中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

218 records (took 0.023 seconds)

    61.
    发明专利
    未知

    公开(公告)号：DE69018556T2

    公开(公告)日：1995-09-07

    申请号：DE69018556

    申请日：1990-09-19

    Applicant: CANON KK

    Inventor： NOSE NORIYUKI ,  EBINUMA RYUICHI ,  OZAWA KUNITAKA ,  KARIYA TAKAO ,  UZAWA SHUNICHI

    IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

    Abstract: An exposure apparatus includes a light source for exposing a wafer (2) through a mask (1); a light blocking device (4) being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system (6) for detecting positional deviation between the mask and the wafer; and a drive control system (31,61) for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.

    63.
    发明专利
    未知

    公开(公告)号：DE68915239T2

    公开(公告)日：1994-09-08

    申请号：DE68915239

    申请日：1989-10-04

    Applicant: CANON KK

    Inventor： IWAMOTO KAZUNORI ,  UZAWA SHUNICHI ,  KARIYA TAKAO ,  EBINUMA RYUICHI

    IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

    Abstract: An X-ray exposure system, for exposing a semiconductor wafer to a mask with X-rays contained in synchrotron radiation, is disclosed. In this system, the mask (1) and the wafer (46) are held on a main frame (4) so that their surfaces extend substantially in parallel to a vertical axis. The main frame suspends from a supporting frame (10) through a plurality of air mounts (7) each being displaceable vertically. The supporting frame is placed on the same reference surface as of a SOR ring (17) that produces synchrotron radiation (20). By using these air mounts, any tilt of the mask and the wafer relative to the irradiation region of the synchrotron radiation as well as the position of the mask and the wafer in the vertical direction, with respect to the irradiation region, can be controlled and maintained constant. Thus, accurate pattern printing is ensured.

    64.
    发明专利
    未知

    公开(公告)号：FR2585289B1

    公开(公告)日：1994-07-29

    申请号：FR8610685

    申请日：1986-07-23

    Applicant: CANON KK

    Inventor： ICHIHASHI HIROO ,  OZAWA MASAKAZU ,  EBINUMA RYUICHI ,  SAITO ATSUSHI

    IPC: B41J2/165 ,  B41J2/175 ,  B41J3/04 ,  B41J29/00

    Abstract: An ink jet recording apparatus has a recording head for discharging ink and effecting recording, a recording flow path communicating the recording head with one end of a first ink tank, a pump side flow path communicating the first ink tank with the recording head through a pump and, together with the recording flow path, constituting an ink circulation path through the head and the first ink tank, and a secnd ink tank for supplying ink to the first ink tank. Normally open electrical opening-closing means (FIG. 11) are provided in the recording flow path and in a tube for opening the first ink tank to atmosphere. Another normally open electrical opening-closing means and a check valve permitting the passage of ink from the pump only to the recording head, this latter opening-closing means and the check valve being interposed in series in the pump side flow path between the pump and the recording head. The apparatus also may include an overflow sensor (FIGS. 9 and 10) for detecting the amount of ink that has overflowed from the first ink tank and a water hammer damper (FIG. 14) that absorbs fluid shocks in the pump side flow path. The second ink tank may have excised portions (FIGS. 15, 16 and 18) to ensure that color ink tanks are properly mounted to the apparatus.

    66.
    发明专利
    未知

    公开(公告)号：DE3624817A1

    公开(公告)日：1987-02-05

    申请号：DE3624817

    申请日：1986-07-23

    Applicant: CANON KK

    Inventor： ICHIHASHI HIROO ,  OZAWA MASAKAZU ,  EBINUMA RYUICHI ,  SAITO ATSUSHI

    IPC: B41J2/165 ,  B41J2/175 ,  B41J3/04 ,  B41J27/00

    Abstract: An ink jet recording apparatus has a recording head for discharging ink and effecting recording, a recording flow path communicating the recording head with one end of a first ink tank, a pump side flow path communicating the first ink tank with the recording head through a pump and, together with the recording flow path, constituting an ink circulation path through the head and the first ink tank, and a secnd ink tank for supplying ink to the first ink tank. Normally open electrical opening-closing means (FIG. 11) are provided in the recording flow path and in a tube for opening the first ink tank to atmosphere. Another normally open electrical opening-closing means and a check valve permitting the passage of ink from the pump only to the recording head, this latter opening-closing means and the check valve being interposed in series in the pump side flow path between the pump and the recording head. The apparatus also may include an overflow sensor (FIGS. 9 and 10) for detecting the amount of ink that has overflowed from the first ink tank and a water hammer damper (FIG. 14) that absorbs fluid shocks in the pump side flow path. The second ink tank may have excised portions (FIGS. 15, 16 and 18) to ensure that color ink tanks are properly mounted to the apparatus.

    69.
    发明专利
    未知

    公开(公告)号：DE69739827D1

    公开(公告)日：2010-05-12

    申请号：DE69739827

    申请日：1997-06-03

    Applicant: CANON KK

    Inventor： INOUE MITSURU ,  EBINUMA RYUICHI ,  IWAMOTO KAZUNORI ,  OSANAI EIJI ,  TAKEISHI HIROAKI

    IPC: G03F7/20 ,  H01L21/027

    Abstract: A scanning exposure apparatus wherein a portion of a pattern of an original is projected on to a substrate through a projection optical system and wherein the original and the substrate are scanningly moved relatively to the projection optical system whereby the pattern of the original is transferred on to the substrate. The apparatus includes an original stage for holding the original, a base for supporting the original stage, and a supporting system for supporting the base at three positions, through dampers and pillar.

    70.
    发明专利
    未知

    公开(公告)号：DE69634768D1

    公开(公告)日：2005-06-30

    申请号：DE69634768

    申请日：1996-10-04

    Applicant: CANON KK

    Inventor： KORENAGA NOBUSHIGE ,  EBINUMA RYUICHI

    IPC: B23Q5/28 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H02K41/03 ,  H02K41/035 ,  H01L21/00

    Abstract: It is an object to provide a compact, lightweight, and inexpensive stage apparatus. A stage apparatus for moving a stage (2) in a predetermined direction includes a stage accelerating/decelerating thrust generation unit (9) arranged along the moving direction, a stage speed control thrust generation unit (8) arranged to be parallel to the stage accelerating/decelerating thrust generation unit, an accelerating unit (29a) for generating a stage accelerating thrust at a portion corresponding to the stage accelerating interval of the accelerating/decelerating thrust generation unit (9), a decelerating unit (29b) for generating a stage decelerating thrust at a portion corresponding to the stage decelerating interval of the accelerating/decelerating thrust generation unit (9), and a speed control unit (28) for controlling the stage thrust generated by the speed control thrust generation unit (8) at least within a predetermined range between the accelerating interval and the decelerating interval.

Patent Agency Ranking