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    RADIATION SOURCE
    1.
    发明申请
    RADIATION SOURCE 审中-公开
    辐射源

    公开(公告)号：WO2013029906A1

    公开(公告)日：2013-03-07

    申请号：PCT/EP2012/065037

    申请日：2012-08-01

    Applicant: ASML NETHERLANDS B.V. ,  YAKUNIN, Andrei ,  IVANOV, Vladimir ,  VAN SCHOOT, Jan ,  KRIVTSUN, Vladimir ,  SWINKELS, Gerardus ,  MEDVEDEV, Viacheslav

    Inventor： YAKUNIN, Andrei ,  IVANOV, Vladimir ,  VAN SCHOOT, Jan ,  KRIVTSUN, Vladimir ,  SWINKELS, Gerardus ,  MEDVEDEV, Viacheslav

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    Abstract: A radiation source (60) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle configured to direct a stream of fuel droplets (62) along a trajectory (64) towards a plasma formation location (66). The radiation source is configured to receive a first amount of radiation (68) such that the first amount of radiation is incident on a fuel droplet (62a) at the plasma formation location, and such that the first amount of radiation transfers energy into the fuel droplet to generate a modified fuel distribution (70), the modified fuel distribution having a surface. The radiation source is also configured to receive a second amount of radiation (72) such that the second amount of radiation is incident on a portion of the surface (70a) of the modified fuel distribution, the second amount of radiation having a p-polarized component with respect to the portion of the surface; and such that the second amount of radiation transfers energy to the modified fuel distribution to generate a radiation generating plasma, the radiation generating plasma emitting a third amount of radiation (74). The radiation source further comprises a collector (CO) configured to collect and direct at least a portion of the third amount of radiation. The radiation source is configured such that the second amount of radiation propagates in a first direction, the first direction being non-parallel to a normal to the portion of the surface of the modified fuel distribution.

    Abstract translation: 适于向光刻设备的照明器提供辐射束的辐射源（60）。 辐射源包括被配置为沿着轨迹（64）将燃料液滴（62）流引向等离子体形成位置（66）的喷嘴。 辐射源被配置为接收第一量的辐射（68），使得第一量的辐射入射在等离子体形成位置处的燃料液滴（62a）上，并且使得第一量的辐射将能量转移到燃料 液滴以产生改进的燃料分配（70），所述改进的燃料分布具有表面。 辐射源还被配置为接收第二数量的辐射（72），使得第二量的辐射入射在改性燃料分布的表面（70a）的一部分上，第二量的辐射具有p偏振 相对于表面的部分; 并且使得第二量的辐射将能量传递到经修改的燃料分布以产生辐射产生等离子体，该辐射产生等离子体发射第三量的辐射（74）。 辐射源还包括收集器（CO），其被配置成收集并引导第三量的辐射的至少一部分。 辐射源被配置成使得第二数量的辐射在第一方向上传播，第一方向不平行于改性燃料分布的表面部分的法线。

    LITHOGRAPHIC APPARATUS AND SPECTRAL PURITY FILTER
    3.
    发明申请
    LITHOGRAPHIC APPARATUS AND SPECTRAL PURITY FILTER 审中-公开
    光刻设备和光谱滤光片

    公开(公告)号：WO2011117009A1

    公开(公告)日：2011-09-29

    申请号：PCT/EP2011/051546

    申请日：2011-02-03

    Applicant: ASML NETHERLANDS B.V. ,  MEDVEDEV, Viacheslav ,  BANINE, Vadim ,  KRIVTSUN, Vladimir ,  SOER, Wouter ,  YAKUNIN, Andrei

    Inventor： MEDVEDEV, Viacheslav ,  BANINE, Vadim ,  KRIVTSUN, Vladimir ,  SOER, Wouter ,  YAKUNIN, Andrei

    IPC: G03F7/20 ,  G21K1/06

    CPC classification number: G03F7/70575 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061

    Abstract: A reflector includes a multi layer mirror structure configured to reflect radiation at a first wavelength, and one or more additional layers. The absorbance and refractive index at a second wavelength of the multi layer mirror structure and the one or more additional layers, and the thickness of the multi layer mirror structure and the one or more additional layers, are configured such that radiation of the second wavelength which is reflected from a surface of the reflector interferes in a destructive manner with radiation of the second wavelength which is reflected from within the reflector.

