公开(公告)号：DE60235663D1

公开(公告)日：2010-04-29

申请号：DE60235663

申请日：2002-01-17

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  YAMAMOTO MASAFUMI ,  KATAOKA ATSUKO ,  KAJITA TORU

IPC: G03F7/038 ,  G03F7/039 ,  G03F7/004

Abstract: A radiation-sensitive resin composition comprising: (A) an acid-dissociable group-containing resin, insoluble or scarcely soluble in alkali but becoming soluble in alkali when the acid-dissociable group dissociates, and containing recurring units with specific structures and (B) a photoacid generator of the formula (3), wherein R represents a monovalent aromatic hydrocarbon group, m is 1-8, and n is 0-5. The resin composition is suitable as a chemically-amplified resist responsive to deep ultraviolet rays such as a KrF excimer laser and ArF excimer laser, exhibits high transparency, excellent resolution, dry etching resistance, and sensitivity, produces good pattern shapes, and well adheres to substrates.

公开(公告)号：DE69736024D1

公开(公告)日：2006-07-06

申请号：DE69736024

申请日：1997-02-07

Applicant: JSR CORP

Inventor： SUWA MITSUHITO ,  KAJITA TORU ,  IWANAGA SHIN-ICHIRO ,  OTA TOSHIYUKI

IPC: G03F7/004 ,  C08F32/08 ,  C08G61/06 ,  C08G61/08 ,  C08L65/00 ,  G03F7/039 ,  H01L21/027

Abstract: A radiation-sensitive resin composition including (A) a resin containing an alicyclic skeleton in its backbone, and (B) a radiation-sensitive acid-generating agent, is provided. This composition is excellent in transparency with respect to radiation and dry etching resistance, and can give a photoresist pattern excellent in adhesion to substrates, sensitivity, resolution, and developability.

公开(公告)号：SG122899A1

公开(公告)日：2006-06-29

申请号：SG200507079

申请日：2005-11-17

Applicant: JSR CORP

Inventor： ICHINOHE DAIGO ,  NISHIO TOSHIHIRO ,  HAMAGUCHI HITOSHI ,  IWABUCHI TOMOKO ,  YONEKURA ISAMU ,  KAJITA TORU

公开(公告)号：AT315245T

公开(公告)日：2006-02-15

申请号：AT00120000

申请日：2000-09-14

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  MURATA KIYOSHI ,  ISHII HIROYUKI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/027 ,  G03F7/004 ,  G03F7/039

Abstract: A radiation-sensitive resin composition comprising (A) a resin containing an acid-dissociable group which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, comprising the following recurring unit (I), recurring unit (II), and at least one of the recurring units (III-1) and (III-2), and (B) a photoacid generator. The radiation-sensitive resin composition is suitable for use as a chemically-amplified resist showing sensitivity to active radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser, exhibiting superior dry etching resistance without being affected by types of etching gas, having high radiation transmittance, exhibiting excellent basic characteristics as a resist such as sensitivity, resolution, and pattern shape, possessing excellent storage stability as a composition, and exhibiting sufficient adhesion to substrates.

公开(公告)号：DE69733164D1

公开(公告)日：2005-06-09

申请号：DE69733164

申请日：1997-02-07

Applicant: JSR CORP

Inventor： SUWA MITSUHITO ,  KAJITA TORU ,  IWANAGA SHIN-ICHIRO ,  OTA TOSHIYUKI

IPC: C08G61/06 ,  C08G61/08 ,  C08L65/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  C08F32/08

Abstract: A radiation-sensitive resin composition including (A) a resin containing an alicyclic skeleton in its backbone, and (B) a radiation-sensitive acid-generating agent, is provided. This composition is excellent in transparency with respect to radiation and dry etching resistance, and can give a photoresist pattern excellent in adhesion to substrates, sensitivity, resolution, and developability.

公开(公告)号：EP1736500A4

公开(公告)日：2010-03-24

申请号：EP05734362

申请日：2005-04-13

Applicant: JSR CORP

Inventor： AKIIKE TOSHIYUKI ,  KAJITA TORU ,  YAMADA KINJI

IPC: C08G77/14 ,  C08G59/20 ,  C08G59/42 ,  C08K5/00 ,  C08K5/09 ,  C08L83/06 ,  C09K3/10 ,  H01L23/29 ,  H01L23/31 ,  H01L33/56

CPC classification number: C08G77/14 ,  C08K5/09 ,  C08L83/06 ,  C09K3/1018 ,  H01L23/293 ,  H01L33/56 ,  H01L2924/0002 ,  H01L2924/00

