公开(公告)号：WO2014075881A1

公开(公告)日：2014-05-22

申请号：PCT/EP2013/072124

申请日：2013-10-23

Applicant: ASML NETHERLANDS B.V.

Inventor： SCHIMMEL, Hendrikus ,  RIEPEN, Michel ,  JILISEN, Rene ,  DE GRAAF, Dennis

IPC: H05G2/00

CPC classification number: G03F7/70058 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.

Abstract translation: 适于向光刻设备提供辐射的辐射源产生从包括气体的外壳内的燃料（31）产生的等离子体（12）的辐射。 等离子体产生作为燃料层收集的碎屑接收表面（（33a），（33b））上的主要燃料碎片。 碎片接收表面被加热到一个温度以将燃料层保持为液体，并且在液体燃料层内提供降低或零速率的地层气泡，以便减少光学表面（14）由二次碎屑的污染 来自液体燃料层的气泡喷发。 附加地或替代地，辐射源可以具有定位和/或定向的碎片接收表面，使得基本上所有垂直于碎片接收表面的线不与辐射源的光学活性表面相交。

公开(公告)号：WO2021073833A1

公开(公告)日：2021-04-22

申请号：PCT/EP2020/076092

申请日：2020-09-18

Applicant: ASML NETHERLANDS B.V.

Inventor： RIEPEN, Michel ,  BROM, Paul ,  DE RUITER, Rielle ,  GEERDINK-GIELEN, Marise ,  MELISSOURGOS, Georgios ,  SCHOUT, Twan

IPC: H05G2/00

Abstract: There is provided a container arranged to contain a waste product of a laser-produced plasma radiation source. The container comprises: a first portion which defines a chamber; and a second portion which at least partially defines an entrance to the chamber. In use, the waste product enters the chamber through the entrance. The second portion is formed from a material which comprises a ceramic material. The container may be particularly useful in a radiation source which is used in a lithographic system.

公开(公告)号：WO2013107686A3

公开(公告)日：2013-07-25

申请号：PCT/EP2013/050406

申请日：2013-01-10

Applicant: ASML NETHERLANDS B.V.

Inventor： YAKUNIN, Andrei ,  BANINE, Vadim ,  MOORS, Roel ,  VAN SCHOOT, Jan ,  VERHAGEN, Martinus ,  FRIJNS, Olav ,  KRIVTSUN, Vladimir ,  SWINKELS, Gerardus ,  RIEPEN, Michel ,  SCHIMMEL, Hendrikus ,  MEDVEDEV, Viacheslav

IPC: G03F7/20 ,  H05G2/00

Abstract: A source-collector device is constructed and arranged to generate a radiation beam. The device includes a target unit constructed and arranged to present a target surface (301) of plasma-forming material; a laser unit (50) constructed and arranged to generate a beam of radiation directed onto the target surface so as to form a plasma (51) from said plasma-forming material; a contaminant trap (302) constructed and arranged to reduce propagation of particulate contaminants generated by the plasma; a radiation collector (303) comprising a plurality of grazing-incidence reflectors (303a) arranged to collect radiation emitted by the plasma and form a beam therefrom; and a filter (304) constructed and arranged to attenuate at least one wavelength range of the beam.

公开(公告)号：WO2007057673A1

公开(公告)日：2007-05-24

申请号：PCT/GB2006/004275

申请日：2006-11-16

Applicant: ASML NETHERLANDS B.V. ,  LEEMING, John, Gerard ,  OTTENS, Joost, Jeroen ,  TEN KATE, Nicolaas ,  KEMPER, Nicolaas, Rudolf ,  LEENDERS, Martinus, Hendrikus, Antonius ,  SMEULERS, Johannes, Petrus, Maria ,  BECKERS, Marcel ,  SHULEPOV, Sergel ,  RIEPEN, Michel

Inventor： OTTENS, Joost, Jeroen ,  TEN KATE, Nicolaas ,  KEMPER, Nicolaas, Rudolf ,  LEENDERS, Martinus, Hendrikus, Antonius ,  SMEULERS, Johannes, Petrus, Maria ,  BECKERS, Marcel ,  SHULEPOV, Sergel ,  RIEPEN, Michel

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A barrier member (10) is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly (70) on a bottom surface configured to face the substrate (W) . The extractor assembly includes a plate (200) configured to split the space between a liquid removal device and the substrate in two such that a meniscus (310) is formed in an upper channel (220) between the liquid removal device and the plate and such that a meniscus (320) is formed in a lower channel (230) below the plate between the plate and the substrate.

Abstract translation: 公开了一种用于浸没式光刻中的阻挡构件（10）。 阻挡构件包括在被配置为面向衬底（W）的底表面上的抽出器组件（70）。 提取器组件包括板（200），其被配置为将液体移除装置和基板之间的空间分成两部分，使得在液体移除装置和板之间的上部通道（220）中形成弯月面（310），并且 在板和基板之间的板下方的下通道（230）中形成弯液面（320）。

公开(公告)号：WO2018019494A1

公开(公告)日：2018-02-01

申请号：PCT/EP2017/065409

申请日：2017-06-22

Applicant: ASML NETHERLANDS B.V.

