公开(公告)号：JP2001329217A

公开(公告)日：2001-11-27

申请号：JP2000150364

申请日：2000-05-22

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  HASEGAWA KOICHI ,  HAYASHI EIJI ,  YAMADA KINJI

IPC: C01B33/12 ,  C08G77/02 ,  C08G77/24 ,  C08G77/50 ,  C09D183/02 ,  C09D183/04 ,  C09D183/14 ,  H01L21/312 ,  H01L21/316

Abstract: PROBLEM TO BE SOLVED: To produce a film-forming composition capable of forming a silica film having a small difference in relative dielectric constant that varies depending on calcinating conditions and having excellent crack resistance as material for forming an interlaminar insulating film in a semiconductor element or the like. SOLUTION: The film-forming composition comprises (A) a hydrolyzed condensate produced by subjecting at least one silane compound selected from the group consisting of (A-1) a compound represented by the following formula 1 (A-2) a compound represented by the following formula 2 and (A-3) a compound represented by the following formula 3 to hydrolysis and condensation reaction, (B) a silylating agent and (C) organic an solvent: Ra (Si)(ORI)4-a 1, Si(OR2)4 2, R3b(R4O)3-bSi-(R7)3-c(OR5)3-cR6c 3, (wherein R denotes H, F or a monovalent organic group; R1 to R6 each denote a monovalent organic group; R7 denotes O, a phenylene group or -(CH2)n-; a denotes an integer of 1 or 2; b and c each denote a number of 0 to 2; d denotes O or 1; and n denotes an integer of 1 to 6).

公开(公告)号：JP2001264771A

公开(公告)日：2001-09-26

申请号：JP2001017846

申请日：2001-01-26

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  MIYAMOTO TAKESHI ,  TSUDA YUSUKE ,  BESSHO NOBUO

IPC: G02F1/1337 ,  C08L79/08 ,  C09D179/08

Abstract: PROBLEM TO BE SOLVED: To provide an aligning agent for a liquid crystal which has little irregularity in the film thickness during printing and to provide a liquid crystal alignment film having no irregular thickness. SOLUTION: The aligning agent for a liquid crystal for printing and coating contains γ-butyrolactone and N-methyl-2-pyrrolidone as the solvent for a polyamic acid and/or soluble polymide as the reaction product of a tetracarboxylic acid dianhydride and a diamine. The liquid crystal alignment film is manufactured by using the aforementioned agent.

公开(公告)号：JP2001240801A

公开(公告)日：2001-09-04

申请号：JP2000052019

申请日：2000-02-28

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  TAMAKI KENTARO ,  SHINODA TOMOTAKA ,  OKADA TAKASHI ,  YAMADA KINJI

IPC: C09D183/04 ,  C09D5/25 ,  C09D183/02

Abstract: PROBLEM TO BE SOLVED: To provide a composition for film formation capable of forming a coating film, excellent in mechanical property, resistance to crack, in low hygroscopic property and low in dielectric constant as a layer insulation material. SOLUTION: This composition includes (A) a hydrolyzate or a condensate of one or more kind of compounds expressed by general formulas: T1aSi(OR2)4-1 (1), R3bSi(OR4)4-b (2), R5c(R6O)3-cSi-(R9)e-Si(OR7)3-dR8d (3), and (B) a compound expressed by general formula (4). (R1 is a monovalent organic group including phenyl group, R2, R4, R5, R6, R7 and R8 are each a monovalent organic group, R3 is a monovalent alkyl, R9 is oxygen or -(CH2)m-, R10, R11, R12, R13, R14 and R15 are each H, a 1-20C hydrocarbon, cyano, nitro, a 1-20C alkoxyl group or a halogen atom, a is 1 or 2, b and c are each an integer of 0-2, e is 0 or 1, m is 1-6).

