公开(公告)号：JP2010219510A

公开(公告)日：2010-09-30

申请号：JP2010029605

申请日：2010-02-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HUBERTUS MULKENS JOHANNES C ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  MOERMAN RICHARD ,  RIEPEN MICHEL ,  SERGEI SHULEPOV ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  CROMWIJK JAN WILLEM ,  MEIJERS RALPH JOSEPH ,  FABRIZIO EVANGELISTA ,  BESSEMS DAVID ,  LI HUA ,  JOCHEMSEN MARINUS ,  GUNTHER PIETER LEIN JOSEPH ,  BELL FRANCISCUS WILHELMUS ,  WITBERG ERIK ,  SMITS MARCUS AGNES JOHANNES ,  MA ZHENHUA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a method of controlling the same, and a device manufacturing method, wherein defects of imaging are reduced or eliminated. SOLUTION: The method includes the steps of: moving a substrate table supporting a substrate relative to a projection system; and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, and/or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate. The step of adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation onto a target portion of the substrate. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其控制方法以及减少或消除成像缺陷的器件制造方法。 解决方案：该方法包括以下步骤：相对于投影系统移动支撑衬底的衬底台; 以及在所述基板的边缘处或附近的预定区域内的目标成像期间调整所述基板台和所述投影系统之间的扫描速度，和/或调整所述基板的边缘处或其附近的预定区域中的相邻目标位置之间的步进速度 衬底的边缘。 调整扫描和/或步进速度的步骤可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2011187954A

公开(公告)日：2011-09-22

申请号：JP2011039323

申请日：2011-02-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LAFARRE RAYMOND WILHELMUS LOUIS ,  RIEPEN MICHEL ,  CORTIE ROGIER HENDRIKUS MAGDALENA ,  MEIJERS RALPH JOSEPH ,  EVANGELISTA FABRIZIO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/52

Abstract: PROBLEM TO BE SOLVED: To reduce or remove the risk of focusing defects, and to maintain or increase throughput. SOLUTION: A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the handling structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise gas knives arranged to overlap to block an incoming droplet. There may be extraction holes lined up with gaps between gas knives to extract liquid that passes through the gap. A droplet is allowed to escape through the gaps. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：减少或消除聚焦缺陷的风险，并维持或提高吞吐量。 解决方案：用于光刻设备的液体处理结构包括液滴控制器，其被配置为允许浸没液滴从处理结构中丢失并防止液滴与限制浸没液体的弯月面碰撞。 液滴控制器可以包括布置成重叠以阻挡进入的液滴的气刀。 在气刀之间可能存在排列有间隙的抽出孔，以提取通过间隙的液体。 允许液滴通过间隙逃逸。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011071511A

公开(公告)日：2011-04-07

申请号：JP2010207523

申请日：2010-09-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS R ,  HUBERTUS MULKENS JOHANNES C ,  CORTIE ROGIER HENDRIKUS MAGDALENA ,  MEIJERS RALPH JOSEPH ,  FABRIZIO EVANGELISTA

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling system that maintains a liquid in a space between a final element of a projection system and a substrate.
SOLUTION: The fluid handling structure for a lithographic apparatus includes, at a boundary between the space in which an immersion fluid is confined and an external region of the fluid handling structure: a first gas knife device having a plurality of openings arranged in a first column and an aperture in a second column; and a second gas knife device having one or a plurality of openings in a third array and an aperture in a fourth column.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在投影系统的最终元件和基板之间的空间中保持液体的流体处理系统。 解决方案：用于光刻设备的流体处理结构在其中限定浸没流体的空间与流体处理结构的外部区域之间的边界处包括：具有多个开口的第一气刀装置 第一列和第二列中的孔; 以及具有第三阵列中的一个或多个开口和第四列中的孔的第二气刀装置。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010199582A

公开(公告)日：2010-09-09

申请号：JP2010033029

申请日：2010-02-18

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： SEWELL HARRY ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  MARKOYA LOUIS JOHN ,  MCCAFFERTY DIANE ,  MEIJERS RALPH JOSEPH

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling device which is suitable to immersion fluid containing hydrocarbon with high refractive index of an immersion lithographic apparatus. SOLUTION: The fluid handling device comprises: at least one body 12 with a surface facing a space for fluid; a plurality of openings 140 for the flow of fluid therethrough defined in the surface; at least one barrier 170 moveable relative to the plurality of openings 140 for selectively allowing or preventing the flow of fluid through selected openings 140 of the plurality of openings 140. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种流体处理装置，其适用于浸没式光刻设备具有高折射率的烃的浸渍流体。 解决方案：流体处理装置包括：具有面向流体空间的表面的至少一个主体12; 多个开口140，用于在表面中限定的流体流; 至少一个屏障170可相对于多个开口140移动，用于选择性地允许或防止流体流过多个开口140的选定开口140.版权所有：（C）2010，JPO＆INPIT

公开(公告)号：JP2009200494A

公开(公告)日：2009-09-03

申请号：JP2009037253

申请日：2009-02-20

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： SEWELL HARRY ,  BIJLAART ERIK THEODORUS MARIA ,  LAMBERTUS DONDERS SJOERD NICOL ,  MARKOYA LOUIS JOHN ,  MCCAFFERTY DIANE ,  MEIJERS RALPH JOSEPH

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/52 ,  G01F1/662 ,  G01F1/667 ,  G01N1/2226 ,  G03F7/70341 ,  G03F7/70858

Abstract: PROBLEM TO BE SOLVED: To provide an environment control means for a buffer immersion device. SOLUTION: A system in which immersion fluid containing liquid is provided from the outside to isolate an environmental chamber of an immersion lithography device is disclosed. Furthermore, a system which uses a transducer which transmits and/or receives an acoustic signal to measure a flow rate and/or vapor concentration of gas is disclosed. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于缓冲浸没装置的环境控制装置。 解决方案：公开了一种从外部提供含浸液体的系统，以隔离浸没式光刻设备的环境室。 此外，公开了一种使用发送和/或接收声信号以测量气体的流量和/或蒸汽浓度的换能器的系统。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：SG164338A1

公开(公告)日：2010-09-29

申请号：SG2010009934

申请日：2010-02-12

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  KEMPER NICOLAAS RUDOLF ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  MOERMAN RICHARD ,  RIEPEN MICHEL ,  SHULEPOV SERGEI ,  BRANDS GERT-JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  CROMWIJK JAN WILLEM ,  MEIJERS RALPH JOSEPH ,  EVANGELISTA FABRIZIO ,  BESSEMS DAVID ,  LI HUA ,  JOCHEMSEN MARINUS ,  GUNTER PIETER LEIN JOSEPH ,  BELL FRANCISCUS WILHELMUS ,  WITBERG ERIK ,  SMITS MARCUS AGNES JOHANNES ,  MA ZHENHUA

Abstract: A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

公开(公告)号：NL1036596A1

公开(公告)日：2009-08-24

申请号：NL1036596

申请日：2009-02-18

Applicant: ASML HOLDING NV ,  ASML NETHERLANDS BV

Inventor： SEWELL HARRY ,  BIJLAART ERIK THEODORUS MARIA ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  MARKOYA LOUIS JOHN ,  MCCAFFERTY DIANE ,  MEIJERS RALPH JOSEPH

IPC: G03F7/20