    Abstract translation: 反射器包括被配置为反射第一波长的辐射和一个或多个附加层的多层反射镜结构。 在多层反射镜结构和一个或多个附加层的第二波长处的吸光度和折射率以及多层反射镜结构和一个或多个附加层的厚度被配置为使得第二波长的辐射 从反射器的表面反射以破坏性方式干涉从反射器内反射的第二波长的辐射。

    MULTILAYER MIRROR
    7.
    发明申请
    MULTILAYER MIRROR 审中-公开
    MULTILERER MIRROR

    公开(公告)号：WO2011061007A1

    公开(公告)日：2011-05-26

    申请号：PCT/EP2010/065155

    申请日：2010-10-11

    Applicant: ASML NETHERLANDS B.V. ,  KRIVTSUN, Vladimir ,  YAKUNIN, Andrei ,  MEDVEDEV, Viacheslav

    Inventor： KRIVTSUN, Vladimir ,  YAKUNIN, Andrei ,  MEDVEDEV, Viacheslav

    IPC: G03F7/20 ,  G02B5/08

    CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70575 ,  G21K1/062 ,  G21K2201/067

    Abstract: A multilayer mirror (100) is configured to reflect extreme ultraviolet (EUV) radiation while absorbing a second radiation having a wavelength substantially- longer than that of the EUV radiation. The mirror includes a plurality of layer pairs (110, 112) stacked on a substrate (104). Each layer pair comprises a first layer (112) that includes a first material, and a second layer (110) that includes a second material. The first layer (112) is modified to reduce its contribution to reflection of the second radiation, compared with a simple layer of the same metal having the same thickness. Modifications can include doping with a third material in or around the metal layer to reduce its electric conductivity by chemical bonding or electron trapping, and/or splitting the metal layer into sub-layers with insulating layers. The number of layers in the stack is larger than known multilayer mirrors and may be tuned to achieve a minimum in IR reflection.

    Abstract translation: 多层反射镜（100）被配置为反射极紫外（EUV）辐射，同时吸收具有比EUV辐射的波长更大的波长的第二辐射。 反射镜包括堆叠在基板（104）上的多个层对（110,112）。 每层对包括包括第一材料的第一层（112）和包括第二材料的第二层（110）。 与具有相同厚度的相同金属的简单层相比，第一层（112）被修改以减少其对第二辐射的反射的贡献。 修改可以包括在金属层中或其周围掺杂第三材料，以通过化学键合或电子俘获来降低其导电性，和/或将金属层分成具有绝缘层的子层。 堆叠中的层数大于已知的多层反射镜，并且可以调谐以在IR反射中达到最小。

    PHOTON SOURCE, METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING METHOD
    8.
    发明申请
    PHOTON SOURCE, METROLOGY APPARATUS, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING METHOD 审中-公开
    光电源，计量装置，光刻系统和器件制造方法

    公开(公告)号：WO2014000998A1

    公开(公告)日：2014-01-03

    申请号：PCT/EP2013/060664

    申请日：2013-05-23

    Applicant: ASML NETHERLANDS B.V.

    Inventor： PELLEMANS, Henricus ,  VAN DER ZOUW, Gerbrand ,  SMEETS, Ralph ,  DE WIT, Johannes ,  ANTSIFEROV, Pavel ,  KRIVTSUN, Vladimir

    IPC: G03F7/20 ,  H05G2/00 ,  G01N21/956 ,  H01J65/04 ,  H01J61/02 ,  H01J61/54 ,  H05B41/38

    CPC classification number: H05H1/24 ,  G01N21/956 ,  G01N2201/061 ,  G03F7/20 ,  G03F7/70033 ,  G03F7/70483 ,  G03F7/70616 ,  G03F7/70641 ,  H01J61/02 ,  H01J61/54 ,  H01J61/545 ,  H01J65/04 ,  H05B41/38 ,  H05G2/003 ,  H05G2/008

    Abstract: A laser driven light source comprises laser (52) and focusing optics (54). These produce a beam of radiation focused on a plasma forming zone within a container (40) containing a gas (e.g., Xe). Collection optics (44) collects photons emitted by a plasma (42) maintained by the laser radiation to form a beam of output radiation (46). The plasma has an elongate form (L > d) and the collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.

    Abstract translation: 激光驱动光源包括激光器（52）和聚焦光学器件（54）。 这些产生聚集在包含气体（例如Xe）的容器（40）内的等离子体形成区域上的辐射束。 收集光学器件（44）收集由激光辐射维持的等离子体（42）发射的光子，以形成输出辐射束（46）。 等离子体具有细长形式（L> d），并且收集光学器件被配置为收集从等离子体沿纵向出现的光子。 与收集从等离子体横向辐射的辐射的源相比，等离子体的亮度增加。 使用光源的计量装置可以由于亮度的增加而获得更高的精度和/或吞吐量。 可以提供背反射器。 可以使用微波辐射代替激光辐射以形成等离子体。

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