公开(公告)号：JP2005354050A

公开(公告)日：2005-12-22

申请号：JP2005153230

申请日：2005-05-26

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DE JAGER PIETER WILLEM HERMAN ,  GUI CHENG-QUN ,  BIJNEN FRANSISCUS GODEFRIDUS C ,  JOHAN CHRISTIAAN GERARD HOEFNA ,  JOANNES THEODOOR DE SMIT

IPC: G01B11/00 ,  G01B11/14 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70275 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide an optical position evaluating device and method, having a lighting system supplying alignment beams of radiation and leading out positional data from the reflection of the alignment beams. SOLUTION: A substrate is supported on a substrate table, and a projection system is used to project an alignment beam to the target part of the substrate. A positioning system causes relative motion of the substrate and the projection system. An array of lenses has a layout structure such that each lens of the array focuses the individual parts of the alignment beam to the individual parts of the target part. In an array of detectors, each detector of the array detects the light reflected from the substrate, through the individual lenses of the array and provides the output representing the intensity of the light reflected to it from the substrate through the individual lenses. A processor is connected with the output of the detector, in order to lead out the data representing the position of the lens array to the substrate from the output of the detector. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光学位置评估装置和方法，其具有提供对准的辐射束并从对准光束的反射引出位置数据的照明系统。 解决方案：将基板支撑在基板台上，并且使用投影系统将对准光束投影到基板的目标部分。 定位系统引起基板和投影系统的相对运动。 透镜阵列具有布置结构，使得阵列的每个透镜将对准光束的各个部分聚焦到目标部分的各个部分。 在一组检测器中，阵列的每个检测器通过阵列的各个透镜检测从基板反射的光，并且通过各个透镜提供表示从基板反射的光的强度的输出。 处理器与检测器的输出端连接，以便从检测器的输出引出表示透镜阵列到基板的位置的数据。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006024924A

公开(公告)日：2006-01-26

申请号：JP2005189495

申请日：2005-06-29

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LOF JOERI ,  JOANNES THEODOOR DE SMIT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70275

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus having projection beams of uniform intensity, and to provide a method for manufacturing a device. SOLUTION: An illumination system for supplying projection radiation beams, an array of plural elements capable of being controlled individually for patterning projection radiation beams, a projection system for projecting patterned beams on a target plane, and a substrate table for supporting the substrate, such that the target surface of the substrate coincides with the target plane are comprised; and the projection system comprises an array of plural lenses configured such that the individual lenses receive the individual parts of the patterned beams and gathers them. The apparatus comprises a sensor system for detecting the intensity distribution of the projection radiation pattern and an alignment system, capable of controlling such that the position and/or orientation of at least one of the array of plural elements, the components of the projection system, and the illumination system is adjusted on the basis of the detection result. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有均匀强度的投影光束的光刻设备，并提供一种用于制造器件的方法。 解决方案：一种用于提供投影辐射束的照明系统，能够单独控制的多个元件的阵列，用于图案化投影辐射束，用于在目标平面上投影图案化束的投影系统，以及用于支撑衬底的衬底台 使得基板的目标表面与靶平面重合; 并且投影系统包括多个透镜的阵列，其被配置为使得各个透镜接收图案化的光束的各个部分并收集它们。 该装置包括用于检测投影辐射图案的强度分布的传感器系统和对准系统，其能够控制使得多个元件的阵列，投影系统的组件中的至少一个的位置和/ 并根据检测结果对照明系统进行调整。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2009049423A

公开(公告)日：2009-03-05

申请号：JP2008253068

申请日：2008-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JAGER PIETER WILLEM HERMAN ,  GUI CHENG-QUN ,  BIJNEN FRANSISCUS GODEFRIDUS C ,  JOHAN CHRISTIAAN GERARD HOEFNA ,  JOANNES THEODOOR DE SMIT

