公开(公告)号：NL2011663A

公开(公告)日：2014-05-19

申请号：NL2011663

申请日：2013-10-23

Applicant: ASML NETHERLANDS BV

Inventor： SCHIMMEL HENDRIKUS ,  RIEPEN MICHEL ,  JILISEN REINIER ,  GRAAF DENNIS

IPC: G03F7/20 ,  H05G2/00

Abstract: A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.

公开(公告)号：NL2009241A

公开(公告)日：2013-03-05

申请号：NL2009241

申请日：2012-07-27

Applicant: ASML NETHERLANDS BV

Inventor： KEMPEN ANTONIUS ,  LOOPSTRA ERIK ,  RENTROP CORNE ,  GRAAF DENNIS ,  GUBBELS FRITS ,  HAYES GREGORY RICHARD ,  WIEL BART

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2004837A

公开(公告)日：2011-01-10

申请号：NL2004837

申请日：2010-06-07

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  IVANOV VLADIMIR ,  MOORS JOHANNES ,  SWINKELS GERARDUS ,  YAKUNIN ANDREI ,  GRAAF DENNIS ,  STAMM UWE

IPC: H05G2/00 ,  G03F7/20

Abstract: A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.