公开(公告)号：WO2006047373A8

公开(公告)日：2006-08-10

申请号：PCT/US2005038102

申请日：2005-10-21

Applicant: ADVANCED TECH MATERIALS ,  DIMEO FRANK JR ,  DIETZ JAMES ,  OLANDER W KARL ,  KAIM ROBERT ,  BISHOP STEVEN E ,  NEUNER JEFFREY W ,  ARNO JOSE I

Inventor： DIMEO FRANK JR ,  DIETZ JAMES ,  OLANDER W KARL ,  KAIM ROBERT ,  BISHOP STEVEN E ,  NEUNER JEFFREY W ,  ARNO JOSE I

IPC: B08B6/00 ,  B08B9/00

CPC classification number: C23G5/00 ,  C23C14/564 ,  H01J37/08 ,  H01J37/32862 ,  H01J2237/022 ,  H01J2237/31701

Abstract: A method and apparatus for cleaning residue from components of the vacuum chamber and beamline of an ion implanter used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive halide composition for sufficient time and under sufficient conditions to at least partially remove the residue. The gas-phase reactive halide composition is chosen to react selectively with the residue, while not reacting with the components of the ion source region of the vacuum chamber.

Abstract translation: 一种清洁残余物的方法和装置，用于制造微电子器件中使用的离子注入机的真空室和束线组件。 为了有效地除去残留物，将组分与气相反应性卤化物组合物接触足够的时间并在足够的条件下至少部分地除去残余物。 选择气相反应性卤化物组合物与残留物选择性反应，而不与真空室的离子源区域的组分反应。

公开(公告)号：AU6218000A

公开(公告)日：2001-02-05

申请号：AU6218000

申请日：2000-07-14

Applicant: ADVANCED TECH MATERIALS

Inventor： DIETZ JAMES

IPC: F17D1/04 ,  B01D53/04 ,  B01J4/00 ,  C23C16/455 ,  F17C9/00 ,  F17C13/02 ,  F17C13/04 ,  H01L21/205 ,  B08B9/02 ,  B08B9/027

Abstract: An auto-switching sub-atmospheric pressure gas delivery system, for dispensing gas to a gas-consuming process unit, e.g., a semiconductor manufacturing tool. The gas delivery system uses a multiplicity of gas panels, wherein one panel is in active gas dispensing mode and supplying gas from a sub-atmospheric pressure gas source coupled to the flow circuitry of the panel. During the active gas dispensing operation in such panel, a second gas panel of the system undergoes purge, evacuation and fill transition to active gas dispensing condition, to permit switching to the second panel upon exhaustion of the sub-atmospheric pressure gas source coupled to the first gas panel without the occurrence of pressure spikes or flow perturbations.

公开(公告)号：WO2007127865A3

公开(公告)日：2008-12-11

申请号：PCT/US2007067542

申请日：2007-04-26

Applicant: ADVANCED TECH MATERIALS ,  DIMEO FRANK JR ,  DIETZ JAMES ,  OLANDER W KARL ,  KAIM ROBERT ,  BISHOP STEVEN E ,  NEUNER JEFFREY W ,  ARNO JOSE I ,  MARGANSKI PAUL J ,  SWEENEY JOSEPH D ,  ELDRIDGE DAVID ,  YEDAVE SHARAD ,  BYL OLEG ,  STAUF GREGORY T

Inventor： DIMEO FRANK JR ,  DIETZ JAMES ,  OLANDER W KARL ,  KAIM ROBERT ,  BISHOP STEVEN E ,  NEUNER JEFFREY W ,  ARNO JOSE I ,  MARGANSKI PAUL J ,  SWEENEY JOSEPH D ,  ELDRIDGE DAVID ,  YEDAVE SHARAD ,  BYL OLEG ,  STAUF GREGORY T

IPC: C25F1/00 ,  C25F3/12

CPC classification number: C23C14/564 ,  C23C16/4405 ,  H01J37/32412 ,  H01J37/32862

Abstract: A method and apparatus for cleaning residue from components of semiconductor processing systems used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive material for sufficient time and under sufficient conditions to at least partially remove the residue. When the residue and the material from which the components are constructed are different, the gas-phase reactive material is selectively reactive with the residue and minimally reactive with the materials from which the components of the ion implanter are constructed. When the residue and the material from which the components are constructed is the same, then the gas-phase reactive material may be reactive with both the residue and the component part. Particularly preferred gas-phase reactive materials utilized comprise gaseous compounds such as XeF2, XeF4, XeF6, NF3, IF5, IF7, SF6, C2F6, F2, CF4, KrF2, Cl2, HCl, ClF3, ClO2, N2F4, N2F2, N3F, NFH2, NH2F, HOBr, Br2, C3F8, C4F8, C5F8, CHF3, CH2F2, CH3F, COF2, HF, C2HF5, C2H2F4, C2H3F3, C2H4F2, C2H5F, C3F6, and organochlorides such as COCl2, CCl4, CHCl3, CH2Cl2 and CH3Cl.

