公开(公告)号：JP2002220471A

公开(公告)日：2002-08-09

申请号：JP2001019834

申请日：2001-01-29

Applicant: JSR CORP

Inventor： IWAZAWA HARUO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08G77/14 ,  G03F7/075

Abstract: PROBLEM TO BE SOLVED: To provide a new polysiloxane useful as a resin component for a resist material and the like, excellent in dry-etching resistance, and also excellent in basic properties as the resist such as transparency, sensibility, resolution and development to radiation. SOLUTION: The polysiloxane is composed of a structural unit (I) and/or the structural unit (II), expressed by the following general formula (1), wherein a weight-average molecular weight reduced to polystylene is 500-1,000,000. [Formula (1), each R denotes a hydrogen atom or a methyl group, independently each other, R' denotes a hydrogen atom, monovalent hydrocarbon group, monovalent hydrocarbon-halide group, halogen atom or primary to tertiary amino group, and n is an integer of 1-3].

公开(公告)号：JP2002202604A

公开(公告)日：2002-07-19

申请号：JP2000401302

申请日：2000-12-28

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  NAGAI TOMOKI ,  ISHII HIROYUKI ,  YAMAMOTO MASASHI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F20/56 ,  C08F32/08 ,  C08F220/18 ,  C08L33/04 ,  C08L33/26 ,  C08L45/00 ,  G03F7/033 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency to radiation, excellent in sensitivity, resolution and pattern shape and less liable to a change in line width due to the increase and decrease of space width as a chemical amplification type resist sensitive particularly to far UV typified by ArF excimer laser beam (193 nm wavelength). SOLUTION: The radiation sensitive resin composition contains (A1) a resin containing norbornene repeating units each having a (substituted) carboxylic acid amide group typified by an N,N-dimethylnorbornene-5-carboxylic acid amide or an N,N-dimethyltetracyclo[4.4.0.12,5.17,10]dodeca-3-ene-8-carboxylic acid amide or (A2) a resin containing (substituted) (meth)acrylamide repeating units typified by N,N-dimethyl(meth)acrylamide and (B) a radiation sensitive acid generating agent.

公开(公告)号：JP2001316333A

公开(公告)日：2001-11-13

申请号：JP2000133334

申请日：2000-05-02

Applicant: JSR CORP

Inventor： O ISAMU ,  MUTSUKA YASUAKI ,  SHIMIZU SHIGEO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C07C67/317 ,  C07C69/618 ,  C07D307/20 ,  C07D309/10 ,  C07D309/12

Abstract: PROBLEM TO BE SOLVED: To provide a vinylphenylpropionic acid derivative having an acid- decomposable substituent, and to provide a method for producing the same. SOLUTION: This derivative is, for example, a compound represented by the formula. The compound is produced, for example, by reacting t-butyl bromoacetate with tri-n-butylphosphine, reacting the produced corresponding quaternary phosphonium salt with a base, reacting the produced corresponding phosphorus ylide with 2,4,6-tris(3',5'-di-t-butyl-4'-hydroxybenzyl)methylstyrene, and then hydrolyzing the obtained corresponding quaternary phosphonium salt.

公开(公告)号：JP2001261834A

公开(公告)日：2001-09-26

申请号：JP2000070553

申请日：2000-03-14

Applicant: UNIV KANAGAWA ,  JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  NISHIMURA ISAO ,  SHIMOKAWA TSUTOMU

IPC: C08G75/26

Abstract: PROBLEM TO BE SOLVED: To provide a sulfur atom-containing polymer which contains sulfur atoms in a high density and is composed of repeating units having many aromatic rings, and to provide a method for producing the same. SOLUTION: This polymer is composed of repeating units represented by formula (1) and is obtained by the thermal polymerization of a cyclic thioaryl ester represented by formula (2). A compound selected from among quaternary onium salts and crown ether compounds is used as a polymerization catalyst.

