公开(公告)号：JP2011040740A

公开(公告)日：2011-02-24

申请号：JP2010173783

申请日：2010-08-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： HOL SVEN ANTOIN JOHAN ,  VAN EIJK JAN ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  JOHANNES PETRUS MARTINUS BERNARDUS VERMEULEN ,  GEERT-JAN PETRUS NAAIJKENS ,  KESSELS MARIJN ,  HOBBELEN DANIEL GODFRIED EMMA

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68 ,  H02N15/00

CPC classification number: G03F7/70758

Abstract: PROBLEM TO BE SOLVED: To provide an improved positioning system of lithography equipment in which heat to generate force is not produced in a sub-stage or its vicinity. SOLUTION: In this positioning system, a sub-stage 9 is movable in one direction between a first position 11 and a second position 13 against a main-stage 5. This method includes positioning the first stage using a passive force system which starts moving by the positioning of the main-stage 5. The passive force system includes tow magnet systems 19 and 21, and each magnet system 19 or 21 is formed as to provide a non-contact force to the second stage against the first stage in the above direction. Force is generated as a resultant force in the above moving direction by the passive force system and given to the first stage, and the magnitude and/or direction of the resultant force are determined based on the position of the first stage against the second stage. The first stage has a zero force position 23 to be zero in resultant force in between the first position 11 and the second position 13. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种改进的光刻设备的定位系统，其中在次级或其附近不产生产生力的热量。 解决方案：在该定位系统中，子级9可以在第一位置11和第二位置13之间的一个方向上抵靠主级5移动。该方法包括使用被动力系统定位第一级， 通过主级5的定位开始移动。被动力系统包括丝束磁体系统19和21，并且每个磁体系统19或21形成为在第二阶段中相对于第一阶段提供非接触力 上述方向。 通过被动力系统产生作为上述移动方向的合力并施加到第一阶段的力，并且基于第一阶段相对于第二阶段的位置来确定合力的大小和/或方向。 第一阶段在第一位置11和第二位置13之间的合力中具有为零的零力位置23。（C）2011，JPO和INPIT

公开(公告)号：JP2011192987A

公开(公告)日：2011-09-29

申请号：JP2011047062

申请日：2011-03-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VALENTIN CHRISTIAAN LOUIS ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  MUNNIG SCHMIDT ROBERT-HAN ,  VAN BREE BARTHOLOMEUS CATHARINA THOMAS

IPC: H01L21/027

CPC classification number: G03F7/70266 ,  G03B27/52 ,  G03F7/70258 ,  G03F7/703 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus projecting a pattern onto a substrate at a high degree of focus.
SOLUTION: The lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An optical element of the projection system is adjustable. The lithographic apparatus includes a controller to control the adjustable optical element. The controller is arranged to drive the optical element so as to at least partly compensate for a magnification resulting from a bending of the patterning device.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供以高度聚焦将图案投影到基板上的光刻设备。 解决方案：光刻设备包括：被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上。 投影系统的光学元件是可调节的。 光刻设备包括控制可调光学元件的控制器。 控制器布置成驱动光学元件，以便至少部分地补偿由图案形成装置的弯曲引起的放大倍数。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011072184A

公开(公告)日：2011-04-07

申请号：JP2010206325

申请日：2010-09-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： HOL SVEN ANTOIN JOHAN ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  CADEE THEODORUS PETRUS MARIA ,  KESSELS MARIJN ,  HOBBELEN DANIEL GODFRIED EMMA

IPC: H02K33/00 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70758 ,  H02K1/146 ,  H02K41/03 ,  H02K2201/18 ,  H02K2213/12

