Abstract:
The present invention relates to a deposition device for an organic-inorganic hybrid thin film and a method for manufacturing an organic-inorganic hybrid thin film using the same. In the deposition device for an organic-inorganic hybrid thin film, an atomic layer deposition chamber for the deposition of inorganic matters and a thermal deposition chamber for the depositing of organic matters are vertically connected. A gate valve is arranged in a connection path connecting the chambers. An injection port for supplying an inorganic deposition source is arranged in the atomic layer deposition chamber. A unit for heating an organic deposition source is arranged in the thermal deposition chamber. In the formation of a molecular organic-inorganic thin film, the present invention can form the multi-layered physical thin film of the organic and inorganic layers using a thermal deposition method and an atomic layer deposition method and the multi-layered thin film of the organic and inorganic layers through a chemical combination on the interface of the organic and inorganic layers.
Abstract:
The present invention relates to a magnesium oxide precursor which is denoted by chemical formula 1. The magnesium oxide precursor is thermally stable and highly volatile to obtain a thin film which contains high quality magnesium oxide.
Abstract:
The present invention relates to a novel preparation method of a benzoporphyrin derivative and the fabrication of an organic thin-film transistor thereby. The novel preparation method of the benzoporphyrin derivative by the present invention remarkably reduces the number of production processes compare to existing preparation method of the benzoporphyrin derivative for economically obtaining the benzoporphyrin derivative which is a target compound. The process is simplified and the facility and production costs for applying the printing method are reduced by dissolving the benzoporphyrin derivative in more than two kinds of mixed organic solvent with different boiling points, and fabricating the organic thin-film transistor using the printing method.
Abstract:
PURPOSE: A method for forming a thin film including Sb with an atomic layer deposition method is provided to improve productivity by forming the thin film including Sb at low temperatures through an atomic layer deposition process using a Sb precursor. CONSTITUTION: A substrate is prepared in a vacuum chamber. A Sb precursor material is prepared. A source gas is prepared by the Sb precursor material. A reactive gas including a hydrogen gas is prepared. A purge gas is prepared. A metal precursor gas is prepared by a metal precursor material. A thin film of a Sb-metal monolayer is formed on the substrate by successively supplying the source gas, the reactive gas, the purge gas, and the metal precursor gas to the vacuum chamber.