Abstract translation: 一种清洁残留物的方法和装置，用于制造微电子装置中使用的半导体处理系统的组件。 为了有效地除去残留物，将组分与气相反应性材料接触足够的时间和足够的条件以至少部分地除去残余物。 当残留物和构成组分的材料不同时，气相反应性材料与残余物选择性反应，并与构成离子注入机的组分的材料具有最低的反应性。 当残留物和构成组分的材料相同时，气相反应性材料可以与残留物和组分部分反应。 使用的特别优选的气相反应性材料包括气态化合物如XeF 2，XeF 4，XeF 6，NF 3，IF 5，IF 7，SF 6，C 2 F 6，F 2，CF 4，KrF 2，Cl 2，HCl，ClF 3，ClO 2，N 2 F 4，N 2 F 2，N 3 F， ，NH2F，HOBr，Br2，C3F8，C4F8，C5F8，CHF3，CH2F2，CH3F，COF2，HF，C2HF5，C2H2F4，C2H3F3，C2H4F2，C2H5F，C3F6和有机氯化物，如COCl2，CCl4，CHCl3，CH2Cl2和CH3Cl。

公开(公告)号：WO2006047410A8

公开(公告)日：2006-07-27

申请号：PCT/US2005038173

申请日：2005-10-24

Applicant: ADVANCED TECH MATERIALS ,  DIETZ JAMES ,  BISHOP STEVEN E ,  MCMANUS JAMES V ,  LURCOTT STEVEN M ,  WODJENSKI MICHAEL J ,  KAIM ROBERT ,  DIMEO FRANK JR

Inventor： DIETZ JAMES ,  BISHOP STEVEN E ,  MCMANUS JAMES V ,  LURCOTT STEVEN M ,  WODJENSKI MICHAEL J ,  KAIM ROBERT ,  DIMEO FRANK JR

IPC: H01L21/66 ,  B67D7/06 ,  B67D99/00

CPC classification number: G01N33/00 ,  F17C11/00 ,  G01F15/063 ,  G01F22/02 ,  G01F23/0076 ,  G01M3/32 ,  G01M3/3236 ,  G06Q10/087 ,  G06Q30/04 ,  G06Q50/04 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L22/10 ,  H01L23/5389 ,  H01L24/24 ,  H01L24/48 ,  H01L24/82 ,  H01L25/03 ,  H01L25/0652 ,  H01L25/16 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/24011 ,  H01L2224/2518 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2924/00014 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01058 ,  H01L2924/01076 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/14 ,  H01L2924/19042 ,  H05K1/185 ,  H05K3/4602 ,  H05K2203/0165 ,  H05K2203/085 ,  H05K2203/1469 ,  Y02P90/30 ,  Y10T29/4913 ,  Y10T29/49133 ,  Y10T29/49165 ,  Y10T29/53183 ,  H01L2224/45099

Abstract: A monitoring system (100) for monitoring fluid in a fluid supply vessel (22, 24, 26, 28, 108) during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors (114, 126) for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module (40, 132, 146) operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor (50, 150) and display (52, 150) operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.

Abstract translation: 一种用于在操作期间监测流体供应容器（22,24,26,28,108）中的流体的监测系统（100），包括从所述流体供应容器分配流体。 监测系统包括（i）用于监测流体供应容器或从其分配的流体的特性的一个或多个传感器（114,126），（ii）可操作地耦合到一个的数据采集模块（40,132,146） 或多个传感器以从其接收监测数据并且响应地产生与由所述一个或多个传感器监测的特性相关的输出，以及（iii）处理器（50,150）和显示器（52,150），其与所述数据采集模块 并且被布置成处理来自数据采集模块的输出并且响应地输出流体供应容器中的流体的图形表示，计费凭证，使用报告和/或再供应请求。

