公开(公告)号：WO2010149438A1

公开(公告)日：2010-12-29

申请号：PCT/EP2010/057008

申请日：2010-05-20

Applicant: ASML Netherlands B.V. ,  LAMMERS, Niels ,  SCACCABAROZZI, Luigi

Inventor： LAMMERS, Niels ,  SCACCABAROZZI, Luigi

IPC: G03F7/20 ,  B08B7/00 ,  H01L21/02 ,  B08B5/02

CPC classification number: G03F7/70925 ,  B08B5/02 ,  B08B7/0042 ,  G03F7/708 ,  H01L21/02046

Abstract: A lithographic projection apparatus may include a laser cleaning device. The laser cleaning device is constructed and arranged to clean a surface. The laser cleaning device includes a laser source constructed and arranged to generate radiation, and an optical element constructed and arranged to focus the radiation in a focal point in order to generate a cleaning plasma in a background gas above the surface. The laser cleaning device is further provided with a gas supply constructed and arranged to generate a jet of protection gas at a location near the plasma.

Abstract translation: 光刻投影装置可以包括激光清洁装置。 激光清洁装置被构造和布置成清洁表面。 激光清洁装置包括构造和布置成产生辐射的激光源，以及构造和布置成将焦点聚焦在光焦点上的光学元件，以便在表面上方的背景气体中产生清洁等离子体。 激光清洁装置还设置有气体供应构造和布置成在等离子体附近的位置处产生保护气体射流。

公开(公告)号：WO2014154452A1

公开(公告)日：2014-10-02

申请号：PCT/EP2014/054190

申请日：2014-03-04

Applicant: ASML NETHERLANDS B.V.

Inventor： WILEY, James, Norman ,  SCACCABAROZZI, Luigi ,  BROUNS, Derk, Servatius, Gertruda ,  ARIAS ESPINOZA, Juan Diego ,  DE WINTER, Laurentius, Cornelius ,  DHALLUIN, Florian, Didier, Albin ,  RIZO DIAGO, Pedro, Julian

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

CPC classification number: G03F1/64 ,  G03F1/62 ,  G03F7/70908 ,  G03F7/70983

Abstract: The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.

Abstract translation: 本发明涉及用于屏蔽用于EUV光刻的掩模版的装置。 该装置包括防护薄膜组件和至少一个与防护薄膜组件连通的致动器，所述致动器构造成在使用中诱导防护薄膜相对于掩模版的运动。

公开(公告)号：WO2011110467A2

公开(公告)日：2011-09-15

申请号：PCT/EP2011/053171

申请日：2011-03-03

Applicant: ASML Netherlands B.V. ,  IVANOV, Vladimir ,  ANTSIFEROV, Pavel ,  SIDELNIKOV, Yurii ,  SCACCABAROZZI, Luigi ,  NEERHOF, Hendrik ,  YAKUNIN, Andrei

Inventor： IVANOV, Vladimir ,  ANTSIFEROV, Pavel ,  SIDELNIKOV, Yurii ,  SCACCABAROZZI, Luigi ,  NEERHOF, Hendrik ,  YAKUNIN, Andrei

IPC: G03F7/20

CPC classification number: G03F7/70916

Abstract: A system for removing contaminant particles from the path of the beam of EUV radiation is provided in which at least a first AC voltage is provided to a pair of electrodes on opposite sides of the path of the beam of EUV radiation as a first stage of a regime of voltages and, as a second stage of the regime of voltages, a DC voltage is provided to the electrodes.

Abstract translation: 提供了一种用于从EUV辐射束的路径去除污染物颗粒的系统，其中至少第一AC电压被提供给EUV辐射束的路径的相对侧上的一对电极，作为第一级 作为电压状态的第二阶段，向电极提供直流电压。

公开(公告)号：WO2014020003A1

公开(公告)日：2014-02-06

申请号：PCT/EP2013/065947

申请日：2013-07-30

Applicant: ASML NETHERLANDS B.V.

