introduced into a flow path 8 through a flow-rate controlling valve 12 and an introducing port 11, and heat at the rear surface of the element 7 is removed. The water is drained through a draining port 10 and circulated and returned into the constant-temperature circulating device 13 again. Therefore, wafer processing wherein the temperature control and vibrationproofing are achieved at the same time can be performed.

公开(公告)号：JPH02194521A

公开(公告)日：1990-08-01

申请号：JP1251489

申请日：1989-01-21

Applicant: CANON KK

Inventor： AMAMIYA MITSUAKI ,  TERAJIMA SHIGERU ,  YAJIMA MASATO ,  UZAWA SHUNICHI

IPC: G21K5/00 ,  G03F1/76 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To make a line width of a resist uniform by a method wherein, when an exposure is controlled at individual points on a wafer, it is controlled by giving consideration to a spectral intensity of X-rays, diffraction of a mask and the like. CONSTITUTION:In an X-ray aligner which transcribes and exposures a pattern on a mask 205 onto a wafer 203 coated with a photosensitizer by using X-rays, the following are installed: a mask chuck 206 which holds the mask 205; a wafer chuck 207 which holds the wafer 203 arranged so as to face the mask 205. The following are also provided: the mask 205 which is held by the mask chuck 206; an X-ray source 204 by which the water 203 held by the wafer chuck 207 is irradiated with X-rays. A spectral intensity of the X-rays generated from the X=ray source 204 is measured by a measuring means 209; an X-ray exposure to be applied to the wafer 203 is controlled by a control means 214 in accordance with its measured result. The control means 214 is arranged on an X-ray light path between the X=ray source 204 and the mask 205 by using a shutter means 210; it sets an exposure time on individual points on the wafer 203. Thereby, it is possible to obtain a desired line width of a resist.

公开(公告)号：JPH0298120A

公开(公告)日：1990-04-10

申请号：JP24990288

申请日：1988-10-05

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  AMAMIYA MITSUAKI ,  KARIYA TAKUO ,  SHIMODA ISAMU

IPC: G21K5/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To make it possible to correct any decline in helium purity due to air leakage as well as to avoid the decline in X-ray transmittivity by a method where in a means to constantly feed a specified amount of helium is provided in a stage containing chamber. CONSTITUTION:An X-ray source containing chamber 3 is exhausted by a high vacuum pump 13 with a partition valve 7 closed and a bypass valve 26 opened. On the other hand, a stage containing chamber 5 is exhausted by a low vacuum pimp 14 down to the pressure not exceeding 0.029Torr. At thin time, the bypass valve 26 is closed to exhaust the X-ray source containing chamber 3 down to the final pressure not exceeding 10 Torr. Later, the stage containing chamber 5 is fed with helium in purity of 99.9999% up to internal pressure of 150Torr. Thereafter, the pressure inside the stage containing chamber 5 is kept at 150Torr avoiding the dispersion thereof by a controller 21 and a variable valve 22 to continue the feeding of specified amount of helium corresponding to any air leakage amount.

公开(公告)号：JPH0271508A

公开(公告)日：1990-03-12

申请号：JP22225388

申请日：1988-09-07

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  EBINUMA RYUICHI ,  AMAMIYA MITSUAKI ,  OZAWA KUNITAKA ,  UDA KOJI ,  SHIMODA ISAMU ,  UZAWA SHUNICHI

IPC: G21K5/02 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To make exposure amount uniform by a constitution wherein an integral exposure amount is calculated on the basis of a measured result of an illuminance of exposed light by using a sensor and the integral exposure amount is transmitted to a shutter control part as an information signal. CONSTITUTION:When an exposure illuminance and an exposure amount are measured, a stage 103 is moved; a sensor 104 for illuminance measurement use is shifted to an arbitrary point inside an exposure region; a movable aperture 105 is moved by using an installed means; X rays ar directed. An area of a shaded part indication an output result of the sensor 104 during this process indicates an integral exposure amount at the point; it is judged whether the amount is proper or not by comparing this value with a preset exposure amount. A measurement and a judgment in this manner are executed in arbitrary N points within the exposure regain; when the proper exposure amount is obtained by the measurement in all positions, a wafer is exposed to light. If there exists an improper point, it is fed back to a control part of the movable aperture; a shifting velocity of the movable aperture is corrected in order to obtain the proper exposure amount at arbitrary points inside the exposure region. Thereby, a whole region of the wafer is exposed to light at a uniform exposure amount.

公开(公告)号：JPS62238622A

公开(公告)日：1987-10-19

申请号：JP8119086

申请日：1986-04-10

Applicant: CANON KK

Inventor： AMAMIYA MITSUAKI

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To enable a width of resist pattern to be controlled to a target value, by variably controlling an amount of half shade on the surface of the resist based on the target value of the width of the resist pattern after development, and controlling an X-ray exposure so as to obtain a thickness of the residual resist film as previously set. CONSTITUTION:X-rays 2 from an X-ray source 1 are pseudoparallelized by a solar slit 3, selectively attenuated by X-ray absorbing patterns 5 of a mask 4 and reach resist 6 on a wafer. The mask pattern 5 is thereby transferred and exposed to the resist. Various set data such as a target width of the resist and a residuasl film thickness are stored in a memory 18. A CPU 17 determines an aperture ratio of the solar slit 3, a proximity gap and an X-ray exposure D so as to provide an amount of half shade of 0.2mum at maximum. Monitoring values detected by an X-ray detector 10 by means of an interface 16, a wafer chuck 8 is moved by a drive section 15 so as to obtain the X-ray exposure D and a period of time for which the resist is irradiated with the X-rays is controlled. According to such operations, a resist pattern having the target width of 0.50mum can be transferred with the residual film thickness as previously set.