公开(公告)号：JP2001011378A

公开(公告)日：2001-01-16

申请号：JP18716199

申请日：1999-07-01

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  INOUE YASUTAKE ,  TSUNODA MAYUMI ,  YAMADA KINJI

IPC: H01L21/312 ,  C09D183/04 ,  H01L21/316

Abstract: PROBLEM TO BE SOLVED: To obtain a film-forming composition capable of forming coating film having proper and uniform thickness, excellent in long-term storage stability of solution and dielectric constant and surface hardness characteristics of coating film. SOLUTION: This film-forming composition comprises (A) a hydrolyzate or condensation product of at least one kind of compound selected from a group comprising (A-1) a compound represented by the formula R1aSi(OR2)4-a [R1 is hydrogen atom, fluorine atom or a monovalent organic group; R2 is a monovalent organic group; (a) is 0-2] and (A-2) a compound represented by the formula R3b(R4O)3-bSi-(R7)d-Si(OR5)3-cR6c [R3 to R6 are each a monovalent organic group; (b) and (c) are each 0-2; R7 is oxygen atom or (CH2)n; (n) is 1-6; (d) is 0 or 1] or either one compound thereof and (B) a solvent comprising compounds of the formula C3H7OCH2CHCH3OH and the formula C3H7 OCHCH3CH2OH.

公开(公告)号：JP2000356854A

公开(公告)日：2000-12-26

申请号：JP16321599

申请日：1999-06-10

Applicant: JSR CORP

Inventor： SUGITA HIKARI ,  SAITO AKIO ,  YAMADA KINJI ,  NISHIKAWA MICHINORI ,  OTA YOSHIHISA ,  ISAMOTO YOSHITSUGU

IPC: H01L21/027 ,  C08K5/54 ,  C08L83/04 ,  C08L83/14 ,  G03F7/075 ,  G03F7/09 ,  G03F7/11 ,  C08K5/541

Abstract: PROBLEM TO BE SOLVED: To obtain a composition for a film under a resist disposed between the resist and an antireflection film, having both adhesion to the resist and resistance to a resist developing solution and also having resistance to oxygen ashing in the removal of the resist. SOLUTION: The composition contains (A) a hydrolyzate and/or a condensation product of at least one compound selected from the group comprising compounds of the formula R1aSi(OR2)4-a [where R1 is H, F or a monovalent organic group, R2 is a monovalent organic group and (a) is an integer of 0-2] and the formula R3b(R4O)3-bSi-(R7)d-Si(OR5)3-cR6c [where R3-R6 may be the same or different and are each a monovalent organic group, (b) and (c) may be the same or different and are each a number of 0-2, R7 is O or -(CH2)n-, (d) is 0 or 1 and (n) is a number of 1-6] and (B) a compound which generates an acid when irradiated with UV and/or heated.

公开(公告)号：JP2000327999A

公开(公告)日：2000-11-28

申请号：JP14092299

申请日：1999-05-21

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  TSUNODA MAYUMI ,  SHINODA TOMOTAKA ,  YAMADA KINJI

IPC: C08L83/04 ,  C09D5/25 ,  C09D183/04

Abstract: PROBLEM TO BE SOLVED: To obtain the subject composition capable of forming coating films having uniform thickness and useful for interlayer insulation films hard to cause cracks, excellent in elastic modulus or the like, and used in semiconductor elements or the like, by including a hydrolysis condensate produced from a specific trimethaxysilane compound and a specific tetraalkoxysilane. SOLUTION: This composition is obtained by including a hydrolysis condensate produced from (A) a compound of the formula R1Si(OCH3)3 (R1 is a univalent organic group) (e.g. methyltrimethoxysilane) and (B) a compound of the formula Si(OR2)4 (R2 is a >=2C univalent alkyl) (e.g. tetraethoxysilane). The component B is desirably to be at 5-80 pts.wt. based on 100 pts.wt. of the component A, calculated as a complete hydrolysis condensate. More precisely, this composition is obtained, for example, by intermittently or continuously adding water to an organic solvent wherein the components A and B are dissolved, in the presence of a catalyst such as maleic acid, and carrying out a reaction pref. at 15-80 deg.C for 30 min to 12 h.

