기판 액처리 장치 및 기판 액처리 방법
    2.
    发明公开
    기판 액처리 장치 및 기판 액처리 방법 审中-实审
    液体加工设备和液体加工方法

    公开(公告)号:KR1020140148330A

    公开(公告)日:2014-12-31

    申请号:KR1020140074886

    申请日:2014-06-19

    CPC classification number: B08B3/02 H01L21/67051

    Abstract: An objective of the present invention is to provide an apparatus and a method of liquid processing a substrate, in which particles are suppressed from attaching to a substrate so that the substrate is satisfactorily processed. The liquid processing apparatus (1) of the present invention includes: a first processing liquid discharge unit (12) to discharge a first processing liquid in a form of liquid droplets, which contains pure water toward the surface of the substrate (13) ; and a second processing liquid discharge unit (13) to discharge a second processing liquid, which inverts a zeta electrical potential of a surface of the substrate (3) to a negative zeta potential, toward the surface of the substrate (3) processed by the first processing liquid in the form of the liquid droplets. For example, a pure water having carbon dioxide added is used as the first processing liquid and an SC-1 liquid is used as the second processing liquid.

    Abstract translation: 本发明的目的是提供一种液体处理衬底的装置和方法,其中抑制颗粒附着到衬底上,使得衬底被令人满意地加工。 本发明的液体处理装置(1)包括:第一处理液体排出单元(12),其将含有纯水的液滴形式的第一处理液体朝向基板(13)的表面排出; 以及第二处理液体排出单元(13),用于将基板(3)的表面的ζ电位反转为负ζ电位的第二处理液朝向由所述基板(3)处理的基板(3)的表面 首先以液滴的形式处理液体。 例如,使用添加有二氧化碳的纯水作为第一处理液,使用SC-1液作为第二处理液。

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