Abstract: PROBLEM TO BE SOLVED: To provide an actuator for exerting a force and a torque on an object. SOLUTION: The actuator includes a first part that is movable with respect to a second part of the actuator in at least a first degree of freedom. The object is mounted to the first part. One of these parts is provided with a first electrical coil that is arranged to cooperate with a magnetizable portion of the other part. A controller of the actuator is configured to generate a first electrical current through the first electrical coil for generating a force between these parts. The one of these parts is provided with a second electrical coil which is arranged to cooperate with a magnetizable portion of the other part, and the controller is further configured to generate a second electrical current through the second coil and the first electrical current through the first electrical coil for exerting the force and torque between these parts. Therefore, the actuator is configured to exert the force and the torque on the object with respect to the second part. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供用于在物体上施加力和扭矩的致动器。 解决方案：致动器包括能够以至少第一自由度相对于致动器的第二部分移动的第一部件。 物体安装到第一部分。 这些部件中的一个设置有第一电线圈，其布置成与另一部分的可磁化部分配合。 致动器的控制器被配置为产生通过第一电线圈的第一电流，以在这些部件之间产生力。 这些部件中的一个设置有第二电线圈，其布置成与另一部分的可磁化部分配合，并且控制器还被配置为产生通过第二线圈的第二电流和通过第一线圈的第一电流 用于在这些部件之间施加力和扭矩的电线圈。 因此，致动器构造成相对于第二部分施加力和扭矩对物体。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：WO2013113632A2

公开(公告)日：2013-08-08

申请号：PCT/EP2013051472

申请日：2013-01-25

Applicant: ASML NETHERLANDS BV ,  KONINKL PHILIPS ELECTRONICS NV

Inventor： VAN DE VEN BASTIAAN LAMBERTUS WILHELMUS ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  CADEE THEODORUS PETRUS MARIA ,  RIJS ROBERTUS MATHIJS GERARDUS ,  VAN LIESHOUT RICHARD HENRICUS ADRIANUS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70758 ,  G03F7/709 ,  H02K41/02

Abstract: A movable stage system is configured to support an object subjected to a lithography process. A short stroke part is configured to support the object and a long stroke part is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element is arranged between the short and long stroke parts. A position control system maintains a substantially constant distance between the shielding element and the short stroke part.

Abstract translation: 可移动台系统被配置为支撑经受光刻处理的物体。 短行程部件被配置为支撑物体，并且长行程部件被配置为支撑短行程部件。 短行程部分可以相对于长行程部分在相对较小的移动范围内移动。 长行程部件可相对于布置成支撑长行程部件的基座支撑件在相对较大的运动范围内移动。 屏蔽元件布置在短行程部件和长行程部件之间。 位置控制系统在屏蔽元件和短行程部件之间保持基本恒定的距离。

公开(公告)号：WO2013143777A2

公开(公告)日：2013-10-03

申请号：PCT/EP2013053084

申请日：2013-02-15

Applicant: ASML NETHERLANDS BV

Inventor： VAN DE VEN BASTIAAN LAMBERTUS WILHELMUS MARINUS ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  LOOPSTRA ERIK ROELOF ,  BUTLER HANS

IPC: G03F7/20

CPC classification number: G03F7/70758 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70733 ,  G03F9/70 ,  H02K41/02

Abstract: A substrate table system includes a substrate table and a dual directional motor for moving the substrate table in a plane of movement. The plane of movement is defined by a first direction and a second direction perpendicular to the first direction. The dual directional motor includes: a first pusher structure extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate so as to form a first motor arranged to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure extending in the first direction, the substrate table being movable in respect of the second pusher structure (along the first and second directions), the second pusher structure and the substrate table being arranged to cooperate so as to form a second motor arranged to exert a force between the second pusher structure and the substrate table in the second direction.

