公开(公告)号：KR20200125942A

公开(公告)日：2020-11-05

申请号：KR20207025275

申请日：2019-02-28

Applicant: ASML NETHERLANDS BV

Inventor： MA YUE ,  KEMPEN ANTONIUS THEODORUS WILHELMUS ,  HUMMLER KLAUS MARTIN ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  ROMMERS JEROEN HUBERT ,  VAN DE WIEL HUBERTUS JOHANNES ,  LAFORGE ANDREW DAVID ,  BRIZUELA FERNANDO ,  WIEGGERS ROB CARLO ,  GOMES UMESH PRASAD ,  NEDANOVSKA ELENA ,  KORKMAZ CELAL ,  KIM ALEXANDER DOWNN ,  DUARTE RODRIGUES NUNES RUI MIGUEL ,  VAN DIJCK HENDRIKUS ALPHONSUS LUDOVICUS ,  VAN DRENT WILLIAM PETER ,  JONKERS PETER GERARDUS ,  ZHU QIUSHI ,  YAGHOOBI PARHAM ,  WESTERLAKEN JAN STEVEN CHRISTIAAN ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  ERSHOV ALEXANDER IGOREVICH ,  FOMENKOV IGOR VLADIMIROVICH ,  LIU FEI ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KUZNETSOV ALEXEY SERGEEVICH

IPC: G03F7/20 ,  G02B5/08 ,  G02B27/00 ,  H05G2/00

Abstract: EUV 방사선을생성하기위한시스템(SO) 내의하나이상의반사광학요소의반사율열화는광학요소를포함하는진공챔버(26) 내로의가스의제어된도입에의하여감소된다. 가스는수소와같은또 다른가스의흐름에추가될수 있거나수소라디칼의도입과번갈아가며추가될수 있다.

公开(公告)号：JP2011209278A

公开(公告)日：2011-10-20

申请号：JP2011048521

申请日：2011-03-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DRENT WILLIAM PETER

IPC: G01B11/02 ,  G03F7/20 ,  H01L21/027

CPC classification number: G01B11/0608 ,  G03F9/7034 ,  G03F9/7096

Abstract: PROBLEM TO BE SOLVED: To shorten a time used for determining a height map of a substrate.SOLUTION: A level sensor 1 configured to measure a height level of a substrate disposed in a measurement position. The level sensor 1 includes: a projection unit 3 to project a plurality of measurement beams in the plurality of measurement positions on the substrate 2; a detection unit 4 to receive the measurement beam after reflection on the substrate 2; and a processing unit 5 to calculate the height level based on the reflection measurement beam that the detection unit 4 receives, wherein the substrate 2 is disposed in the measurement position and the projection unit 3, and the detection unit 4 are disposed neighboring to the substrate 2.

Abstract translation: 要解决的问题：缩短用于确定基板的高度图的时间。解决方案：配置成测量设置在测量位置的基板的高度水平的液位传感器1。 液位传感器1包括：投影单元3，用于在基板2上的多个测量位置投影多个测量光束; 检测单元4，用于在基板2上接收反射后的测量光束; 以及处理单元5，其基于检测单元4接收到的反射测量光束来计算高度水平，其中基板2设置在测量位置，并且投影单元3和检测单元4设置在与基板相邻的位置 2。

公开(公告)号：WO2013186136A3

公开(公告)日：2014-02-06

申请号：PCT/EP2013061781

申请日：2013-06-07

Applicant: ASML NETHERLANDS BV

Inventor： VAN DRENT WILLIAM PETER ,  VERVOORDELDONK MICHAEL JOHANNES

IPC: G03F7/20

CPC classification number: G03F7/70766

Abstract: A lithographic apparatus having two substrate tables (WTa, WTb) or two support structures for patterning devices that are positioned by planar motors acting against a magnet plate (13) has one or more balance masses (11, 12) also driven against the magnet plate so as to minimize movement of the magnet plate. Thereby, non-repeating positioning errors related to variations in the position of the magnet plate are reduced.

Abstract translation: 具有两个基板台（WTa，WTb）或两个用于构图装置的支撑结构的平版印刷装置，其中，所述图案形成装置通过作用在磁板（13）上的平面电动机定位，具有一个或多个平衡块（11,12） 以最小化磁体板的移动。 由此，与磁体板的位置的变化有关的非重复定位误差降低。