公开(公告)号：SG116555A1

公开(公告)日：2005-11-28

申请号：SG200404063

申请日：2004-06-08

Applicant: ASML NETHERLANDS BV

Inventor： JOERI LOF ,  HANS BUTLER ,  SJOERD NICOLAAS LAMBERTUS DOND ,  ALEKSEY KOLESNYCHENKO ,  ERIK ROELOF LOOPSTRA ,  HENDRICUS JOHANNES MARIA MEIJE ,  JOHANNES CATHARINUS HUBERTUS M ,  ROELOF AEILKO SIEBRAND RITSEMA ,  FRANK VAN SCHAIK ,  TIMOTHEUS FRANCISCUS SENGERS ,  KLAUS SIMON ,  JOANNES THEODOOR DE SMIT ,  ALEXANDER STRAAIJER ,  BOB STREEFKERK ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  MARCUS ADRIANUS KERKHOF ,  MARK KROON ,  ARIE JEFFREY DEN BOEF ,  JOOST JEROEN OTTENS ,  JEROEN JOHANNES SOPHIA MARIA M

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.