公开(公告)号：SG156669A1

公开(公告)日：2009-11-26

申请号：SG2009070137

申请日：2005-10-21

Applicant: ADVANCED TECH MATERIALS

Inventor： DIMEO FRANK JR ,  DIETZ JAMES ,  OLANDER W KARL ,  KAIM ROBERT ,  BISHOP STEVEN E ,  NEUNER JEFFREY W ,  ARNO JOSE I

Abstract: A method and apparatus for cleaning residue from components of the vacuum chamber and beamline of an ion implanter used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive halide composition for sufficient time and under sufficient conditions to at least partially remove the residue. The gas-phase reactive halide composition is chosen to react selectively with the residue, while not reacting with the components of the ion source region of the vacuum chamber.

公开(公告)号：AU2003286671A1

公开(公告)日：2004-05-25

申请号：AU2003286671

申请日：2003-10-27

Applicant: ADVANCED TECH MATERIALS

Inventor： STURM EDWARD ,  WANG LUPING ,  DIETZ JAMES

IPC: B01D53/04 ,  B01D53/02 ,  B01D59/26

Abstract: A germane storage and dispensing system, in which germane gas is sorptively retained on an activated carbon sorbent medium in a vessel containing adsorbed and free germane gas. The activated carbon sorbent medium is deflagration-resistant in relation to the germane gas adsorbed thereon, i.e., under deflagration conditions of 65° C. and 650 torr, under which free germane gas undergoes deflagration, the activated carbon sorbent medium does not sustain deflagration of the adsorbed germane gas or thermally desorb the germane gas so that it undergoes subsequent deflagration. The deflagration-resistance of the activated carbon sorbent medium is promoted by pre-treatment of the sorbent material to remove extraneous sorbables therefrom and by maintaining the fill level of the sorbent medium in the gas storage and dispensing vessel at a substantial value, e.g., of at least 30%.

公开(公告)号：AU2214599A

公开(公告)日：1999-07-26

申请号：AU2214599

申请日：1999-01-07

Applicant: ADVANCED TECH MATERIALS

Inventor： DIETZ JAMES ,  MCMANUS JAMES V

IPC: F17C7/00 ,  B01J4/00 ,  B67D3/00 ,  F17C11/00 ,  H01L21/265 ,  B01D53/04

Abstract: An apparatus for storage and dispensing of a gas, comprising a gas storage and dispensing vessel holding a physical sorbent medium and gas adsorbed on the physical sorbent medium, wherein a carrier gas, e.g., helium, hydrogen, argon, etc., is flowed through the vessel to effect desorption of the sorbate gas and entrainment of the desorbed gas in the carrier gas stream. The storage and dispensing system of the invention may be employed to provide the dispensed sorbate gas to a downstream locus of use in applications such as epitaxial film formation and ion implantation, in the manufacture of semiconductor devices.

公开(公告)号：MY131132A

公开(公告)日：2007-07-31

申请号：MYPI20034080

申请日：2003-10-27

Applicant: ADVANCED TECH MATERIALS

Inventor： ARNO JOSE ,  STURM EDWARD ,  WANG LUPING ,  DIETZ JAMES

IPC: B01D53/04

Abstract: A GERMANE STORAGE AND DISPENSING SYSTEM (110), IN WHICH GERMANE GAS IS SORPTIVELY RETAINED ON AN ACTIVATED CARBON SORBENT MEDIUM (116) IN A VESSEL (112) CONTAINING ADSORBED AND FREE GERMANE GAS. THE ACTIVATED CARBON SORBENT MEDIUM IS DEFLAGRATION-RESISTANT IN RELATION TO THE GERMANE GAS ADSORBED THEREON, I.E., UNDER DEFLAGRATION CONDITIONS OF 65° C. AND 650 TORR, UNDER WHICH FREE GERMANE GAS UNDERGOES DEFLAGRATION, THE ACTIVATED CARBON SORBENT MEDIUM DOES NOT SUSTAIN DEFLAGRATION OF THE ADSORBED GERMANE GAS OR THERMALLY DESORB THE GERMANE GAS SO THAT IT UNDERGOES SUBSEQUENT DEFLAGRATION. THE DEFLAGRATION-RESISTANCE OF THE ACTIVATED CARBON SORBENT MEDIUM IS PROMOTED BY PRE-TREATMENT OF THE SORBENT MATERIAL TO REMOVE EXTRANEOUS SORBABLES THEREFROM AND BY MAINTAINING THE FILL LEVEL OF THE SORBENT MEDIUM IN THE GAS STORAGE AND DISPENSING VESSEL AT A SUBSTANTIAL VALUE, E.G., OF AT LEAST 30%.(FIG 5)

