公开(公告)号：WO2013107740A3

公开(公告)日：2014-08-21

申请号：PCT/EP2013050673

申请日：2013-01-15

Applicant: ASML NETHERLANDS BV

Inventor： VAN HEESCH CHRIS ,  MEESSEN HIERONYMUS

IPC: G06T7/00 ,  G06F17/50 ,  G06T7/60

CPC classification number: G06T7/0008 ,  G01B11/03 ,  G03F7/0002 ,  G03F7/70625 ,  G06F17/5045 ,  G06T7/0006 ,  G06T7/001 ,  G06T7/60 ,  G06T2207/10061 ,  G06T2207/20032 ,  G06T2207/20061 ,  G06T2207/30108 ,  G06T2207/30148

Abstract: A method and system to analyze various dimensional parameters of a structure, such as a self-assembled block copolymer structure whether formed by graphoepitaxy or chemical epitaxy. The method involves image processing including median filtering and feature detection to determine critical dimension information, and optionally the use of a Hough transform to find periodicity values and to determine placement errors.

Abstract translation: 分析结构的各种尺寸参数的方法和系统，诸如自组装的嵌段共聚物结构，无论是通过石墨刻蚀或化学外延形成的。 该方法涉及图像处理，包括中值滤波和特征检测以确定关键尺寸信息，以及可选地使用霍夫变换来查找周期值并确定放置误差。

公开(公告)号：WO2010037472A2

公开(公告)日：2010-04-08

申请号：PCT/EP2009006652

申请日：2009-09-15

Applicant: ASML NETHERLANDS BV ,  MEESSEN HIERONYMUS ,  MATTHEUS CHRISTINE ,  LEWIS CHRISTIAN

Inventor： MEESSEN HIERONYMUS ,  MATTHEUS CHRISTINE ,  LEWIS CHRISTIAN

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F7/705 ,  G03F7/70516 ,  G03F7/70625

Abstract: The present invention relates to a method for determining parameter value related to a lithographic process by which a marker structure has been applied on a product substrate based on obtaining calibration measurement data, with an optical detection apparatus, from a calibration marker structure set on a calibration substrate, including at least one calibration marker structure created using different known values of the parameter. The method further determines a mathematical model by using said known values of said at least one parameter and by employing a regression technique on said calibration measurement data, obtains product measurement data, with said optical detection apparatus, from a product marker structure on the product substrate, with at least one product marker structure being exposed with an unknown value of said at least one parameter. Furthermore, the method determines the unknown value of at least one parameter for the product substrate from the obtained product measurement data, wherein the optical detection apparatus may be a SEM and the obtained data includes an image obtained by the SEM.

Abstract translation: 本发明涉及一种用光学检测装置从校正标记结构中设定校准值来确定与光刻工艺相关的参数值的方法，通过该光刻工艺已经将标记结构应用于产品基板上，从而获得校准测量数据 衬底，包括使用参数的不同已知值创建的至少一个校准标记结构。 该方法通过使用所述至少一个参数的所述已知值并且通过对所述校准测量数据采用回归技术来进一步确定数学模型，使用所述光学检测装置从产品标记结构获得产品测量数据 ，至少一个产品标记结构用所述至少一个参数的未知值曝光。 此外，该方法从所获得的产品测量数据确定产品基板的至少一个参数的未知值，其中光学检测装置可以是SEM，并且所获得的数据包括通过SEM获得的图像。

公开(公告)号：NL2009555A

公开(公告)日：2013-04-08

申请号：NL2009555

申请日：2012-10-02

Applicant: ASML NETHERLANDS BV

Inventor： NGUYEN THANH ,  FINDERS JOZEF ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  HEIJDEN EDDY ,  MEESSEN HIERONYMUS ,  KOOLE ROELOF ,  PEETERS EMIEL ,  HEESCH CHRIS ,  BRIZARD AURELIE ,  BOOTS HENRI ,  DRUZHININA TAMARA ,  RUITER JESSICA

IPC: G03F7/20

公开(公告)号：NL2010131A

公开(公告)日：2013-07-23

申请号：NL2010131

申请日：2013-01-15

Applicant: ASML NETHERLANDS BV

Inventor： HEESCH CHRIS ,  MEESSEN HIERONYMUS

IPC: G03F7/20

公开(公告)号：NL2003492A

公开(公告)日：2010-03-31

申请号：NL2003492

申请日：2009-09-15

Applicant: ASML NETHERLANDS BV

Inventor： MEESSEN HIERONYMUS ,  MATTHEUS CHRISTINE ,  LEEWIS CHRISTIAN

IPC: G01N21/47 ,  G03F7/20