公开(公告)号：JP2001209181A

公开(公告)日：2001-08-03

申请号：JP2000277966

申请日：2000-09-13

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  MURATA KIYOSHI ,  ISHII HIROYUKI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F220/18 ,  C08F222/06 ,  C08F232/00 ,  C08K5/00 ,  C08L45/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having superior dry etching resistance and high transparency to radiation, excellent in basic physical properties as a resist such as sensitivity, resolution and pattern shape, excellent also in shelf stability as a composition and retaining satisfactory adhesiveness to a substrate. SOLUTION: The radiation sensitive resin composition contains (A) a resin having repeating units derived from a derivative substituted by an oxygen- containing polar group (e.g. a hydroxyl or hydroxymethyl group) or a nitrogen- containing polar group (e.g. a cyano group), e.g. bicyclo[2.2.1]hept-2-ene or tetracyclo[4.4.0.12,5.17,10]dodec-3-ene, repeating units derived from maleic anhydride and repeating units derived from an acid dissociable ester derivative of (meth)acrylic acid typified by formula 1, 2 or 3 and (B) a radiation sensitive acid generating gent.

公开(公告)号：JP2001188346A

公开(公告)日：2001-07-10

申请号：JP2000089903

申请日：2000-03-28

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  IWAZAWA HARUO ,  SOYANO AKIMASA ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F20/28 ,  C08F32/02 ,  C08F32/08 ,  C08K5/00 ,  C08L101/06 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency to radiation as a chemical amplification type resist, excellent in basic physical properties as a resist such as dry etching resistance, sensitivity, resolution and pattern shape, not causing development defects in microfabrication and capable of producing a semiconductor device in a high yield. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid-dissociable group-containing resin having a skeleton of formula 1 preferably as a group of formula 2-1 or 2-2 and convertible to an alkali-soluble resin when the acid-dissociable group is dissociated and (B) a radiation sensitive acid generating agent. The component A is typified by a copolymer comprising repeating units of formula 3.

公开(公告)号：JP2001139632A

公开(公告)日：2001-05-22

申请号：JP32441399

申请日：1999-11-15

Applicant: JSR CORP

Inventor： MUTSUKA YASUAKI ,  SHIMIZU SHIGEO ,  SHIMOKAWA TSUTOMU ,  KUMANO KOJI

IPC: C08F8/14 ,  C08F12/22

Abstract: PROBLEM TO BE SOLVED: To provide a styrene compound having a carboxy or ester group and its production method. SOLUTION: A compound represented by the formula (wherein R1 to R7 are each H, a 1-30C alkly, or phenyl; R8 is a 1-50C alkyl, cholesteryl, cholestaryl, a 1-20C polyfluoroalkyl, phenyl, or an alkylphenyl having a 1-50C alkyl; n is 1-30; and m is 0 or 1) is provided together with its production method.

公开(公告)号：JP2000131846A

公开(公告)日：2000-05-12

申请号：JP30404398

申请日：1998-10-26

Applicant: JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  BESSHO NOBUO ,  SHIMOKAWA TSUTOMU ,  NISHIMURA ISAO

IPC: G03F7/039 ,  C08F8/14 ,  C08F212/14 ,  C08F220/28 ,  C08F220/30 ,  G02B5/20 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive material superior in sensitivity, developability, etching endurance, heat resistance, and adhesion to a substrate and developable with an aqueous alkaline developing solution and usable for a positive resist for manufacturing the semiconductor integrated circuit and the like by using a copolymer composed essentially of repeating units derived from specified monomers. SOLUTION: The radiation sensitive material is composed essentially of repeating units derived from the monomers each represented by formulae I and II in which each of (a) and (b) is an integer of 0-10; each of (b) and (c) is an integer of 1-10; (d) is an integer 0-10; (e) is an integer of 0-5; R1 is an H atom or a 1-5C alkyl or phenyl group; R2 is a halogen atom or a 1-5C alkyl or such alkoxy or phenyl or 2-10 dialkylamino group, and when R2 exists by >=2, each of them may be same or different.

