Abstract:
기판에 공급되는 세정액의 공급 형태를 혹은 세정액에 걸리는 압력의 형태를 일정 시간씩 공급과 중단을 반복하는 펄스 타입으로 하며, 세정액이 공급되는 압력은 20kg중/cm 2 정도의 고압으로 설정하는 세정 장치가 개시된다. 본 발명에 따르면, 세정 공정 중 기판면에 수막이 형성되어 세정 효율을 떨어뜨리는 문제를 없애 세정 효율을 높이고, 세정액을 절약할 수 있다.
Abstract:
본 발명은 대형 기판의 양산 공정에 더욱 적합하고, 고정세의 패터닝이 가능하도록 하는 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치를 위하여, 증착 물질을 방사하는 증착원과, 상기 증착원의 일 측에 배치되며 제1방향을 따라 복수개의 증착원 노즐들이 형성된 증착원 노즐부와, 상기 증착원 노즐부와 대향되게 배치되고 상기 제1방향을 따라 복수개의 패터닝 슬릿들이 배치되는 패터닝 슬릿 시트와, 상기 증착원 노즐부와 상기 패터닝 슬릿 시트 사이에 상기 제1방향을 따라 배치되어 상기 증착원 노즐부와 상기 패터닝 슬릿 시트 사이의 공간을 복수개의 증착 공간들로 구획하는 복수개의 차단판들을 포함하는 차단판 어셈블리를 포함하는 박막 증착 어셈블리를 구비하며, 상기 차단판들 각각은 상기 패터닝 슬릿 시트로부터 이격된 것을 특징으로 하는 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치를 제공한다.
Abstract:
PURPOSE: A thin film deposition apparatus, a method for manufacturing an organic light emitting display device using the apparatus, and an organic light emitting display device manufactured by the method are provided to enable application to a large substrate production line and high-precision patterning. CONSTITUTION: A thin film deposition apparatus comprises an evaporator(110), an evaporator nozzle unit(120), a patterning slit sheet(150), and a blocking plate assembly(130). The evaporator emits materials being deposited. The evaporator nozzle unit includes a plurality of evaporator nozzles arranged in a first direction. The patterning slit sheet, in which patterning slits are arranged in the first direction, is arranged to be faced with the evaporator nozzle unit. The blocking plate assembly including a plurality of blocking plates is arranged between the evaporator nozzle unit and the patterning slit sheet in the first direction so as to divide the space between the evaporator nozzle unit and the patterning slit sheet into multiple deposition spaces.
Abstract:
PURPOSE: A substrate pattern exposing device is provided to reduce equipment costs by minimizing the size of a chamber for laser patterning. CONSTITUTION: A transparent substrate(110) is positioned in a chamber. A laser irradiator(120) is formed on one side of a transparent substrate, irradiates laser in a first direction, and moves in a second direction vertical to the first direction. An optical device(130) reflects the irradiated laser with 90 degrees, inputs the laser to the transparent substrate, and moves in the first direction. The optical device includes a mirror part(132) to reflect the irradiated laser to the transparent substrate with 90 degrees.
Abstract:
A coating device for encapsulation is provided to improve parallelism of a coating robot by arranging a continuous support between the coating robot and the frame. A coating device for encapsulation includes a frame(10), a coating robot(100), and a support(20). A substrate is mounted on a frame. A coating robot includes a moving guide, a Y-axis block, a column(50), and a coating head(60). The column crosses the frame. The frame moves to the front or rear direction of the body. The moving guide is arranged in the upper surface of the Y-axis block to guide the movement of the column. The coating head is arranged in the side of the column to coat the paste on the substrate. The support is continuously arranged between the frame and the Y-axis block to support the column and the Y-axis block.
Abstract:
A laser patterning apparatus is provided to improve compression uniformity between a donor film and an acceptor substrate by uniformly pressurizing a pressurizing member by an actuator which maintains an extension state. A stage(10) supports an acceptor substrate(61). A shielding mask(20) forms a pattern, and is positioned on the acceptor substrate. A donor film(62) is attached on one surface of the shielding mask. A laser gun(30) is arranged in a top part of the stage in order to partially irradiate a laser light on the donor film through the pattern of the shielding mask. A pressurizing member(40) partially corresponds to the shielding mask. An actuator(50) is connected to one side of the pressurizing member, and pressurizes the pressurizing member.
Abstract:
본 발명은 박막 증착 장치에 관한 것으로, 상세하게는 대형 기판 양산 공정에 용이하게 적용될 수 있고, 제조 수율이 향상된 박막 증착 장치에 관한 것이다. 본 발명은 기판상에 박막을 형성하기 위한 박막 증착 장치에 있어서, 증착 물질을 방사하는 증착원; 상기 증착원의 일 측에 배치되며, 제1 방향을 따라 복수 개의 증착원 노즐들이 형성되는 증착원 노즐부; 및 상기 증착원 노즐부와 대향되게 배치되고, 상기 제1 방향에 대해 수직인 제2 방향을 따라 복수 개의 패터닝 슬릿들이 형성되는 패터닝 슬릿 시트를 포함하고, 상기 기판이 상기 박막 증착 장치에 대하여 상기 제1 방향을 따라 이동하면서 증착이 수행되고, 상기 증착원, 상기 증착원 노즐부 및 상기 패터닝 슬릿 시트는 일체로 형성되는 것을 특징으로 하는 박막 증착 장치를 제공한다.
Abstract:
PURPOSE: A thin film deposition device is provided to increase manufacturing yield and deposition efficiency. CONSTITUTION: A deposition source(110) radiates a deposition material(115). A deposition source nozzle unit(120) is formed on one side of the deposition source. A plurality of deposition source nozzles(121) is formed in the deposition source nozzle unit in a first direction. A patterning slit sheet(150) faces the deposition source nozzles. The patterning slit sheet includes patterning slits(151) which is formed in a second direction.
Abstract:
PURPOSE: A thin film deposition apparatus and a method for manufacturing an organic light emitting display using the same are provided to reduce the size of shadow formed in a substrate by securing the straightness of deposited materials using cutoff plates. CONSTITUTION: A thin film deposition apparatus comprises a plurality of thin film deposition assemblies. Each thin film deposition assembly comprises an evaporation source(110), an evaporation source nozzle unit(120), a patterning slit sheet(150), and a cutoff plate assembly(130). A plurality of evaporation source nozzles are formed in a first direction in the evaporation source nozzle unit. The patterning slit sheet has a plurality of patterning slits formed in the first direction. The cutoff plate assembly comprising a plurality of cutoff plates(131) is arranged in the first direction between the evaporation source nozzle unit and the patterning slit sheet. The thin film deposition apparatus is separated from a substrate(400), and one of the thin film deposition apparatus and the substrate is movable relative to the other.
Abstract:
A laser patterning apparatus for handling a donor film and improving compression uniformity between the donor film and an acceptor substrate is provided. The laser patterning apparatus includes: a stage that supports an acceptor substrate; a shielding mask that is placed on the acceptor substrate to form a pattern and is attached to a donor film on one surface thereof; a laser gun that is disposed at an upper part of the stage to radiate laser light to a portion of the donor film through the pattern of the shielding mask; a pressing member that corresponds to a portion of the shielding mask; and an actuator that is connected to one side of the pressing member to press the pressing member.