公开(公告)号：JP2000327998A

公开(公告)日：2000-11-28

申请号：JP14092199

申请日：1999-05-21

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  YAMADA KINJI ,  GOTO KOHEI

IPC: C08L83/04 ,  C09D183/04

Abstract: PROBLEM TO BE SOLVED: To obtain a composition for forming a film excellent in dielectric constant characteristic and oxygen plasma ashing resistance, having high surface hardness of the coating film therefrom, and suitable for interlayer insulation films in semiconductor devices or the like. SOLUTION: This composition for forming films is obtained by including (A) a hydrolysis condensate of at least one kind of compound selected from the group consisting of a tetraalkoxysilane compound, trialkoxysilane compound and dialkoxysilane compound, satisfying the formula (1) described below, and (B) a hydrolysis condensate of at least one kind of compound selected from the group consisting of a tetraalkoxysilane compound, trialkoxysilane compound and dialkoxysilane compound, satisfying the formula (2) described below: 0 mol

公开(公告)号：JP2000309751A

公开(公告)日：2000-11-07

申请号：JP11895299

申请日：1999-04-27

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  YAMADA KINJI ,  GOTO KOHEI

IPC: H01L21/312 ,  C09D183/02 ,  C09D183/04

Abstract: PROBLEM TO BE SOLVED: To obtain a composition capable of forming a coating film excellent in thickness uniformity, hardness and dielectric properties by incorporating a specific alkoxysilane hydrolyzate and/or its condensate and a silane compound having a specified b.p. into the same. SOLUTION: This composition contains (A) a hydrolyzate of a compound represented by the formula: R1aSi(OR2)4-a and/or its condensate and (B) a silane compound having a b.p. of 300 deg.C or higher under normal pressure. In the formula, R1 and R2 are each a monovalent organic group. Preferably, ingredient A is a condensate of hydrolyzate and has a wt. average mol.wt. of 800-100,000. Ingredient A takes a two-dimensional or three-dimensional structure as a base polymer for film formation. When applied to a substrate (e.g. a silicone wafer) e.g. by spin coating, the composition can fill the grooves among fine patterns and, when heated, undergoes the hydrolysis and condensation of ingredients A and B to form a high-mol.-wt. polyorganosilixane, thus forming a glassy or giant polymer film.

公开(公告)号：JPH10333153A

公开(公告)日：1998-12-18

申请号：JP16042897

申请日：1997-06-03

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  MUTSUKA YASUAKI ,  YASUDA YOSHITOMO ,  MATSUKI YASUO

IPC: G02F1/1337 ,  C08K5/15 ,  C08K5/1515 ,  C08L79/08

Abstract: PROBLEM TO BE SOLVED: To provide a liquid crystal orienting agent which gives a liquid crystal orienting film having good liquid crystal orienting property, which hardly produces scratches by rubbing treatment on the surface of the film, and which has excellent durability against cleaning with isopropylalcohol after the rubbing treatment. SOLUTION: This orienting agent contains at least one kind of polymer selected from polymers having a polyamic acid structure and polymers having an imide structure produced by dehydration and ring-closing reaction of the polyamic acid, and an epoxy compd. containing nitrogen atoms. In this method, the average imidization rate of the polymers included in the orienting agent is >=45%.

公开(公告)号：JPH10204438A

公开(公告)日：1998-08-04

申请号：JP2610697

申请日：1997-01-24

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  YASUDA YOSHITOMO ,  KAWAMURA SHIGEO ,  MUTSUKA YASUAKI ,  MATSUKI YASUO

IPC: G02F1/1337 ,  C08G73/10 ,  C09K19/56

Abstract: PROBLEM TO BE SOLVED: To obtain a liquid crystal-orienting agent enabling to form liquid crystal-orienting films good in liquid crystal orientation, excellent in the long period stability of pre-tilt angles, and giving liquid crystal display elements, etc., which are useful for liquid crystal televisions, etc., by including a specific imide polymer, etc. SOLUTION: This liquid crystal-orienting agent comprises at least either of a polyamic acid obtained by reacting (A) a tetracarboxylic acid dianhydride of formula I (R is a tetravalent organic group), such as butane tetracarboxylic acid dianhydride, with (B) a diamine compound of formula II (R is a divalent to hexavalent organic group having a larger length than the longest diameter of 6Å; R is F, a fluoroalkyl, etc.; (n) is 1-5], such as a compound of formula III, and an imide polymer obtained by subjecting the polyamic acid to a dehydrative ring-closing reaction.