Inventor： BANINE, Vadim ,  MINNAERT, Arthur ,  MUITJENS, Marcel ,  YAKUNIN, Andrei ,  SCACCABAROZZI, Luigi ,  MALLMANN, Hans ,  BAL, Kursat ,  LUIJTEN, Carlo ,  NIENHUYS, Han-Kwang ,  HUIJBERTS, Alexander ,  GASSELING, Paulus ,  RIZO DIAGO, Pedro ,  VAN KAMPEN, Maarten ,  VAN AERLE, Nick

IPC: G03F7/20 ,  C01B31/04 ,  G21K1/06

CPC classification number: G03F7/70191 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/10

Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which is provided in the projection system (PSW) and adjacent the substrate table (WT). The spectral purity filter is preferably a membrane (14) formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.

Abstract translation: 公开了一种设置有光谱纯度滤光片的光刻设备，其设置在投影系统（PSW）中并且邻近衬底台（WT）。 光谱纯度滤光片优选为由多晶硅，多层材料，碳纳米管材料或石墨烯形成的膜（14）。 膜可以设置有保护性盖层和/或薄金属透明层。

公开(公告)号：WO2011072905A1

公开(公告)日：2011-06-23

申请号：PCT/EP2010/065406

申请日：2010-10-14

Applicant: ASML NETHERLANDS B.V. ,  SCACCABAROZZI, Luigi ,  BANINE, Vadim ,  IVANOV, Vladimir ,  YAKUNIN, Andrei

Inventor： SCACCABAROZZI, Luigi ,  BANINE, Vadim ,  IVANOV, Vladimir ,  YAKUNIN, Andrei

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/7085 ,  G03F7/70866

Abstract: Thermal radiation from a path of a patterned beam is detected. Particles in the path of the patterned beam heat up quickly and radiate energy at a wavelength shorter than that of a surrounding environment. Thus, by detecting the thermal radiation it is possible to detect any particles in the path of the projection beam. If particles are detected, a mask can be sealed or removed, such that particles will not adhere to it.

Abstract translation: 检测来自图案化光束的路径的热辐射。 图案化光束的路径中的粒子快速加热，并以比周围环境的波长短的波长辐射能量。 因此，通过检测热辐射，可以检测投影光束的路径中的任何粒子。 如果检测到颗粒，则可以密封或去除掩模，使得颗粒不会粘附到其上。

公开(公告)号：WO2010149403A1

公开(公告)日：2010-12-29

申请号：PCT/EP2010/054785

申请日：2010-04-13

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V. ,  DEN BOEF, Arie ,  VLADIMIRSKY, Yuli ,  SHMAREV, Yevgeniy ,  SCACCABAROZZI, Luigi ,  THARALDSEN, Robert ,  JACOBS, Richard

Inventor： DEN BOEF, Arie ,  VLADIMIRSKY, Yuli ,  SHMAREV, Yevgeniy ,  SCACCABAROZZI, Luigi ,  THARALDSEN, Robert ,  JACOBS, Richard

IPC: G01N21/94 ,  G01N21/956

CPC classification number: G03F1/84 ,  G01N21/94 ,  G01N21/95607 ,  G01N2021/95676 ,  G03H1/0443 ,  G03H2001/0264 ,  G03H2001/0447 ,  G03H2001/0456 ,  G03H2001/0458 ,  G03H2222/43 ,  G03H2223/12 ,  G03H2223/55

Abstract: Disclosed are systems and methods for object inspection, in particular for inspection of reticles used in a lithography process. The method includes interferometrically combining a reference radiation beam with a probe radiation beam, and storing their complex field images. The complex field image of one object is then compared with that of a reference object to determine the differences. The systems and methods have particular utility in the inspection of a reticle for defects.

Abstract translation: 公开了用于物体检查的系统和方法，特别是用于光刻工艺中使用的光罩的检查。 该方法包括将参考辐射束与探针辐射束干涉地组合，并存储其复杂场图像。 然后将一个对象的复杂场图像与参考对象的复合场图像进行比较以确定差异。 这些系统和方法在检查用于缺陷的掩模版时具有特殊的用途。

公开(公告)号：WO2017032569A1

公开(公告)日：2017-03-02

申请号：PCT/EP2016/068445

申请日：2016-08-02

Applicant: ASML NETHERLANDS B.V.