公开(公告)号：JP2014152192A

公开(公告)日：2014-08-25

申请号：JP2013020688

申请日：2013-02-05

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MISHIMA ERI ,  NISHIMURA YUKIO ,  SHIMOKAWA TSUTOMU ,  YASHIRO TAKAO

IPC: C08F220/26 ,  G03F7/004 ,  G03F7/027 ,  G03F7/031 ,  G03F7/033

Abstract: PROBLEM TO BE SOLVED: To provide a resin composition for forming a cured film, which can form a cured film having excellent surface hardness and capable of fully satisfying general characteristics such as chemical resistance, heat resistance, transmittance, and dielectric constant and is excellent in storage stability.SOLUTION: The present invention is the thermosetting resin composition for forming a cured film, which contains [A] a polymer containing: a structural unit (I) containing at least one selected from the group consisting of a group represented by formula (1) and a group represented by formula (2); and a structural unit (II-1) containing a crosslinkable group (a1). In the formula (1), Rand Rare each a hydrogen atom, a C1-C4 alkyl group, or a C1-C4 fluorinated alkyl group. In the formula (2), Rand Rare each a hydrogen atom, a halogen atom, a C1-C4 alkyl group, or a C1-C4 fluorinated alkyl group. Preferably, the crosslinkable group (a1) is at least one selected from the group consisting of an oxiranyl group and an oxetanyl group.

Abstract translation: 要解决的问题：提供一种形成固化膜的树脂组合物，其可以形成具有优异的表面硬度并能够完全满足诸如耐化学性，耐热性，透射率和介电常数的一般特性的固化膜，并且在 储存稳定性。本发明是用于形成固化膜的热固性树脂组合物，其含有[A]含有下列物质的聚合物：含有选自由式（I）表示的基团的组中的至少一种的结构单元（I） 1）和由式（2）表示的基团; 和含有交联性基团（a1）的结构单元（II-1）。 在式（1）中，兰德Rare各自为氢原子，C1-C4烷基或C1-C4氟化烷基。 式（2）中，Rare Rare各自为氢原子，卤素原子，C1-C4烷基或C1-C4氟化烷基。 优选地，可交联基团（a1）为选自环氧乙烷基和氧杂环丁烷基中的至少一种。

公开(公告)号：JP2014137454A

公开(公告)日：2014-07-28

申请号：JP2013005605

申请日：2013-01-16

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MISHIMA ERI ,  NISHIMURA YUKIO ,  SHIMOKAWA TSUTOMU ,  YASHIRO TAKAO

IPC: G03F7/023 ,  C08F212/14 ,  C08F220/30 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive-type radiation-sensitive resin composition capable of forming a cured film excellent in storage stability and in addition, sufficiently satisfying general characteristics such as sensitivity, developing adhesion, heat resistance, chemical resistance, transmittance and dielectric constant while retaining good surface hardness.SOLUTION: The positive-type radiation-sensitive resin composition comprises: [A] a polymer having a structural unit (I) containing at least one selected from the group comprising groups represented by formula (1) mentioned below and groups represented by formula (2) mentioned below and a structural unit (II) containing a cyclic ether structure or a cyclic carbonate structure; and [B] an acid generator. In the formula (1) mentioned below, Rand Rare each independently a hydrogen atom, a 1-4C alkyl group or a 1-4C fluorinated alkyl group. In the formula (2) mentioned below, Rand Rare each independently a hydrogen atom, a halogen atom, a 1-4C alkyl group or a 1-4C fluorinated alkyl group.

Abstract translation: 要解决的问题：提供能够形成保存稳定性优异的固化膜的正型感光性树脂组合物，另外，充分满足一般特性如感光度，显影粘合性，耐热性，耐化学性，透光率和电介质 常数，同时保持良好的表面硬度。解决方案：正型辐射敏感树脂组合物包含：[A]具有结构单元（I）的聚合物，其含有选自下述式（1）表示的基团中的至少一种 和由下述式（2）表示的基团和含有环醚结构或环状碳酸酯结构的结构单元（II）; 和[B]酸生成剂。 在下述式（1）中，兰德尔芳基各自独立地为氢原子，1-4C烷基或1-4C氟化烷基。 在下述式（2）中，兰德尔芳基各自独立地为氢原子，卤素原子，1-4C烷基或1-4C氟化烷基。