Inventor： RIEPEN, Michel ,  BROM, Paul, Peter, Anna, Antonius ,  HULTERMANS, Ronald, Johannes

IPC: G03F7/20 ,  H05G2/00

Abstract: A debris mitigation system for use in a radiation source. The debris mitigation system comprises a contamination trap. The contamination trap comprises a debris receiving surface arranged to receive liquid metal fuel debris emitted from a plasma formation region of the radiation source. The debris receiving surface is constructed from a material that reacts with the liquid metal fuel debris to form an intermetallic layer on the debris receiving surface.

Abstract translation:

用于辐射源的碎片缓解系统。 碎片缓解系统包括污染陷阱。 污染物捕集器包括碎片接收表面，该碎片接收表面布置成接收从辐射源的等离子体形成区域发射的液体金属燃料碎片。 碎屑接收表面由与液体金属燃料碎屑反应以在碎屑接收表面上形成金属间层的材料构成。

公开(公告)号：WO2015028202A1

公开(公告)日：2015-03-05

申请号：PCT/EP2014/065699

申请日：2014-07-22

Applicant: ASML NETHERLANDS B.V.

Inventor： RIEPEN, Michel ,  BERENDSEN, Christianus ,  DARHUBER, Anton, Alexander ,  WEDERSHOVEN, Hubertus, Mattheus, Joseph, Maria ,  ZEEGERS, Josephus, Catharina, Henricus

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: An immersion lithographic apparatus is configured to subject a photosensitive layer on a substrate to a patterned beam of radiation via a liquid. The immersion lithographic apparatus comprises a moveable object having a surface, a fluid handling system (200) for controlling a presence of the liquid in a volume (11) restricted by the surface, the fluid handling system, and a free surface (201, 202) of the liquid, the free surface extending between the surface and the fluid handling system; and a heating system (207) configured to locally heat a portion of the liquid at a receding side of a periphery edge of the volume in contact with the surface, where the object is receding from the volume along a direction of movement of the object relative to the fluid handling system.

Abstract translation: 浸没式光刻设备被配置为经由液体使基板上的感光层经受图案化的辐射束。 浸没式光刻设备包括具有表面的可移动物体，用于控制在由表面限制的体积（11）中的液体存在的流体处理系统（200），流体处理系统和自由表面（201,202） ）的液体，自由表面在表面和流体处理系统之间延伸; 以及加热系统（207），其构造成在与所述表面接触的所述体积的周边边缘的后退侧处局部加热所述液体的一部分，其中所述物体沿着所述物体相对的运动方向从所述体积退出 到流体处理系统。

公开(公告)号：WO2013189827A3

公开(公告)日：2013-12-27

申请号：PCT/EP2013/062259

申请日：2013-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： RIEPEN, Michel ,  LABETSKI, Dzmitry ,  MESTROM, Wilbert ,  KAMPINGA, Wim, Ronald ,  NIEUWENKAMP, Jan, Okke ,  BRINKERT, Jacob ,  CASTELIJNS, Henricus ,  TEN KATE, Nicolaas ,  SCHIMMEL, Hendrikus ,  JANSEN, Hans ,  PAULUSSEN, Dennis ,  VIRGO, Brian ,  JILISEN, Reinier ,  BADIE, Ramin ,  RIJPMA, Albert ,  FRANKEN, Johannes ,  VAN PUTTEN, Peter ,  VAN DER STRAATEN, Gerrit

IPC: G03F7/20 ,  H05G2/00

Abstract: A radiation source (SO) comprising a fuel source configured to deliver fuel to a location (12) from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface (24c, d) provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

公开(公告)号：EP1955114A1

公开(公告)日：2008-08-13

申请号：EP06808564.6

申请日：2006-11-16

Applicant: ASML Netherlands B.V.

Inventor： OTTENS, Joost, Jeroen ,  TEN KATE, Nicolaas ,  KEMPER, Nicolaas, Rudolf ,  LEENDERS, Martinus, Hendrikus, Antonius ,  SMEULERS, Johannes, Petrus, Maria ,  BECKERS, Marcel ,  SHULEPOV, Sergel ,  RIEPEN, Michel

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A barrier member (10) is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly (70) on a bottom surface configured to face the substrate (W) . The extractor assembly includes a plate (200) configured to split the space between a liquid removal device and the substrate in two such that a meniscus (310) is formed in an upper channel (220) between the liquid removal device and the plate and such that a meniscus (320) is formed in a lower channel (230) below the plate between the plate and the substrate.

公开(公告)号：EP1955114B1

公开(公告)日：2011-01-05

申请号：EP06808564.6

申请日：2006-11-16

Applicant: ASML Netherlands B.V.

Inventor： OTTENS, Joost, Jeroen ,  TEN KATE, Nicolaas ,  KEMPER, Nicolaas, Rudolf ,  LEENDERS, Martinus, Hendrikus, Antonius ,  SMEULERS, Johannes, Petrus, Maria ,  BECKERS, Marcel ,  SHULEPOV, Sergel ,  RIEPEN, Michel

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A barrier member (10) is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly (70) on a bottom surface configured to face the substrate (W) . The extractor assembly includes a plate (200) configured to split the space between a liquid removal device and the substrate in two such that a meniscus (310) is formed in an upper channel (220) between the liquid removal device and the plate and such that a meniscus (320) is formed in a lower channel (230) below the plate between the plate and the substrate.