公开(公告)号：JP2003241383A

公开(公告)日：2003-08-27

申请号：JP2002046520

申请日：2002-02-22

Applicant: JSR CORP ,  IBM

Inventor： NISHIMURA YUKIO ,  HOSHI MICHIAKI ,  SOYANO AKIMASA ,  KAJITA TORU ,  ALLEN ROBERT D ,  VARANASI PUSHKARA RAO

IPC: G03F7/039 ,  C08F220/26 ,  C08F220/34 ,  C08F220/38 ,  C08F222/06 ,  C08F232/08 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in contrast, capable of forming a fine resist pattern with a high degree of accuracy and excellent also in transparency to a radiation, sensitivity and resolution. SOLUTION: The radiation-sensitive resin composition comprises (A) a resin comprising an acid-dissociable group-containing norbornene compound typified by 5-[(1-methylcyclohexyl)oxycarbonyl]norbornene or 5-(2-methyl-1- adamantyloxycarbonyl)norbornene and maleic anhydride, (B) a radiation-sensitive acid generator and (C) a compound typified by a di-t-butyl 1,3- adamantanedicarboxylate or 2,5-dimethyl-2,5-di(1-adamantylcarbonyloxy)hexane. Preferably the resin (A) further comprises a polar group-containing alicyclic ester of (meth)acrylic acid typified by 3-hydroxy-1-adamantyl (meth)acrylate. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2002128831A

公开(公告)日：2002-05-09

申请号：JP2000329503

申请日：2000-10-27

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  ISHII HIROYUKI ,  KATAOKA ATSUKO ,  YAMAMOTO MASASHI ,  KAJITA TORU

IPC: C07C69/753 ,  C08F32/00 ,  C08K5/00 ,  C08L45/00 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a novel norbornene-based compound having high transpar ency to radiation and excellent in sensitivity, resolution, pattern shape or the like and also having small variation in line width to temperature change when heated after exposure and is usable as a raw material or the like of a resin component in a chemical amplification type resist, provide a polymer of the compound, and also provide a radiation-sensitive resin composition containing a copolymer of the compound and a maleic anhydride. SOLUTION: The norbornene compound is represented by 5-[(2-norbornyl) methoxycarbonyl]norbornene, 5-[1-(2-methyl-2-norbornyl) ethoxycarbonyl]norbornene, 8-[(2-norbornyl) methoxycarbonyl]tetracyclo[4.4.1.12,5.17,10]dodecane or the like. The polymer is represented by the polymer of the norbornene-based compound or the like. The radiation-sensitive resin composition contains the copolymer of the norbornene-based compound or the like and the meleic anhydride and a radiation-sensitive acid generating agent.

公开(公告)号：JP2002082438A

公开(公告)日：2002-03-22

申请号：JP2000273962

申请日：2000-09-08

Applicant: JSR CORP

Inventor： MURATA KIYOSHI ,  YAMAMOTO MASASHI ,  SOYANO AKIMASA ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08K5/00 ,  C08L45/00 ,  C08L101/08 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency to radiation, excellent in basic physical properties as a resist, e.g. sensitivity, resolution and pattern shape, excellent also in shelf stability as a composition and retaining satisfactory adhesiveness to a substrate. SOLUTION: The radiation sensitive resin composition contains (A) a low molecular compound obtained by preparing a compound having one or more amino groups with at least one hydrogen atom bonding to a nitrogen atom and substituting a t-butoxycarbonyl group for one or more of such hydrogen atoms bonding to a nitrogen atom, (B) a radiation sensitive acid generating agent and (C) an alkali-insoluble or slightly alkali-soluble acid dissociable group- containing resin having an alicyclic structure in the principal chain and/or a side chain and a carboxylic acid anhydride structure in a side chain and convertible to an alkali-soluble resin when the acid dissociable group is dissociated.

公开(公告)号：JP2001235863A

公开(公告)日：2001-08-31

申请号：JP2000044784

申请日：2000-02-22

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F2/46 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent particularly in pattern shape as a chemical amplification type resist and excellent also in balance of characteristics including dry etching resistance, sensitivity and resolution. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin which is made alkali-soluble when the acid dissociable group is dissociated, (B) a radiation sensitive acid generating agent and (C) an abietic acid derivative of formula 1 [where R1-R4 are each H, hydroxyl, a 1-4C linear or branched alkyl or a 1-4C linear or branched alkoxyl and R5 is H, an optionally substituted 1-20C alkyl or -CH2COO6 (R6 is a 1-18C alkyl)].