公开(公告)号：WO2006047373A3

公开(公告)日：2009-04-23

申请号：PCT/US2005038102

申请日：2005-10-21

Applicant: ADVANCED TECH MATERIALS ,  DIMEO FRANK JR ,  DIETZ JAMES ,  OLANDER W KARL ,  KAIM ROBERT ,  BISHOP STEVEN E ,  NEUNER JEFFREY W ,  ARNO JOSE I

Inventor： DIMEO FRANK JR ,  DIETZ JAMES ,  OLANDER W KARL ,  KAIM ROBERT ,  BISHOP STEVEN E ,  NEUNER JEFFREY W ,  ARNO JOSE I

IPC: B08B7/00 ,  B08B7/04

CPC classification number: C23G5/00 ,  C23C14/564 ,  H01J37/08 ,  H01J37/32862 ,  H01J2237/022 ,  H01J2237/31701

Abstract: A method and apparatus for cleaning residue from components of the vacuum chamber and beamline of an ion implanter used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive halide composition for sufficient time and under sufficient conditions to at least partially remove the residue. The gas-phase reactive halide composition is chosen to react selectively with the residue, while not reacting with the components of the ion source region of the vacuum chamber.

Abstract translation: 一种清洁残余物的方法和装置，用于制造微电子器件中使用的离子注入机的真空室和束线组件。 为了有效地除去残留物，将组分与气相反应性卤化物组合物接触足够的时间并在足够的条件下至少部分地除去残余物。 选择气相反应性卤化物组合物与残留物选择性反应，而不与真空室的离子源区域的组分反应。

公开(公告)号：WO2006047410A2

公开(公告)日：2006-05-04

申请号：PCT/US2005038173

申请日：2005-10-24

Applicant: ADVANCED TECH MATERIALS ,  DIETZ JAMES ,  BISHOP STEVEN E ,  MCMANUS JAMES V ,  LURCOTT STEVEN M ,  WODJENSKI MICHAEL J ,  KAIM ROBERT ,  DIMEO FRANK JR

Inventor： DIETZ JAMES ,  BISHOP STEVEN E ,  MCMANUS JAMES V ,  LURCOTT STEVEN M ,  WODJENSKI MICHAEL J ,  KAIM ROBERT ,  DIMEO FRANK JR

IPC: H01L21/66 ,  B67D7/06 ,  B67D99/00

CPC classification number: G01N33/00 ,  F17C11/00 ,  G01F15/063 ,  G01F22/02 ,  G01F23/0076 ,  G01M3/32 ,  G01M3/3236 ,  G06Q10/087 ,  G06Q30/04 ,  G06Q50/04 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L22/10 ,  H01L23/5389 ,  H01L24/24 ,  H01L24/48 ,  H01L24/82 ,  H01L25/03 ,  H01L25/0652 ,  H01L25/16 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/24011 ,  H01L2224/2518 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2924/00014 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01058 ,  H01L2924/01076 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/14 ,  H01L2924/19042 ,  H05K1/185 ,  H05K3/4602 ,  H05K2203/0165 ,  H05K2203/085 ,  H05K2203/1469 ,  Y02P90/30 ,  Y10T29/4913 ,  Y10T29/49133 ,  Y10T29/49165 ,  Y10T29/53183 ,  H01L2224/45099

Abstract: A monitoring system (100) for monitoring fluid in a fluid supply vessel (22, 24, 26, 28, 108) during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors (114, 126) for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module (40, 132, 146) operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor (50, 150) and display (52, 150) operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.

Abstract translation: 一种监视系统（100），用于在操作期间监视流体供给容器（22,24,26,28,108）中的流体，包括从流体供给容器分配流体。 监测系统包括（i）用于监测流体供应容器或从其分配的流体的特性的一个或多个传感器（114,126），（ii）数据采集模块（40,132,146），其可操作地耦合到所述一个 或更多传感器以从其接收监测数据并响应地产生与由所述一个或更多个传感器监测的特性相关的输出，以及（iii）处理器（50,150）和显示器（52,150），可操作地与所述数据采集模块 并且布置成处理来自数据采集模块的输出并且响应地输出流体供应容器中的流体的图形表示，计费文档，使用报告和/或再供应请求。