公开(公告)号：WO2013127587A3

公开(公告)日：2013-10-24

申请号：PCT/EP2013051657

申请日：2013-01-29

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  FRANKEN JOHANNES ,  KEMPEN ANTONIUS ,  VAN KAMPEN MAARTEN ,  MESTROM WILBERT

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  G03F7/7095 ,  H05G2/003

Abstract: A source collector apparatus includes a plasma generation apparatus arranged to excite a fuel to form a radiation emitting plasma, a collector arranged to collect the radiation, and a contamination receiving apparatus, wherein the contamination receiving apparatus is provided with a porous structure.

Abstract translation: 源极收集器装置包括等离子体产生装置，其被布置成激发燃料以形成辐射发射等离子体，收集辐射的收集器以及污染物接收装置，其中污染物接收装置具有多孔结构。

公开(公告)号：NL2011533A

公开(公告)日：2014-05-06

申请号：NL2011533

申请日：2013-10-01

Applicant: ASML NETHERLANDS BV

Inventor： GREEVENBROEK HENDRIKUS ,  BADIE RAMIN ,  BANINE VADIM ,  DIJKSMAN JOHAN ,  KEMPEN ANTONIUS ,  YAKUNIN ANDREI ,  WINKELS KOEN GERHARDUS

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2007859A

公开(公告)日：2011-12-19

申请号：NL2007859

申请日：2011-11-24

Applicant: ASML NETHERLANDS BV

Inventor： KEMPEN ANTONIUS

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2011760A

公开(公告)日：2014-01-13

申请号：NL2011760

申请日：2013-11-08

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT GMBH

Inventor： LOOPSTRA ERIK ,  BEERENS RUUD ,  BIELING STIG ,  CADEE THEODORUS PETRUS MARIA ,  DONDERS SJOERD ,  FRIJNS OLAV ,  KEMPEN ANTONIUS ,  SCHEEPERS MARCUS ,  STRUYCKEN ALEXANDER ,  KATE NICOLAAS ,  LIESHOUT RICHARD HENRICUS ADRIANUS ,  VANDERHALLEN IVO

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2010269A

公开(公告)日：2013-09-10

申请号：NL2010269

申请日：2013-02-07

Applicant: ASML NETHERLANDS BV

Inventor： KEMPEN ANTONIUS ,  DIJKSMAN JOHAN ,  MESTROM WILBERT

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2010626A

公开(公告)日：2013-06-24

申请号：NL2010626

申请日：2013-04-11

Applicant: ASML NETHERLANDS BV

Inventor： HENDRIKS JIMI ,  BRUEBACH JOERG ,  HUIJBREGTSE JEROEN ,  BOOGAARD ARJEN ,  KEMPEN ANTONIUS ,  SINGH HARMEET ,  HUIJSER SASKIA

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2009358A

公开(公告)日：2013-03-26

申请号：NL2009358

申请日：2012-08-24

Applicant: ASML NETHERLANDS BV

Inventor： AKKER JEROEN ,  KEMPEN ANTONIUS ,  KUIJPERS ADRIAAN

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2009240A

公开(公告)日：2013-03-05

申请号：NL2009240

申请日：2012-07-27

Applicant: ASML NETHERLANDS BV

Inventor： HULTERMANS RONALD ,  KEMPEN ANTONIUS ,  ESSEN BEN

IPC: G03F7/20 ,  H05G2/00

Abstract: A radiation source for generating EUV from a stream of molten metal fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel and at least one laser configured to vaporise at least some of said droplets of fuel, whereby radiation is generated. The fuel droplet generator has nozzle, fuel supply line, and reservoir, with a pumping device arranged to supply a flow of molten metal fuel from the reservoir through the fuel feed line and out of the nozzle as a stream of droplets. The fuel droplet generator has a replaceable filter assembly in the fuel feed line, arranged to filter the molten metal fuel in use, to deter nozzle blockage by solid particulate impurities in the fuel.

公开(公告)号：NL2004968A

公开(公告)日：2010-08-02

申请号：NL2004968

申请日：2010-06-25

Applicant: ASML NETHERLANDS BV

Inventor： KEMPEN ANTONIUS ,  BRULS RICHARD ,  LOOPSTRA ERIK ,  MOORS JOHANNES ,  SWINKELS GERARDUS ,  MESTROM WILBERT

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2003152A1

公开(公告)日：2010-02-16

申请号：NL2003152

申请日：2009-07-08

Applicant: ASML NETHERLANDS BV

Inventor： KEMPEN ANTONIUS ,  BANINE VADIM ,  IVANOV VLADIMIR ,  LOOPSTRA ERIK

IPC: H05G2/00 ,  G03F7/20