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    SOURCE-COLLECTOR DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD
    1.
    发明申请
    SOURCE-COLLECTOR DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
    源收集器件，光刻设备和器件制造方法

    公开(公告)号：WO2013107686A2

    公开(公告)日：2013-07-25

    申请号：PCT/EP2013050406

    申请日：2013-01-10

    Applicant: ASML NETHERLANDS BV

    Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  MOORS ROEL ,  VAN SCHOOT JAN ,  VERHAGEN MARTINUS ,  FRIJNS OLAV ,  KRIVTSUN VLADIMIR ,  SWINKELS GERARDUS ,  RIEPEN MICHEL ,  SCHIMMEL HENDRIKUS ,  MEDVEDEV VIACHESLAV

    IPC: G03F7/20

    CPC classification number: G03F7/70033 ,  G03F7/70166 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70916 ,  G21K1/067 ,  G21K2201/064 ,  H05G2/008

    Abstract: A source-collector device is constructed and arranged to generate a radiation beam, The device includes a target unit constructed and arranged to present a target surface of plasma- forming material; a laser unit constructed and arranged to generate a beam of radiation directed onto the target surface so as to form a plasma from said plasma-forming material; a contaminant trap constructed and arranged to reduce propagation of particulate contaminants generated by the plasma; a radiation collector comprising a plurality of grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom; and a filter constructed and arranged to attenuate at least one wavelength range of the beam.

    Abstract translation: 源极集电极器件被构造和布置成产生辐射束。该器件包括构造和布置成呈现等离子体形成材料的目标表面的靶单元; 激光单元，其被构造和布置成产生被引导到所述目标表面上的辐射束，以便形成来自所述等离子体形成材料的等离子体; 构造和布置以减少由等离子体产生的颗粒污染物的传播的污染物阱; 辐射收集器，包括多个放射入射反射器，其布置成收集由等离子体发射的辐射并从其形成光束; 以及被构造和布置成衰减所述光束的至少一个波长范围的滤光器。

    3.
    发明专利
    未知

    公开(公告)号：AT544096T

    公开(公告)日：2012-02-15

    申请号：AT09169802

    申请日：2009-09-09

    Applicant: ASML NETHERLANDS BV

    Inventor： SCHIMMEL HENDRIKUS ,  BANINE VADIM ,  LOOPSTRA ERIK

    IPC: G03F7/20 ,  H05G2/00

    Abstract: A radiation source for generation of extreme ultraviolet radiation or use in high resolution lithography includes a plasma formation site where fuel is contacted by a radiation beam to form a plasma (12) generating EUV radiation. A mirrored collector (10) collects and reflects the EUV radiation generated at a first focus towards a second focus (F2). A contamination barrier (20) is positioned such the periphery of the contamination barrier does not occlude more than 50% of the solid angle subtended by the mirror at the second focus, such that EUV radiation reflected by the collector mirror is not excessively attenuated by passing through the contamination barrier. The contamination barrier serves to trap fuel material such as ions, atoms, molecules or nanodroplets from the plasma to prevent their deposition onto the collector mirror where they reduce the mirror's effective lifetime. Gas extraction ports may be provided near the plasma formation site to suppress diffusion of fuel debris and contamination towards the collector mirror.

    RADIATION SOURCE AND METHOD FOR LITHOGRAPHY.
    4.
    发明专利
    RADIATION SOURCE AND METHOD FOR LITHOGRAPHY. 未知

    公开(公告)号：NL2011663A

    公开(公告)日：2014-05-19

    申请号：NL2011663

    申请日：2013-10-23

    Applicant: ASML NETHERLANDS BV

    Inventor： SCHIMMEL HENDRIKUS ,  RIEPEN MICHEL ,  JILISEN REINIER ,  GRAAF DENNIS

    IPC: G03F7/20 ,  H05G2/00

    Abstract: A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.

    7.
    发明专利
    未知

    公开(公告)号：AT536567T

    公开(公告)日：2011-12-15

    申请号：AT09165403

    申请日：2009-07-14

    Applicant: ASML NETHERLANDS BV

    Inventor： LOOPSTRA ERIK ,  SCHIMMEL HENDRIKUS

    IPC: G03F7/20 ,  H05G2/00

    Abstract: A radiation source is configured to generate radiation. The radiation source includes a fuel droplet generator (6) constructed and arranged to generate a stream of droplets of fuel (34) that are directed to a plasma generation site (32); a laser constructed and arranged to generate a laser beam (4) that is directed to the plasma generation site, an angle between the direction of movement of the stream of droplets and the direction of the laser beam being less than about 90°; and a collector (8) constructed and arranged to collect radiation generated by a plasma formed at the plasma formation site when the beam of radiation and a droplet collide. The collector is configured to reflect the radiation substantially along an optical axis of the radiation source. The laser beam is directed to the plasma generation site through an aperture provided in the collector.

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