公开(公告)号：KR20200125942A

公开(公告)日：2020-11-05

申请号：KR20207025275

申请日：2019-02-28

Applicant: ASML NETHERLANDS BV

Inventor： MA YUE ,  KEMPEN ANTONIUS THEODORUS WILHELMUS ,  HUMMLER KLAUS MARTIN ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  ROMMERS JEROEN HUBERT ,  VAN DE WIEL HUBERTUS JOHANNES ,  LAFORGE ANDREW DAVID ,  BRIZUELA FERNANDO ,  WIEGGERS ROB CARLO ,  GOMES UMESH PRASAD ,  NEDANOVSKA ELENA ,  KORKMAZ CELAL ,  KIM ALEXANDER DOWNN ,  DUARTE RODRIGUES NUNES RUI MIGUEL ,  VAN DIJCK HENDRIKUS ALPHONSUS LUDOVICUS ,  VAN DRENT WILLIAM PETER ,  JONKERS PETER GERARDUS ,  ZHU QIUSHI ,  YAGHOOBI PARHAM ,  WESTERLAKEN JAN STEVEN CHRISTIAAN ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  ERSHOV ALEXANDER IGOREVICH ,  FOMENKOV IGOR VLADIMIROVICH ,  LIU FEI ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KUZNETSOV ALEXEY SERGEEVICH

IPC: G03F7/20 ,  G02B5/08 ,  G02B27/00 ,  H05G2/00

Abstract: EUV 방사선을생성하기위한시스템(SO) 내의하나이상의반사광학요소의반사율열화는광학요소를포함하는진공챔버(26) 내로의가스의제어된도입에의하여감소된다. 가스는수소와같은또 다른가스의흐름에추가될수 있거나수소라디칼의도입과번갈아가며추가될수 있다.

公开(公告)号：WO2008108643A3

公开(公告)日：2008-11-27

申请号：PCT/NL2008050123

申请日：2008-03-04

Applicant: ASML NETHERLANDS BV ,  VAN VLIET ROLAND EDWARD ,  VOORMA HARM-JAN ,  KEMPEN ANTONIUS THEODORUS WILHELMUS ,  HOVESTAD ARJAN

Inventor： VAN VLIET ROLAND EDWARD ,  VOORMA HARM-JAN ,  KEMPEN ANTONIUS THEODORUS WILHELMUS ,  HOVESTAD ARJAN

IPC: B08B3/04 ,  B08B3/08 ,  B08B3/10 ,  B08B3/12 ,  G03F7/20

CPC classification number: B08B3/08 ,  B08B3/04 ,  B08B3/044 ,  B08B3/10 ,  B08B3/102 ,  B08B3/12 ,  G03F7/70925

Abstract: The invention provides a cleaning process for the removal of deposition on an element (510) of a lithographic apparatus. The method includes (ex situ) treating the element (510) with an alkaline cleaning liquid (502). In this way, Sn may be removed from a contaminant barrier or' a collector mirror. Especially beneficial is the application of a voltage to the element to be cleaned and/or by using complexing agents for improving the dissolution of Sn in the cleaning liquid.

Abstract translation: 本发明提供了用于去除光刻设备的元件（510）上的沉积的清洁方法。 该方法包括（非原地）用碱性清洁液体（502）处理元件（510）。 以这种方式，可以从污染物屏障或“收集器反射镜”去除Sn。 特别有益的是向待清洁的元件施加电压和/或通过使用络合剂来改善Sn在清洗液中的溶解。

公开(公告)号：NL1036543A1

公开(公告)日：2009-08-24

申请号：NL1036543

申请日：2009-02-10

Applicant: ASML NETHERLANDS BV

Inventor： MOORS JOHANNES HUBERTUS JOSEPHINA ,  KOSTER NORBERTUS BENEDICTUS ,  LOOPSTRA ERIK ROELOF ,  SMEETS MARTIN FRANS PIERRE ,  KEMPEN ANTONIUS THEODORUS WILHELMUS

IPC: G03F7/20 ,  H01F7/02

公开(公告)号：NL1035726A1

公开(公告)日：2009-01-27

申请号：NL1035726

申请日：2008-07-18

Applicant: ASML NETHERLANDS BV

Inventor： HERPEN MAARTEN MARINUS JOHANNES WILHELMUS VAN ,  KEMPEN ANTONIUS THEODORUS WILHELMUS ,  SOER WOUTER ANTHON

IPC: G03F7/20 ,  H01L21/027