公开(公告)号：NL2004409A

公开(公告)日：2010-11-22

申请号：NL2004409

申请日：2010-03-16

Applicant: ASML NETHERLANDS BV

Inventor： SCHIFFART CATHARINUS ,  JEUNINK ANDRE ,  VERMEULEN JOHANNES ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE ,  JANSEN NORBERT

IPC: G03F7/00

公开(公告)号：NL2002942A

公开(公告)日：2010-03-09

申请号：NL2002942

申请日：2009-05-28

Applicant: ASML NETHERLANDS BV

Inventor： KRUIJT-STEGEMAN YVONNE ,  JEUNINK ANDRE ,  VERMEULEN JOHANNES ,  WUISTER SANDER ,  LAFARRE RAYMOND ,  SCHIFFART CATHARINUS ,  JANSEN NORBERT

IPC: G03F7/00 ,  H01L21/30

公开(公告)号：NL2006929A

公开(公告)日：2012-02-13

申请号：NL2006929

申请日：2011-06-14

Applicant: ASML NETHERLANDS BV

Inventor： SCHIFFART CATHARINUS ,  HARDEMAN TOON ,  SCHOTHORST GERARD ,  JEUNINK ANDRE ,  RENKENS MICHAEL ,  FOCKERT GEORGE ,  BAARS GREGOR ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE ,  JANSEN NORBERT

IPC: G03F7/00

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：NL2004281A

公开(公告)日：2010-09-20

申请号：NL2004281

申请日：2010-02-22

Applicant: ASML NETHERLANDS BV

Inventor： EMPEL TJARKO ,  HOUKES MARTIJN ,  JANSEN NORBERT

IPC: G03F7/20