公开(公告)号：WO2014020003A1

公开(公告)日：2014-02-06

申请号：PCT/EP2013/065947

申请日：2013-07-30

Applicant: ASML NETHERLANDS B.V.

Inventor： BANINE, Vadim ,  MINNAERT, Arthur ,  MUITJENS, Marcel ,  YAKUNIN, Andrei ,  SCACCABAROZZI, Luigi ,  MALLMANN, Hans ,  BAL, Kursat ,  LUIJTEN, Carlo ,  NIENHUYS, Han-Kwang ,  HUIJBERTS, Alexander ,  GASSELING, Paulus ,  RIZO DIAGO, Pedro ,  VAN KAMPEN, Maarten ,  VAN AERLE, Nick

IPC: G03F7/20 ,  C01B31/04 ,  G21K1/06

CPC classification number: G03F7/70191 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/10

Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which is provided in the projection system (PSW) and adjacent the substrate table (WT). The spectral purity filter is preferably a membrane (14) formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.

Abstract translation: 公开了一种设置有光谱纯度滤光片的光刻设备，其设置在投影系统（PSW）中并且邻近衬底台（WT）。 光谱纯度滤光片优选为由多晶硅，多层材料，碳纳米管材料或石墨烯形成的膜（14）。 膜可以设置有保护性盖层和/或薄金属透明层。