公开(公告)号：JP2005197731A

公开(公告)日：2005-07-21

申请号：JP2004382968

申请日：2004-12-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BUTLER HANS

IPC: G01B11/00 ,  G01B9/02 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F9/7088 ,  G03F7/70633 ,  G03F9/7076

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus for measuring an overlay as a numerical value of a machine performance, quickly at any place on a wafer. SOLUTION: This measurement is performed by measuring an amplitude of a diffraction order of a diffraction pattern obtained from an interference between a pattern on a wafer level and a pattern projected on the pattern on the wafer level. A projected pattern exists on a reticle level. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于在晶片上的任何位置快速地测量覆盖层作为机器性能的数值的装置。 解决方案：通过测量从晶片级上的图案和投影在晶片级上的图案上的图案之间的干涉获得的衍射图案的衍射级的幅度来进行该测量。 投影图案存在于标线层上。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：WO2013143777A2

公开(公告)日：2013-10-03

申请号：PCT/EP2013053084

申请日：2013-02-15

Applicant: ASML NETHERLANDS BV

Inventor： VAN DE VEN BASTIAAN LAMBERTUS WILHELMUS MARINUS ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  LOOPSTRA ERIK ROELOF ,  BUTLER HANS

IPC: G03F7/20

CPC classification number: G03F7/70758 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70733 ,  G03F9/70 ,  H02K41/02

Abstract: A substrate table system includes a substrate table and a dual directional motor for moving the substrate table in a plane of movement. The plane of movement is defined by a first direction and a second direction perpendicular to the first direction. The dual directional motor includes: a first pusher structure extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate so as to form a first motor arranged to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure extending in the first direction, the substrate table being movable in respect of the second pusher structure (along the first and second directions), the second pusher structure and the substrate table being arranged to cooperate so as to form a second motor arranged to exert a force between the second pusher structure and the substrate table in the second direction.

Abstract translation: 衬底台系统包括衬底台和用于在运动平面中移动衬底台的双向电动机。 运动平面由垂直于第一方向的第一方向和第二方向限定。 双向电动机包括：沿第一方向延伸的第一推动器结构，衬底台相对于第一推动器结构可移动，第一推动器结构和衬底台被布置成协作以形成布置成 在第一方向上在第一推动器结构和基板台之间施加力; 以及沿所述第一方向延伸的第二推动器结构，所述衬底台可相对于所述第二推动器结构（沿着所述第一和第二方向）移动，所述第二推动器结构和所述衬底台被配置为协作以形成第二推动器结构 电动机布置成在第二方向上在第二推动器结构和衬底台之间施加力。

公开(公告)号：WO2014114405A3

公开(公告)日：2014-09-25

申请号：PCT/EP2013076310

申请日：2013-12-12

Applicant: ASML NETHERLANDS BV

Inventor： VAN DE KERKHOF MARCUS ,  VAN OOSTEN ANTON ,  BUTLER HANS ,  LOOPSTRA ERIK ,  VAN DER WIJST MARC ,  ZAAL KOEN

IPC: G03F7/20

CPC classification number: G03F7/702 ,  G02B7/182 ,  G02B7/1827 ,  G02B26/0825 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/70266 ,  G03F7/70575 ,  G03F7/709

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror (510) having an actuator (500) for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller (515a, 515b) for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.

Abstract translation: 公开了一种被配置为将光束投射到光刻设备内的基板的目标部分上的系统。 该系统包括具有用于定位反射镜的致动器（500）和/或配置反射镜的形状的反射镜（510），致动器还向反射镜提供主动阻尼，以及用于产生致动器控制的控制器（515a，515b） 用于控制所述致动器的信号。 当定位所述反射镜和/或构造所述反射镜的形状时，第一坐标系用于控制所述致动器，并且当向所述反射镜提供主动阻尼时，使用第二坐标系来控制所述致动器。

公开(公告)号：NL2010632A

公开(公告)日：2013-10-29

申请号：NL2010632

申请日：2013-04-15

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  WIJST MARC

IPC: G03F7/20

Abstract: A lithography apparatus and device manufacturing methods are disclosed. A lithography apparatus includes a support stage, and a measurement system including a sensor part and a reference part, the measurement system being configured to determine the position and/or orientation of the support stage, or of a component mounted on the support stage, relative to a reference frame by using the sensor part to interact with the reference part, wherein: the reference frame comprises N sub-frames coupled together so as to behave predominantly as a single rigid body with respect to vibrations below a first reference frequency and predominantly as an N-body system with respect to vibrations above a second reference frequency, where N is an integer greater than 1.

公开(公告)号：NL2010594A

公开(公告)日：2013-10-29

申请号：NL2010594

申请日：2013-04-09

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS

IPC: G03F7/20

公开(公告)号：DE102011007917A1

公开(公告)日：2012-10-25

申请号：DE102011007917

申请日：2011-04-21

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT GMBH

Inventor： FISCHER JUERGEN ,  SCHOENHOFF ULRICH ,  GEUPPERT BERNHARD ,  BUTLER HANS ,  DE JONGH ROBERTUS JOHANNES MARINUS

IPC: G02B7/00 ,  G03F7/20

Abstract: Die Erfindung betrifft Anordnungen zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage. Eine Anordnung zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage gemäß einem Aspekt der Erfindung weist wenigstens zwei Aktoren (620, 630, 720, 730, 820, 830) auf, welche jeweils über eine mechanische Ankopplung (621, 631, 721, 731, 821, 831) an das Element (610, 710, 810) gekoppelt sind und jeweils eine in wenigstens einem Freiheitsgrad regelbare Kraft auf das Element ausüben, wobei für jeden dieser Aktoren eine zu dem jeweiligen Aktor gehörende Aktormasse mit der dem Aktor zugeordneten mechanischen Ankopplung ein als Tiefpassfilter wirkendes Masse-Feder-System ausbildet, und wobei die Eigenfrequenzen dieser Masse-Feder-Systeme eine maximale Abweichung voneinander in Höhe von 10% der größten dieser Eigenfrequenzen aufweisen.

公开(公告)号：NL2006843A

公开(公告)日：2012-01-09

申请号：NL2006843

申请日：2011-05-25

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  HEERTJES MARCEL

IPC: G03F7/20

公开(公告)号：NL2005414A

公开(公告)日：2011-05-02

申请号：NL2005414

申请日：2010-09-28

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  LOOPSTRA ERIK

IPC: G03F7/20

公开(公告)号：SG162700A1

公开(公告)日：2010-07-29

申请号：SG2009084849

申请日：2009-12-18

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS MARIA

Abstract: A method for damping an object in two or more degrees of freedom, including measuring a position quantity at each of the two or more measurement locations; extracting from the measured position quantities a measurement signal for each dynamic mode; feeding the measurement signal of a dynamic mode to a controller unit associated with the respective dynamic mode, the controller unit providing for each dynamic mode an output signal on the basis of the respective measurement signal; and providing a control signal to each of the two or more actuators, the control signal for each actuator being based on output signals of one or more controller units.

公开(公告)号：NL2003424A

公开(公告)日：2010-04-08

申请号：NL2003424

申请日：2009-09-02

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  HOON CORNELIUS

IPC: G03F7/20

Abstract: A projection assembly includes a projection system to project a patterned radiation beam onto a substrate, a damping system to dampen a vibration of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, the active damping subsystem including a sensor to measure a position of the interface damping mass, an electromagnetic actuator to exert a force on the interface damping mass, and a controller to drive the electromagnetic actuator based on a signal provided by the sensor, the active damping subsystem including a reaction mass for the electromagnetic actuator to exert a counterforce upon based on the signal provided by the first sensor.