Inventor： BANINE, Vadim, Yevgenyevich ,  NIENHUYS, Han-Kwang ,  SCACCABAROZZI, Luigi

IPC: G03F7/20 ,  G02B5/20 ,  G02B5/28 ,  G02B5/18 ,  G02B27/42

CPC classification number: G03F7/70191 ,  G02B5/1861 ,  G02B5/208 ,  G02B5/281 ,  G02B27/4244 ,  G03F7/70033 ,  G03F7/70158 ,  G03F7/70175 ,  G03F7/70575

Abstract: Disclosed is a suppression filter having a profile defining at least two reflective surface levels, each reflected surface level being separated by a separation distance. The separation distance is such that the reflective suppression filter is operable to substantially prevent specular reflection of radiation at a first wavelength and at a second wavelength incident on said reflective suppression filter. Also disclosed is a radiation collector, radiation source and lithographic apparatus comprising such a suppression filter, and to a method of determining a separation distance between at least two reflective surface levels of a suppression filter.

Abstract translation: 公开了一种具有限定至少两个反射表面水平的轮廓的抑制滤波器，每个反射表面水平被间隔开距离。 分离距离使得反射抑制滤光器可操作以基本上防止在入射到所述反射抑制滤光器上的第一波长和第二波长的辐射的镜面反射。 还公开了一种辐射收集器，辐射源和包括这种抑制滤波器的光刻设备，以及确定抑制滤波器的至少两个反射表面电平之间的间隔距离的方法。

公开(公告)号：WO2012123144A1

公开(公告)日：2012-09-20

申请号：PCT/EP2012/050727

申请日：2012-01-18

Applicant: ASML NETHERLANDS B.V. ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  CADEE, Theodorus ,  AKKERMANS, Johannes ,  SCACCABAROZZI, Luigi ,  VALENTIN, Christiaan, Louis

Inventor： BANINE, Vadim ,  LOOPSTRA, Erik ,  CADEE, Theodorus ,  AKKERMANS, Johannes ,  SCACCABAROZZI, Luigi ,  VALENTIN, Christiaan, Louis

IPC: G03F7/20

CPC classification number: H01L21/6833 ,  G03F7/70691 ,  G03F7/70708 ,  G03F7/70783 ,  G03F9/7034

Abstract: Disclosed is an electrostatic clamp apparatus ( 500 ) constructed to support a patterning device ( 505 ) of a lithographic apparatus, comprising a support structure against which said patterning device is supported, clamping electrodes ( 525 ) for providing a clamping force between the support structure and patterning device, and an array of capacitive sensors ( 660 ) operable to measure the shape of said patterning device.

Abstract translation: 公开了一种构造成支撑光刻设备的图案形成装置（505）的静电夹紧装置（500），其包括支撑所述图案形成装置的支撑结构，夹持电极（525），用于在支撑结构和 图案形成装置，以及可操作以测量所述图案形成装置的形状的电容传感器阵列（660）。

公开(公告)号：WO2011015412A1

公开(公告)日：2011-02-10

申请号：PCT/EP2010/059460

申请日：2010-07-02

Applicant: ASML Netherlands B.V. ,  IVANOV, Vitalii ,  DEN BOEF, Arie ,  BANINE, Vadim ,  SCACCABAROZZI, Luigi ,  IOSAD, Nikolay

Inventor： IVANOV, Vitalii ,  DEN BOEF, Arie ,  BANINE, Vadim ,  SCACCABAROZZI, Luigi ,  IOSAD, Nikolay

IPC: G03F1/00 ,  G03F1/14 ,  G01N21/64 ,  G01N21/95

CPC classification number: G03F1/84 ,  G01N21/6408 ,  G01N21/6489 ,  G01N21/65 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G03F1/24

Abstract: Methods and systems for inspection of an object include the use of spectroscopic techniques for the detection of unwanted particles on an object's surface, based on the different responses of the unwanted particles as compared with the object to be inspected due to their different materials. Time resolved spectroscopy and/or energy resolved spectroscopy of secondary photon emission from the surface of the object can be used to obtain Raman and photoluminescence spectra. The objects to be inspected can for example be a patterning device as used in a lithographic process, for example a reticle, in which case the presence of metal, metal oxide or organic particles can be detected, for example. The methods and apparatus are highly sensitive, for example, being able to detect small particles (sub 100 nm, particularly sub 50 nm) on the patterned side of an EUV reticle.