IPC: G01B11/00 ,  H01L21/027 ,  G01B11/14 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70275 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus for optical position evaluation, having an illumination system for supplying a positioning beam of radiation to derive position data from reflection of the positioning beam, and also to provide its method. SOLUTION: A substrate is supported on a substrate table, and the positioning beam is projected to a target area of the substrate by means of a projection system. A positioning system causes relative motion between the substrate and the projection system. An array of lenses is arranged and structured so that respective lenses of the array focus individual parts of the positioning beam to individual parts of the target area. In an array of detectors, respective detectors in the array detect light reflected from the substrate through the individual lenses of the array, and provide outputs expressing the intensity of light reflected through the individual lens from the substrate. A processor is connected to an output of the detector to derive data exhibiting the position of the lens array for the substrate from the output of the detector. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于光学位置评估的装置，具有用于提供定位射束的照明系统，以从定位光束的反射导出位置数据，并提供其方法。 解决方案：基板被支撑在基板台上，并且定位光束通过投影系统投射到基板的目标区域。 定位系统引起基板和投影系统之间的相对运动。 透镜阵列被布置和构造成使得阵列的各个透镜将定位光束的各个部分聚焦到目标区域的各个部分。 在一组检测器中，阵列中的各个检测器通过阵列的各个透镜检测从基板反射的光，并且提供表示通过单独透镜从基板反射的光的强度的输出。 处理器连接到检测器的输出，以从检测器的输出导出表现出用于衬底的透镜阵列的位置的数据。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2006191099A

公开(公告)日：2006-07-20

申请号：JP2005378942

申请日：2005-12-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LOF JOERI ,  DE JAGER PIETER WILLEM HERMAN ,  JOANNES THEODOOR DE SMIT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70283

Abstract: PROBLEM TO BE SOLVED: To provide an improved gay scaling imaging method and a system. SOLUTION: The Improved gray scaling imaging method and the system include a group of elements within an array of individually controllable elements that make a part of a radiation beam project to a lens in an array 302 of microlenses and are individually controllable so that any number of the individually controllable elements may be switched on or off to generate a gray scale. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供改进的同性恋缩放成像方法和系统。 改进的灰度成像方法和系统包括使得辐射束的一部分投影到微透镜阵列302中的透镜的独立可控元件的阵列内的一组元件，并且是单独可控的，使得 可以打开或关闭任何数量的可单独控制的元件以产生灰度级。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：SG118281A1

公开(公告)日：2006-01-27

申请号：SG200404065

申请日：2004-06-08

Applicant: ASML NETHERLANDS BV

Inventor： JOANNES THEODOOR DE SMIT ,  VADIM YEVGENYEVICH BANINE ,  THEODORUS HUBERTUS JOSEPHUS BI ,  THEODORUS MARINUS MODDERMAN ,  MARCEL MATHIJS THEODORE MARIE

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element of the projection lens and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection can be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal can be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and phase shifting ultrasonic standing-wave node patterns.

公开(公告)号：SG116555A1

公开(公告)日：2005-11-28

申请号：SG200404063

申请日：2004-06-08

Applicant: ASML NETHERLANDS BV

Inventor： JOERI LOF ,  HANS BUTLER ,  SJOERD NICOLAAS LAMBERTUS DOND ,  ALEKSEY KOLESNYCHENKO ,  ERIK ROELOF LOOPSTRA ,  HENDRICUS JOHANNES MARIA MEIJE ,  JOHANNES CATHARINUS HUBERTUS M ,  ROELOF AEILKO SIEBRAND RITSEMA ,  FRANK VAN SCHAIK ,  TIMOTHEUS FRANCISCUS SENGERS ,  KLAUS SIMON ,  JOANNES THEODOOR DE SMIT ,  ALEXANDER STRAAIJER ,  BOB STREEFKERK ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  MARCUS ADRIANUS KERKHOF ,  MARK KROON ,  ARIE JEFFREY DEN BOEF ,  JOOST JEROEN OTTENS ,  JEROEN JOHANNES SOPHIA MARIA M

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.