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    RADIATION SOURCE
    1.
    发明申请
    RADIATION SOURCE 审中-公开
    辐射源

    公开(公告)号：WO2013041323A1

    公开(公告)日：2013-03-28

    申请号：PCT/EP2012/066449

    申请日：2012-08-23

    Applicant: ASML Netherlands B.V. ,  VAN SCHOOT, Jan ,  KREUWEL, Hermanus ,  BANINE, Vadim ,  YAKUNIN, Andrei ,  MOORS, Roel ,  FRIJNS, Olav ,  SWINKELS, Gerardus ,  VANDERHALLEN, Ivo ,  STAMM, Uwe

    Inventor： VAN SCHOOT, Jan ,  KREUWEL, Hermanus ,  BANINE, Vadim ,  YAKUNIN, Andrei ,  MOORS, Roel ,  FRIJNS, Olav ,  SWINKELS, Gerardus ,  VANDERHALLEN, Ivo ,  STAMM, Uwe

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: G03F7/70058 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

    Abstract: A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.

    Abstract translation: 一种具有燃料流发生器（110）的辐射源，其产生并引导燃料流（102）沿轨迹朝向等离子体形成位置（104）。 预脉冲激光辐射组件在等离子体形成位置处的燃料流处引导第一激光辐射束（100）以产生经修改的燃料靶（106）。 主脉冲激光辐射组件在等离子体形成位置处引导在修改的燃料靶处的第二激光辐射束（108）以产生辐射产生等离子体（117）。 收集器（122）收集辐射并沿辐射源的光轴（105）引导辐射。 激光辐射的第一束基本上沿着光轴被引向燃料流。

    FREE ELECTRON LASER
    3.
    发明申请
    FREE ELECTRON LASER 审中-公开
    免费电子激光

    公开(公告)号：WO2015067467A1

    公开(公告)日：2015-05-14

    申请号：PCT/EP2014/072588

    申请日：2014-10-22

    Applicant: ASML NETHERLANDS B.V.

    Inventor： AKKERMANS, Johannes, ,  AMENT, Lucas ,  BANINE, Vadim ,  COENEN, Teis, Johan ,  DE JAGER, Pieter ,  DE VRIES, Gosse ,  FRIJNS, Olav ,  GRIMMINCK, Leonardus ,  KATALENIC, Andelko ,  LOOPSTRA, Erik ,  LUITEN, Otger ,  NIKIPELOV, Andrey

    IPC: H01S3/09 ,  H05H9/00 ,  H01J25/12 ,  H01J23/027 ,  H05H7/12

    CPC classification number: H01S3/0903 ,  G03F7/70208 ,  H01J23/027 ,  H01J25/10 ,  H05H9/00

    Abstract: A free electron laser comprising: an electron source (21), a linear accelerator (22), an undulator (26), electron beam optics and a deceleration unit (28'). The electron source is operable to produce a bunched electron beam. The linear accelerator arranged to impart energy to electrons in the bunched electron beam produced by the electron source. The undulator is operable to produce a periodic magnetic field and is arranged so as to guide the bunched electron beam along a periodic path about a central axis of the undulator such that they interact with radiation in the undulator, stimulating emission of coherent radiation. The electron beam optics is arranged to direct the bunched electron beam back into the linear accelerator after it leaves the undulator so as to extract energy from electrons in the bunched electron beam. The deceleration unit is arranged to extract energy from electrons in the bunched electron beam after it has left the undulator. The deceleration unit comprises one or more resonant cavities (33), and an energy dissipation mechanism. The bunched electron beam is directed through the one or more resonant cavities so as to excite one or more resonant standing wave modes therein.

    Abstract translation: 一种自由电子激光器，包括：电子源（21），线性加速器（22），波动器（26），电子束光学器件和减速单元（28'）。 电子源可操作以产生聚束电子束。 线性加速器被布置成赋予由电子源产生的聚束电子束中的电子能量。 波动器可操作以产生周期性磁场，并且被布置成引导聚束电子束沿着围绕波动器的中心轴线的周期性路径，使得它们与波动器中的辐射相互作用，刺激相干辐射的发射。 电子束光学器件被布置成在聚束束电子束离开波束器之后将聚束电子束引导回线性加速器，以便从束电子束中的电子提取能量。 减速单元被布置成在束状电子束离开波动器之后从电子束中的电子提取能量。 减速单元包括一个或多个谐振腔（33）和能量耗散机构。 聚束电子束被引导通过一个或多个谐振腔，以激发其中的一个或多个共振驻波模式。