Abstract translation: 用于检查物体的方法和系统包括使用光谱技术来检测物体表面上的不需要的颗粒，这是由于不同的物质与不同的物质相比，由于不同的物质而与被检查物体的不同响应。 可以使用来自物体表面的二次光子发射的时间分辨光谱和/或能量分辨光谱来获得拉曼和光致发光光谱。 待检查的物体可以是例如在光刻工艺中使用的图案形成装置，例如掩模版，在这种情况下，例如可以检测到金属，金属氧化物或有机颗粒的存在。 所述方法和装置是高度敏感的，例如能够检测EUV掩模版图案侧的小颗粒（小于100nm，特别是低于50nm）。

公开(公告)号：WO2009152885A1

公开(公告)日：2009-12-23

申请号：PCT/EP2009/001581

申请日：2009-03-06

Applicant: CARL ZEISS SMT AG ,  ASML NETHERLANDS B.V. ,  EHM, Dirk, Heinrich ,  STORM, Arnoldus Jan ,  MOORS, Johannes Hubertus Josephina ,  CZAP, Almut ,  NAGEL, Mona ,  VAN DER DONCK, Jacques, Cor, Johan ,  STORTELDER, Jetske ,  SANDTKE, Marijn ,  CABALLERO, Maria, Isabel, Catalina ,  SCACCABAROZZI, Luigi ,  SCHMIDT, Stefan ,  KRAUS, Dieter ,  WIESNER, Stefan ,  KÖHLER, Stefan ,  CHUNG, Hin Yiu Anthony

Inventor： EHM, Dirk, Heinrich ,  STORM, Arnoldus Jan ,  MOORS, Johannes Hubertus Josephina ,  CZAP, Almut ,  NAGEL, Mona ,  VAN DER DONCK, Jacques, Cor, Johan ,  STORTELDER, Jetske ,  SANDTKE, Marijn ,  CABALLERO, Maria, Isabel, Catalina ,  SCACCABAROZZI, Luigi ,  SCHMIDT, Stefan ,  KRAUS, Dieter ,  WIESNER, Stefan ,  KÖHLER, Stefan ,  CHUNG, Hin Yiu Anthony

IPC: G03F7/20 ,  G21K1/00

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70975 ,  G03F7/70983 ,  G21K1/062

Abstract: An optical assembly serves the purpose of being mounted in a projection exposure apparatus (101) for EUV microlithography and comprises at least one vacuum chamber (70, 71, 68a), at least one optical element (6, 7; 65, 66; 63) arranged in the vacuum chamber (70, 71, 68a), the optical element (6, 7; 65, 66; 63) having an optical surface (18) which may be impinged upon by a useful beam bundle (3) of the projection exposure apparatus (101), and a cleaning device (72) for cleaning the optical surface (18). The cleaning device (72) is configured to perform particle cleaning of the optical surface (18) at a gas pressure within the vacuum chamber (70,71, 68a) which is higher than a vacuum pressure (p0) for performing an exposure operation with the projection exposure apparatus (101). The result is an optical assembly capable of providing optical elements having an optical surface which may be impinged upon by a useful beam bundle which can be cleaned reliably from foreign particles.

Abstract translation: 光学组件用于安装在用于EUV微光刻的投影曝光设备（101）中，并且包括至少一个真空室（70,71,68a），至少一个光学元件（6,7; 65,66,63 ），所述光学元件（6,7; 65,66,63）具有光学表面（18），所述光学表面可被所述真空室（70,71,68a）的有用光束束（3）撞击 投影曝光装置（101）和用于清洁光学表面（18）的清洁装置（72）。 清洁装置（72）构造成在真空室（70,71,68a）内的气体压力下进行光学表面（18）的粒子清洁，该气体压力高于用于进行曝光操作的真空压力（p0） 投影曝光装置（101）。 其结果是能够提供光学元件的光学组件，该光学元件具有光学表面，该光学表面可以被可以被外界颗粒可靠地清洁的有用束束撞击。