公开(公告)号：NL2011772A

公开(公告)日：2014-01-13

申请号：NL2011772

申请日：2013-11-08

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BENSCHOP JOZEF ,  MOORS JOHANNES

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2009352A

公开(公告)日：2013-03-25

申请号：NL2009352

申请日：2012-08-23

Applicant: ASML NETHERLANDS BV

Inventor： SCHOOT JAN ,  BANINE VADIM ,  YAKUNIN ANDREI ,  KREUWEL HERMANUS ,  MOORS JOHANNES ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  SWINKELS GERARDUS ,  STAMM UWE ,  VANDERHALLEN IVO

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2005763A

公开(公告)日：2011-01-06

申请号：NL2005763

申请日：2010-11-26

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  LOOPSTRA ERIK ,  MOORS JOHANNES ,  YAKUNIN ANDREI

IPC: G03F7/20

公开(公告)号：NL2004968A

公开(公告)日：2010-08-02

申请号：NL2004968

申请日：2010-06-25

Applicant: ASML NETHERLANDS BV

Inventor： KEMPEN ANTONIUS ,  BRULS RICHARD ,  LOOPSTRA ERIK ,  MOORS JOHANNES ,  SWINKELS GERARDUS ,  MESTROM WILBERT

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2011514A

公开(公告)日：2014-05-06

申请号：NL2011514

申请日：2013-09-27

Applicant: ASML NETHERLANDS BV

Inventor： EURLINGS MARKUS ,  TYCHKOV ANDREY ,  MOORS JOHANNES

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：AT552519T

公开(公告)日：2012-04-15

申请号：AT09715126

申请日：2009-02-24

Applicant: ASML NETHERLANDS BV

Inventor： SOER WOUTER ,  BANINE VADIM ,  MOORS JOHANNES ,  VAN HERPEN MAARTEN ,  YAKURIN ANDREY

IPC: G02B5/20 ,  G02B5/08 ,  G02B5/22 ,  G02B5/26 ,  G03F7/20 ,  G21K1/06

公开(公告)号：NL2006106A

公开(公告)日：2011-02-17

申请号：NL2006106

申请日：2011-01-31

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  BANINE VADIM ,  IVANOV VLADIMIR ,  MOORS JOHANNES ,  SWINKELS GERARDUS ,  KEMPEN ANTONIUS ,  YAKUNIN ANDREI

IPC: G03F7/20

公开(公告)号：NL2004837A

公开(公告)日：2011-01-10

申请号：NL2004837

申请日：2010-06-07

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  IVANOV VLADIMIR ,  MOORS JOHANNES ,  SWINKELS GERARDUS ,  YAKUNIN ANDREI ,  GRAAF DENNIS ,  STAMM UWE

IPC: H05G2/00 ,  G03F7/20

Abstract: A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.

公开(公告)号：NL2003405A

公开(公告)日：2010-03-30

申请号：NL2003405

申请日：2009-08-28

Applicant: ASML NETHERLANDS BV

Inventor： SCACCABAROZZI LUIGI ,  BANINE VADIM ,  KOSTER NORBERTUS ,  MOORS JOHANNES ,  KAMPEN MAARTEN ,  RAJU RAMASAMY ,  LYTLE WAYNE MATHEW ,  RUZIC DAVID NEIL ,  NEUMANN MARTIN JOHN

IPC: B08B7/00 ,  G03F7/20