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    82.
    发明专利
    未知

    公开(公告)号：DE69216552T2

    公开(公告)日：1997-04-24

    申请号：DE69216552

    申请日：1992-10-28

    Applicant: CANON KK

    Inventor： EBINUMA RYUICHI

    IPC: G21K5/04 ,  G03F7/20 ,  H01L21/027

    Abstract: X-rays enter an airtight chamber (4) through a beam duct (15), pass through a transmission window (5), and expose a wafer (1) and mask (3) disposed outside the airtight chamber. The wafer and mask are held by a wafer chuck (2a) and a mask holder (6), respectively. The mask holder includes a pressure sensor (7), which detects variations in the atmospheric pressure. An output from the pressure sensor is converted into a change in the intensity of the x-rays by an arithmetic unit (17), and is transmitted to a control unit (19), which controls a driving unit (18) of a shutter (8). By thus controlling the moving speed of the shutter in accordance with variations in the atmospheric pressure, it is possible to prevent variations in the amount of x-ray exposure of the wafer.

    84.
    发明专利
    未知

    公开(公告)号：DE3855083T2

    公开(公告)日：1996-08-08

    申请号：DE3855083

    申请日：1988-11-11

    Applicant: CANON KK

    Inventor： MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI ,  CHIBA YUJI

    IPC: B41J2/165 ,  B41J29/17

    Abstract: An ink jet recording apparatus comprising: a non-contact print mode in which medium to be recorded and conveyed to a region in which printing can be performed is subjected to be recording by discharging ink in a non-contact manner from a recording head (IJH) confronting the medium to be recorded at a predetermined interval; and a contact cleaning mode in which a cleaning sheet (CP) which has been conveyed into the region in which printing can be performed by using at least a part of a conveyance route for the medium to be recorded is brought into contact with the recording head (IJH) and then the cleaning sheet is discharged from the region in which printing can be performed.

    87.
    发明专利
    未知

    公开(公告)号：DE68915239D1

    公开(公告)日：1994-06-16

    申请号：DE68915239

    申请日：1989-10-04

    Applicant: CANON KK

    Inventor： IWAMOTO KAZUNORI ,  UZAWA SHUNICHI ,  KARIYA TAKAO ,  EBINUMA RYUICHI

    IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

    Abstract: An X-ray exposure system, for exposing a semiconductor wafer to a mask with X-rays contained in synchrotron radiation, is disclosed. In this system, the mask (1) and the wafer (46) are held on a main frame (4) so that their surfaces extend substantially in parallel to a vertical axis. The main frame suspends from a supporting frame (10) through a plurality of air mounts (7) each being displaceable vertically. The supporting frame is placed on the same reference surface as of a SOR ring (17) that produces synchrotron radiation (20). By using these air mounts, any tilt of the mask and the wafer relative to the irradiation region of the synchrotron radiation as well as the position of the mask and the wafer in the vertical direction, with respect to the irradiation region, can be controlled and maintained constant. Thus, accurate pattern printing is ensured.

    88.
    发明专利
    未知

    公开(公告)号：FR2585290A1

    公开(公告)日：1987-01-30

    申请号：FR8610750

    申请日：1986-07-24

    Applicant: CANON KK

    Inventor： ICHIHASHI HIROO ,  OZAWA MASAKAZU ,  EBINUMA RYUICHI ,  SAITO ATSUSHI

    IPC: B41J2/165 ,  B41J29/02 ,  B41J3/04 ,  B41J29/00

    Abstract: A capping device for an ink jet recorder is provided with a support frame of substantially L-shaped cross-section contained in a frame and supporting an ink absorbing member inside thereof, and a throttle plate in contact with the underside of the absorbing member and disposed substantially parallel to the support frame, the capping device being so disposed that the rear end edge of the throttle plate opposite to a recording head is situated vertically below the side edge surface of the recording head. The specification also discloses an ink jet recording apparatus having such capping device. (FIGS. 1 and 6-8). A flow path for directing liquid squeezed from the absorbing member has upper and lower stages, the upper stage having a sufficiently large diameter that a liquid meniscus does not form and the lower stage having a small diameter that permits a meniscus to form. (FIGS. 9 and 10).

    STAGE DEVICE, EXPOSURE DEVICE USING IT, AND MANUFACTURE OF DEVICE
    89.
    发明专利
    STAGE DEVICE, EXPOSURE DEVICE USING IT, AND MANUFACTURE OF DEVICE 失效

    公开(公告)号：JPH11189332A

    公开(公告)日：1999-07-13

    申请号：JP35980597

    申请日：1997-12-26

    Applicant: CANON KK

    Inventor： EBINUMA RYUICHI ,  MIZUNO MAKOTO

    IPC: G12B5/00 ,  B65G49/07 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

    Abstract: PROBLEM TO BE SOLVED: To restrain vibration generated on a stage by providing a connecting means for transmitting drive reaction generated accompanying movement of the stage to a counter mass mechanism. SOLUTION: Because a reticule stage 8 is moved at performing exposure, reaction is generated on a linear motor stator as the drive means of the reticule stage 8 at acceleration or deceleration. Because the stator is freely supported concerning the moving direction of the reticule stage 8, the generated reaction is transmitted to a linear motor stator 33 for driving a counter mass. Meanwhile, when the counter mass 31 is driven, similarly reaction is generated from the stator 33. By this reaction, the reaction from the recticule stage 8 is reduced. Where the mass of the recticule stage 8 is M, the acceleration is A, and the mass of the counter mass 31 is (m), for reducing reaction, the acceleration (a) of the counter mass 31 is set as a=A×M/m.

    LINEAR MOTOR, STAGE APPARATUS, SCANNING-TYPE ALIGNER, AND DEVICE MANUFACTURE USING THEM
    90.
    发明专利
    LINEAR MOTOR, STAGE APPARATUS, SCANNING-TYPE ALIGNER, AND DEVICE MANUFACTURE USING THEM 失效

    公开(公告)号：JPH1118406A

    公开(公告)日：1999-01-22

    申请号：JP17026997

    申请日：1997-06-26

    Applicant: CANON KK

    Inventor： EBINUMA RYUICHI

    IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  H02K41/03

    Abstract: PROBLEM TO BE SOLVED: To obtain a linear motor and storage apparatus with respective high straightnesses and make improvable the exposure transcription accuracy of a scanning-type exposure apparatus using them by providing an electromagnetic means generating the driving forces for displacing its movable element, not only in the scanning direction thereof but also in the direction orthogonal to the scanning one. SOLUTION: In a stator unit, there are provided a plurality of coils 451 (first coils) arranged along a Y-direction (scanning direction) and for generating a drive force in a predetermined scanning scope, and a single coil 452 (a second coil) for generating also a drive force in the orthogonal X-direction to the Y-direction in a very small scope. The first coils 451 and second coil 452 are arranged in the same plane. Here, the number of the second coil 452 is made smaller than the one of the first coils 451. The length of the second coil 452 in the Y-direction is made nearly equal to the length for arranging thereby the first coils 451 in the Y-direction. In a movable-element unit, proper magnetic circuits are formed at its corresponding places suitable for the coils of the stator in the X and Y-directions.

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