公开(公告)号：JP2010245521A

公开(公告)日：2010-10-28

申请号：JP2010069014

申请日：2010-03-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： IOSAD NIKOLAY ,  MAURY PASCAL ANNE

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To improve the throughput of a lithographic apparatus. SOLUTION: An imprint lithography apparatus includes: a first imprint template 210 with pattern recesses 201; and a second imprint template with pattern recesses, wherein the pattern recesses of the first imprint template are configured to form on a substrate features which interconnect laterally with features formed by the pattern recesses of the second imprint template, and wherein the pattern recesses of the second imprint template are more than three times larger in size than a critical dimension of the pattern recesses of the first imprint template. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提高光刻设备的生产量。 压印光刻设备包括：具有图案凹槽201的第一印模模板210; 以及具有图形凹部的第二印模模板，其中所述第一印模模板的图案凹槽被配置为在基板上形成与所述第二印模模板的图案凹部形成的特征横向互连的特征，并且其中所述第二印模模板的图案凹部 压印模板的尺寸比第一印模模板图案凹槽的临界尺寸大三倍以上。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：WO2012136434A3

公开(公告)日：2012-12-13

申请号：PCT/EP2012053918

申请日：2012-03-07

Applicant: ASML NETHERLANDS BV ,  DE JAGER PIETER ,  BANINE VADIM ,  ONVLEE JOHANNES ,  STEVENS LUCAS ,  WUISTER SANDER ,  IOSAD NIKOLAY

Inventor： DE JAGER PIETER ,  BANINE VADIM ,  ONVLEE JOHANNES ,  STEVENS LUCAS ,  WUISTER SANDER ,  IOSAD NIKOLAY

IPC: G02F1/29 ,  G03F7/20

CPC classification number: G03F7/70191 ,  G02F1/1303 ,  G02F1/29 ,  G03F7/704

Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.

Abstract translation: 在一个实施例中，公开了一种光刻设备，其包括调制器，其被配置为将基板的曝光区域暴露于根据期望图案调制的多个光束;以及投影系统，该投影系统配置成将经调制的光束投影到基板上。 调制器包括偏转器，用于相对于曝光区域移位多个光束。

公开(公告)号：NL2008426A

公开(公告)日：2012-10-09

申请号：NL2008426

申请日：2012-03-07

Applicant: ASML NETHERLANDS BV

Inventor： JAGER PIETER ,  BANINE VADIM ,  ONVLEE JOHANNES ,  STEVENS LUCAS ,  WUISTER SANDER ,  IOSAD NIKOLAY

IPC: G03F7/20

公开(公告)号：NL2004265A

公开(公告)日：2010-10-04

申请号：NL2004265

申请日：2010-02-18

Applicant: ASML NETHERLANDS BV

Inventor： IOSAD NIKOLAY ,  MAURY PASCALE

IPC: G03F7/00

公开(公告)号：SG176740A1

公开(公告)日：2012-01-30

申请号：SG2011090974

申请日：2010-07-02

Applicant: ASML NETHERLANDS BV

Inventor： IVANOV VITALII ,  DEN BOEF ARIE ,  BANINE VADIM ,  SCACCABAROZZI LUIGI ,  IOSAD NIKOLAY

IPC: G03F1/00

Abstract: Methods and systems for inspection of an object include the use of spectroscopic techniques for the detection of unwanted particles on an object's surface, based on the different responses of the unwanted particles as compared with the object to be inspected due to their different materials. Time resolved spectroscopy and/or energy resolved spectroscopy of secondary photon emission from the surface of the object can be used to obtain Raman and photoluminescence spectra. The objects to be inspected can for example be a patterning device as used in a lithographic process, for example a reticle, in which case the presence of metal, metal oxide or organic particles can be detected, for example. The methods and apparatus are highly sensitive, for example, being able to detect small particles (sub 100 nm, particularly sub 50 nm) on the patterned side of an EUV reticle.

公开(公告)号：NL2005021A

公开(公告)日：2011-02-07

申请号：NL2005021

申请日：2010-07-02

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  IVANOV VITALII ,  BOEF ARIE ,  SCACCABAROZZI LUIGI ,  IOSAD NIKOLAY

IPC: G01N21/64 ,  G03F1/00 ,  H01L21/66

公开(公告)号：NL2003364A

公开(公告)日：2010-03-29

申请号：NL2003364

申请日：2009-08-20

Applicant: ASML NETHERLANDS BV

Inventor： IOSAD NIKOLAY ,  GUI CHENG-QUN

IPC: G03F7/20

公开(公告)号：NL2003349A

公开(公告)日：2010-03-16

申请号：NL2003349

申请日：2009-08-13

Applicant: ASML NETHERLANDS BV

Inventor： GUI CHENG-QUN ,  IOSAD NIKOLAY

IPC: G03F7/20

Abstract: A lithographic method includes providing particles in dry form on a substrate, or on material provided on the substrate, irradiating one or more of the particles with a dose of radiation, the dose of radiation being sufficient to ensure that at least one particle of the one or more particles is bonded to the substrate, or to the material provided on the substrate, and removing particles from the substrate, or from material provided on the substrate, that have not been bonded to the substrate, or to the material provided on the substrate.