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公开(公告)号:KR102251256B1
公开(公告)日:2021-05-11
申请号:KR1020140074886
申请日:2014-06-19
Applicant: 도쿄엘렉트론가부시키가이샤
Inventor: 이노우에시게히사 , 나가야마다이스케 , 마츠키가츠후미 , 마스즈미다쿠로 , 요시다유키 , 아이바라메이토쿠 , 기요세히로미 , 우노다카시 , 마루야마히로타카 , 고야마가즈야 , 나가자와다카시
IPC: H01L21/302 , H01L21/683
Abstract: 본발명은액적상의처리액으로기판을처리하는기판액처리장치및 기판액처리방법에있어서, 기판의표면에파티클이부착되는것을억제하여, 기판의처리를양호하게행할수 있도록하는것을목적으로한다. 본발명에서는, 기판액처리장치(1)에서, 기판(3)의표면을향해순수를함유하는액적상의제1 처리액을토출하는제1 처리액토출부(12)와, 상기액적상의제1 처리액으로처리한상기기판(3)의표면을향해, 상기기판(3) 표면의제타전위를네거티브로반전시키는제2 처리액을토출하는제2 처리액토출부(13)를갖는것으로하였다. 예컨대상기제1 처리액으로서는, 이산화탄소가첨가된순수가이용되고, 상기제2 처리액으로서는, SC-1액이이용된다.
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公开(公告)号:KR1020140148330A
公开(公告)日:2014-12-31
申请号:KR1020140074886
申请日:2014-06-19
Applicant: 도쿄엘렉트론가부시키가이샤
Inventor: 이노우에시게히사 , 나가야마다이스케 , 마츠키가츠후미 , 마스즈미다쿠로 , 요시다유키 , 아이바라메이토쿠 , 기요세히로미 , 우노다카시 , 마루야마히로타카 , 고야마가즈야 , 나가자와다카시
IPC: H01L21/302 , H01L21/683
CPC classification number: B08B3/02 , H01L21/67051
Abstract: An objective of the present invention is to provide an apparatus and a method of liquid processing a substrate, in which particles are suppressed from attaching to a substrate so that the substrate is satisfactorily processed. The liquid processing apparatus (1) of the present invention includes: a first processing liquid discharge unit (12) to discharge a first processing liquid in a form of liquid droplets, which contains pure water toward the surface of the substrate (13) ; and a second processing liquid discharge unit (13) to discharge a second processing liquid, which inverts a zeta electrical potential of a surface of the substrate (3) to a negative zeta potential, toward the surface of the substrate (3) processed by the first processing liquid in the form of the liquid droplets. For example, a pure water having carbon dioxide added is used as the first processing liquid and an SC-1 liquid is used as the second processing liquid.
Abstract translation: 本发明的目的是提供一种液体处理衬底的装置和方法,其中抑制颗粒附着到衬底上,使得衬底被令人满意地加工。 本发明的液体处理装置(1)包括:第一处理液体排出单元(12),其将含有纯水的液滴形式的第一处理液体朝向基板(13)的表面排出; 以及第二处理液体排出单元(13),用于将基板(3)的表面的ζ电位反转为负ζ电位的第二处理液朝向由所述基板(3)处理的基板(3)的表面 首先以液滴的形式处理液体。 例如,使用添加有二氧化碳的纯水作为第一处理液,使用SC-1液作为第二处理液。
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