公开(公告)号：WO2013098053A1

公开(公告)日：2013-07-04

申请号：PCT/EP2012/074507

申请日：2012-12-05

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  BLEEKER, Arno ,  HENNUS, Pieter ,  HOEKS, Martinus ,  HOL, Sven, Antoin, Johan ,  VAN DER SCHOOT, Harmen ,  SLAGHEKKE, Bernardus ,  TINNEMANS, Patricius ,  VAN DER WIJST, Marc ,  ZAAL, Koen ,  CADEE, Theodorus, Petrus, Maria ,  BEERENS, Ruud ,  FISCHER, Olof ,  AANGENENT, Wouter ,  BOSCH, Niels, Johannes, Maria

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70275 ,  G03F7/70366 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70558 ,  G03F7/70816 ,  G03F7/709

Abstract: An exposure apparatus (1) including a projection system (12, 14) configured to project a plurality of radiation beams onto a target; a movable frame (8) that is at least rotatable around an axis (10); and an actuator system (11) configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.

Abstract translation: 一种曝光装置（1），包括被配置为将多个辐射束投影到目标上的投影系统（12,14） 至少可绕轴线（10）旋转的可移动框架（8）; 以及致动器系统（11），其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。

公开(公告)号：WO2012013451A1

公开(公告)日：2012-02-02

申请号：PCT/EP2011/061206

申请日：2011-07-04

Applicant: ASML NETHERLANDS B.V. ,  TU EINDHOVEN ,  SORAMA ,  AANGENENT, Wouter ,  VERMEULEN, Johannes ,  BEERENS, Ruud ,  SCHOLTE, Rick ,  LOPEZ ARTEAGA, Ines

Inventor： AANGENENT, Wouter ,  VERMEULEN, Johannes ,  BEERENS, Ruud ,  SCHOLTE, Rick ,  LOPEZ ARTEAGA, Ines

IPC: G03F7/20 ,  G01H3/00

CPC classification number: G03F7/70775 ,  G03F7/70866 ,  G03F7/709

Abstract: A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a sensor array positioned and arranged to detect an acoustic wave from a movable part of the lithographic apparatus, a controller, the controller having a controller input connected to the sensor array so as to receive a sensor array output signal, and a controller output connected to at least one actuator arranged to act on the movable part, the controller being arranged to: calculate a movement of the movable part from the sensor array output signal, and drive via the controller output the at least one actuator in response to the calculated movement.

Abstract translation: 光刻设备包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 传感器阵列，其被布置成检测来自所述光刻设备的可移动部分的声波;控制器，所述控制器具有连接到所述传感器阵列的控制器输入，以便接收传感器阵列输出信号;以及控制器输出，连接到 至少一个致动器被布置成作用在所述可移动部件上，所述控制器被布置成：根据所述传感器阵列输出信号计算所述可移动部件的运动，并且响应于所计算的运动，经由所述控制器驱动所述至少一个致动器。