Abstract translation: 衬底台系统包括衬底台和用于在运动平面中移动衬底台的双向电动机。 运动平面由垂直于第一方向的第一方向和第二方向限定。 双向电动机包括：沿第一方向延伸的第一推动器结构，衬底台相对于第一推动器结构可移动，第一推动器结构和衬底台被布置成协作以形成布置成 在第一方向上在第一推动器结构和基板台之间施加力; 以及沿所述第一方向延伸的第二推动器结构，所述衬底台可相对于所述第二推动器结构（沿着所述第一和第二方向）移动，所述第二推动器结构和所述衬底台被配置为协作以形成第二推动器结构 电动机布置成在第二方向上在第二推动器结构和衬底台之间施加力。

公开(公告)号：WO2014122151A3

公开(公告)日：2014-11-20

申请号：PCT/EP2014052204

申请日：2014-02-05

Applicant: ASML HOLDING NV ,  ASML NETHERLANDS BV

Inventor： DELPUERTO SANTIAGO E ,  LIPSON MATTHEW ,  HENDERSON KENNETH ,  LAFARRE RAYMOND ,  MARKOYA LOUIS JOHN ,  UITTERDIJK TAMMO ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  VAN DER WILK RONALD

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

Abstract translation: 诸如夹具（310）的支撑件构造成可释放地保持诸如掩模版（300）的图案形成装置以将其固定并防止其热引起的变形。 例如，静电夹具包括具有相对的第一（313）和第二（315）表面的第一基底（312），位于第一表面上并被构造成接触光罩的多个毛刺（316），第二基底 ）具有相对的第一（317）和第二（319）表面。 第二衬底的第一表面耦合到第一衬底的第二表面。 多个冷却元件（318）位于第二基板的第一表面和第一基板的第二表面之间。 冷却元件构造成使电子从第一衬底的第二表面移动到第二衬底的第一表面。 每个冷却元件基本上与相应的毛刺对齐。

公开(公告)号：SG182052A1

公开(公告)日：2012-07-30

申请号：SG2011085982

申请日：2011-11-21

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  CADEE THEODORUS PETRUS MARIA ,  DE BOEIJ JEROEN

Abstract: Lithography apparatus comprising a projection system a carrier; and a drive system for moving the carrier relative to the projection system in a plane defined by reference to orthogonal axes X and Y, wherein: the drive system comprises: a shuttle constructed and arranged to move parallel to the Y-axis; a shuttle connector for connecting the shuttle to the carrier, the shuttle connector being such as to allow movement of the carrier in a direction parallel to the X-axis relative to the shuttle; and a shuttle driver for driving movement of the shuttle parallel to the Y-axis, wherein: the shuttle is located to one side only of the carrier in a direction parallel to the X-axis and only one of the shuttle is connected to the carrier; and the shuttle driver and shuttle connector are configured to supply at least 10% of the Y-component of forces applied to the carrier by the drive system.Fig. 1

公开(公告)号：CA3066546A1

公开(公告)日：2018-12-20

申请号：CA3066546

申请日：2018-06-08

Applicant: ASML NETHERLANDS BV

Inventor： VLES DAVID FERDINAND ,  ANDE CHAITANYA KRISHNA ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  GIESBERS ADRIANUS JOHANNES MARIA ,  JANSSEN JOHANNES JOSEPH ,  JANSSEN PAUL ,  KLOOTWIJK JOHAN HENDRIK ,  KNAPEN PETER SIMON ANTONIUS ,  KURGANOVA EVGENIA ,  MEIJER MARCEL PETER ,  MEIJERINK WOUTER ROGIER ,  NASALEVICH MAXIM ALEKSANDROVICH ,  NOTENBOOM ARNOUD WILLEM ,  OLSMAN RAYMOND ,  PATEL HRISHIKESH ,  PETER MARIA ,  VAN DEN BOSCH GERRIT ,  VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES ,  VAN DER ZANDE WILLEM JOAN ,  VAN ZWOL PIETER-JAN ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  VOORTHUIJZEN WILLEM-PIETER ,  WONDERGEM HENDRIKUS JAN ,  ZDRAVKOV ALEXANDAR NIKOLOV

IPC: G03F1/62 ,  G03F1/64

Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.