公开(公告)号：JP2011002452A

公开(公告)日：2011-01-06

申请号：JP2010133468

申请日：2010-06-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： HARDEMAN TOON

IPC: G01D5/30 ,  G01D5/38 ,  H01L21/027 ,  H01L21/68

CPC classification number: G01D5/34715 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To determine defects inside a grid plate of an encoder type position measurement system.SOLUTION: In steps for providing the encoder type position measurement system for measuring a position of a movable object to another object, the encoder-type position measurement system includes a method including a step including a grip plate and an encode head; a step for measuring the quantity of light reflected by each of not less than two detectors; a step for determining a reflectance signal indicating the reflectance of the grid plate at a measurement position by using coupling radiation beam intensity of radiation beams reflected by not less than two detectors; and a step for determining the presence of defects in measurement positions, based on the reflectance signal of the grid plate.

Abstract translation: 要解决的问题：确定编码器型位置测量系统的格板内的缺陷。解决方案：在提供用于测量可移动物体到另一物体的位置的编码器型位置测量系统的步骤中，编码器型位置测量 系统包括包括夹持板和编码头的步骤的方法; 用于测量由至少两个检测器中的每一个反射的光量的步骤; 通过使用由不少于两个检测器反射的辐射束的耦合辐射束强度来确定表示测量位置处的格栅板的反射率的反射信号的步骤; 以及基于栅格板的反射信号确定测量位置的缺陷的存在的步骤。

公开(公告)号：NL2006058A

公开(公告)日：2011-09-06

申请号：NL2006058

申请日：2011-01-25

Applicant: ASML NETHERLANDS BV

Inventor： VERHAAR BOUDEWIJN ,  GEERKE JOHAN ,  ANGELIS GEORGO ,  HAMERS MARTIJN ,  GEERLINGS ALEXANDER ,  HOEKSTRA PETER ,  HARDEMAN TOON

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/68

公开(公告)号：NL2006014A

公开(公告)日：2011-09-06

申请号：NL2006014

申请日：2011-01-17

Applicant: ASML NETHERLANDS BV

Inventor： VERHAAR BOUDEWIJN ,  GEERKE JOHAN ,  HAMERS MARTIJN ,  GEERLINGS ALEXANDER ,  HOEKSTRA PETER ,  HARDEMAN TOON

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/68

公开(公告)号：NL2006929A

公开(公告)日：2012-02-13

申请号：NL2006929

申请日：2011-06-14

Applicant: ASML NETHERLANDS BV

Inventor： SCHIFFART CATHARINUS ,  HARDEMAN TOON ,  SCHOTHORST GERARD ,  JEUNINK ANDRE ,  RENKENS MICHAEL ,  FOCKERT GEORGE ,  BAARS GREGOR ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE ,  JANSEN NORBERT

IPC: G03F7/00

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.