    A LITHOGRAPHIC APPARATUS, A RADIATION SYSTEM, A DEVICE MANUFACTURING METHOD AND A DEBRIS MITIGATION METHOD
    4.
    发明申请
    A LITHOGRAPHIC APPARATUS, A RADIATION SYSTEM, A DEVICE MANUFACTURING METHOD AND A DEBRIS MITIGATION METHOD 审中-公开
    放射学装置，放射系统，装置制造方法和降解方法

    公开(公告)号：WO2010072429A1

    公开(公告)日：2010-07-01

    申请号：PCT/EP2009/063097

    申请日：2009-10-08

    Applicant: ASML NETHERLANDS B.V. ,  FRIJNS, Olav ,  FRANKEN, Johannes ,  GIELISSEN, Kurt

    Inventor： FRIJNS, Olav ,  FRANKEN, Johannes ,  GIELISSEN, Kurt

    IPC: G03F7/20

    CPC classification number: G03F7/70916 ,  G03F7/70033

    Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap (8) for trapping material emanating from the radiation source. The rotation contaminant trap includes a multiple number of elements (11) extending in a radial direction (Ra) from a common rotation trap axis (A) and being arranged for allowing contaminant material emanating from the radiation source to deposit during propagation of the radiation beam in the radiation system. The radiation system further includes a contaminant catch (12; 27, 28) for receiving contaminant material particles from the rotation trap elements, the contaminant catch having a constitution, during operation of the radiation, for retaining said contaminant material particles.

    Abstract translation: 光刻设备包括用于从由辐射源发射的辐射提供辐射束的辐射系统。 辐射系统包括用于捕获从辐射源发出的材料的污染物捕集器（8）。 旋转污染物捕集器包括从公共旋转捕集器轴线（A）沿径向方向（Ra）延伸的多个元件（11），并被布置成允许在辐射束传播期间从辐射源发出的污染物质沉积 在辐射系统中。 辐射系统还包括用于从旋转捕获元件接收污染物质颗粒的污染物捕获物（12; 27,28），所述污染物捕获物在辐射操作期间具有用于保持所述污染物质颗粒的结构。

    GRAZING INCIDENCE REFLECTOR, LITHOGRAPHIC APPARATUS, METHOD FOR MANUFACTURING GRAZING INCIDENCE REFLECTOR AND METHOD FOR MANUFACTURING A DEVICE
    8.
    发明申请
    GRAZING INCIDENCE REFLECTOR, LITHOGRAPHIC APPARATUS, METHOD FOR MANUFACTURING GRAZING INCIDENCE REFLECTOR AND METHOD FOR MANUFACTURING A DEVICE 审中-公开
    烧结引发反射器，光刻设备，制造激光发射反射器的方法和制造器件的方法

    公开(公告)号：WO2012113591A1

    公开(公告)日：2012-08-30

    申请号：PCT/EP2012/050676

    申请日：2012-01-18

    Applicant: ASML NETHERLANDS B.V. ,  YAKUNIN, Andrei ,  BANINE, Vadim ,  FRIJNS, Olav

    Inventor： YAKUNIN, Andrei ,  BANINE, Vadim ,  FRIJNS, Olav

    IPC: G03F7/20 ,  G21K1/06 ,  G02B5/08

    CPC classification number: G03F7/702 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70058 ,  G21K1/062 ,  G21K2201/061

    Abstract: A grazing incidence reflector (300) for EUV radiation includes a first mirror layer (310) and a multilayer mirror structure (320) beneath the first mirror layer. The first mirror layer reflects at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range, and the first mirror layer transmits EUV radiation in a second range of incidence angles, which overlaps and extends beyond the first range of incidence angles. The multilayer mirror structure reflects EUV radiation that is incident on the reflector with grazing incidence angles in a second range that penetrates through the first mirror layer. A grazing incidence reflector can be used in a lithographic apparatus and in manufacturing a device by a lithographic process.

    Abstract translation: 用于EUV辐射的掠入射反射器（300）包括第一镜层下面的第一镜层（310）和多层反射镜结构（320）。 第一镜层反射入射在反射器上的至少一部分EUV辐射，其具有在第一范围内的掠入射角，并且第一镜层在与入射角的第一范围重叠并延伸超过入射角的第二范围内传输EUV辐射 。 多层反射镜结构反射入射在反射器上的EUV辐射，其中掠射入射角在穿过第一镜层的第二范围内。 掠入射反射器可以用在光刻设备中并且通过光刻工艺制造器件。

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