公开(公告)号：JP2012104854A

公开(公告)日：2012-05-31

申请号：JP2012006168

申请日：2012-01-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LAMBERTUS DONDERS SJOERD NICOLAAS ,  KATE NICOLAAS TEN ,  STEVENS LUCAS HENRICUS JOHANNES ,  VAN DER HAM RONALD ,  RIEPEN MICHAEL

IPC: H01L21/027

CPC classification number: G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To reduce the formation of an undesired droplet of an immersion liquid on one or a plurality of surfaces of an immersion lithographic apparatus or to remove the droplet.SOLUTION: Electrowetting is employed to control the behavior of the immersion liquid in the immersion lithographic apparatus. There is provided an active immersion liquid control system including: a first electrode capable of electrically connecting a surface at least periodically contacting to the immersion liquid to the immersion liquid to be controlled; a second electrode related to the surface, electrically insulated from the immersion liquid to be controlled; and a voltage control device for supplying a controlled voltage difference between the first electrode and the second electrode.

Abstract translation: 要解决的问题：减少在浸没式光刻设备的一个或多个表面上形成浸没液体的不需要的液滴或去除液滴。

解决方案：电润湿用于控制浸没式光刻设备中的浸液的性能。 提供了一种主动浸没液体控制系统，包括：第一电极，其能够将至少周期性地接触浸入液体的表面电连接到待控制的浸渍液体; 与表面相关的第二电极与要控制的浸没液体电绝缘; 以及用于在第一电极和第二电极之间提供受控电压差的电压控制装置。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：WO2008044925A3

公开(公告)日：2009-03-05

申请号：PCT/NL2007050469

申请日：2007-09-25

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT AG ,  VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS ,  BANINE VADIM YEVGENYEVICH ,  DE KUSTER JOHANNES PETERUS HENRICUS ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  STEVENS LUCAS HENRICUS JOHANNS ,  WOLSCHRIJN BASTIAAN THEODOOR ,  SIDELNIKOV YURII VICTOROVITCH ,  VAN DER VELDEN MARC HUBERTUS LORENZ ,  SOER WOUTER ANTHON ,  GIELISSEN KURT ,  STEIN THOMAS

Inventor： VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS ,  BANINE VADIM YEVGENYEVICH ,  DE KUSTER JOHANNES PETERUS HENRICUS ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  STEVENS LUCAS HENRICUS JOHANNES ,  WOLSCHRIJN BASTIAAN THEODOOR ,  SIDELNIKOV YURII VICTOROVITCH ,  VAN DER VELDEN MARC HUBERTUS LORENZ ,  SOER WOUTER ANTHON ,  GIELISSEN KURT ,  STEIN THOMAS

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector (10A) and a second radiation dose detector (10B), each detector comprising a secondary electron emission surface (11) configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter (13), connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Abstract translation: 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器（10A）和第二辐射剂量检测器（10B），每个检测器包括二次电子发射表面（11），其被配置为接收辐射通量并由于接收到辐射而发射二次电子 通量，相对于辐射传播方向观察到的相对于第二辐射剂量检测器位于上游的第一辐射剂量检测器和连接到每个检测器的仪表（13），以检测由二次电子产生的电流或电压 从各个电子发射表面发射。

公开(公告)号：SG153664A1

公开(公告)日：2009-07-29

申请号：SG2007016173

申请日：2003-09-17

Applicant: ASML NETHERLANDS BV

Inventor： STEVENS LUCAS HENRICUS JOHANNES ,  SIDELKOV YURII VICTOROVITCH ,  KOLOSHNIKOV VSEVOLOD GRIGOREVITECH ,  KRIVTSUN VLADIMIR MIHAILOVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALAEEVITCH ,  KIEFT ERIK RENE ,  ROELEF LOOPSTRA ERIK ,  GAYAZOV ROBERT RAFILEVITCH ,  FRIJNS OLAV WALDEMAR VLADIMIR

IPC: G21K5/00 ,  F28D15/02 ,  G03F7/20 ,  G21K5/02 ,  G21K5/08 ,  H01L21/027 ,  H05G2/00 ,  H05H1/24 ,  G03B27/42 ,  G21K5/10 ,  H01J37/08

Abstract: Radiation Source, Lithographic Apparatus, and Device Manufacturing Method. A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. To improve heat dissipation, the radiation source comprises a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected.To improve the exact timing of the pinch formation and thus the pulse of EUV radiation, the radiation source comprises a triggering device.To improve the conversion efficiency, the radiation source is constructed to have a low inductance, and operated in a self- triggering regime.

公开(公告)号：NL1036579A1

公开(公告)日：2009-08-20

申请号：NL1036579

申请日：2009-02-17

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  BENSCHOP JOZEF PETRUS HENRICUS ,  KATE NICOLAAS TEN ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  STEVENS LUCAS HENRICUS JOHANNES

IPC: G03F7/20

公开(公告)号：NL1036211A1

公开(公告)日：2009-06-04

申请号：NL1036211

申请日：2008-11-18

Applicant: ASML NETHERLANDS BV

Inventor： DONDERS SJOERD NICOLAAS LAMBERTUS ,  KATE NICOLAAS TEN ,  STEVENS LUCAS HENRICUS JOHANNES ,  HAM RONALD VAN DER ,  RIEPEN MICHEL

IPC: G03F7/20 ,  H01L21/027