公开(公告)号：WO2014020003A1

公开(公告)日：2014-02-06

申请号：PCT/EP2013/065947

申请日：2013-07-30

Applicant: ASML NETHERLANDS B.V.

Inventor： BANINE, Vadim ,  MINNAERT, Arthur ,  MUITJENS, Marcel ,  YAKUNIN, Andrei ,  SCACCABAROZZI, Luigi ,  MALLMANN, Hans ,  BAL, Kursat ,  LUIJTEN, Carlo ,  NIENHUYS, Han-Kwang ,  HUIJBERTS, Alexander ,  GASSELING, Paulus ,  RIZO DIAGO, Pedro ,  VAN KAMPEN, Maarten ,  VAN AERLE, Nick

IPC: G03F7/20 ,  C01B31/04 ,  G21K1/06

CPC classification number: G03F7/70191 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/10

Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which is provided in the projection system (PSW) and adjacent the substrate table (WT). The spectral purity filter is preferably a membrane (14) formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.

Abstract translation: 公开了一种设置有光谱纯度滤光片的光刻设备，其设置在投影系统（PSW）中并且邻近衬底台（WT）。 光谱纯度滤光片优选为由多晶硅，多层材料，碳纳米管材料或石墨烯形成的膜（14）。 膜可以设置有保护性盖层和/或薄金属透明层。

公开(公告)号：WO2009150018A1

公开(公告)日：2009-12-17

申请号：PCT/EP2009/056131

申请日：2009-05-20

Applicant: ASML NETHERLANDS B.V. ,  SCHMITZ, Roger ,  VAN EMPEL, Tjarko ,  MUITJENS, Marcel ,  CHENG, Lun ,  JANSSEN, Frank ,  VAN HELDEN, William ,  VERSLUIS, Richard ,  SCHAAREMAN, Paul ,  LEXMOND, Axel ,  NIEUWKOOP, Evert ,  POTTS, Bill ,  LEMMEN, Martin ,  VAN DER GRAAF, Rik ,  DE KROON, Machteld ,  VELTHUIS, Han

Inventor： SCHMITZ, Roger ,  VAN EMPEL, Tjarko ,  MUITJENS, Marcel ,  CHENG, Lun ,  JANSSEN, Frank ,  VAN HELDEN, William ,  VERSLUIS, Richard ,  SCHAAREMAN, Paul ,  LEXMOND, Axel ,  NIEUWKOOP, Evert ,  POTTS, Bill ,  LEMMEN, Martin ,  VAN DER GRAAF, Rik ,  DE KROON, Machteld ,  VELTHUIS, Han

IPC: G03F7/20 ,  H01L21/00

CPC classification number: G03F7/70891 ,  G02B7/008 ,  G03F7/70875 ,  G03F7/709 ,  G03F7/70983 ,  G21K2201/067

Abstract: A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid, to supply thermally conditioned fluid to the reservoir. A flow rate of the fluid during the irradiating of the optical element is lower than a flow rate of the fluid when the optical element is not-irradiated.

Abstract translation: 用于热调节光学元件的方法包括用辐射照射光学元件，不用辐射照射光学元件，允许光学元件和保持在调节液体储存器中的调节流体之间的热流动，并且提供流体 调节流体的流动，以将热调节的流体供应到储存器。 在光学元件的照射期间，流体的流量比不照射光学元件时的流体的流量低。