公开(公告)号：JP2013055337A

公开(公告)日：2013-03-21

申请号：JP2012180193

申请日：2012-08-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： THOMAS IVO ADAM JOHANNES ,  VERSPAGET COEN CORNELIS WILHELMUS ,  VAN DER HAM RONALD ,  THIBAULT SIMON MATHIEU LAURENT ,  GREGORY MARTIN MASON CORCORAN ,  BLOKS RUUD HENDRIKUS MARTINUS JOHANNES ,  GERBEN PETERS ,  GUNTHER PIETER LEIN JOSEPH

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling structure, lithographic apparatus and device manufacturing method which compensate for cooling of a substrate due to the presence of an immersion liquid.SOLUTION: The fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure. The structure has at least one heater to heat a portion of the facing surface adjacent to the heater. The at least one heater has a fluid heater to heat fluid flow from the structure onto the facing surface, thereby heating the portion.

Abstract translation: 要解决的问题：提供一种流体处理结构，光刻设备和装置制造方法，其补偿由于存在浸液而导致的基板的冷却。 解决方案：流体处理结构被配置为在面对表面相对于结构的移动期间将浸没流体限制在投影系统的最终元件和面对表面之间的空间中。 该结构具有至少一个加热器以加热邻近加热器的面对表面的一部分。 所述至少一个加热器具有流体加热器以加热流体从结构流到面对表面上，从而加热该部分。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2013042127A

公开(公告)日：2013-02-28

申请号：JP2012167085

申请日：2012-07-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KUNEN JOHANN GERTRUDIX CORNELIS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  VERSPAGET COEN CORNELIS WILHELMUS ,  VAN DER HAM RONALD ,  THOMAS IVO ADAM JOHANNES ,  HOUBEN MARTIJN ,  LAURENT THIBAUD SIMON MATTHEW ,  GREGORY MARTIN MASON CORCORAN ,  BLOKS RUUD HENDRIKUS MARTINUS JOHANNES ,  GERBEN PETERS ,  GUNTHER PIETER LEIN JOSEPH ,  REMIE MARINUS JAN ,  SANDER CATHARINA REINIER DERKS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70875 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To reduce influence of a localized heat load when using immersion fluid in a lithographic apparatus.SOLUTION: A support table configured to support a substrate comprises a support section to support a substrate, and a regulation system to supply heat energy to and/or remove heat energy from the support section. The regulation system comprises a plurality of regulation units that are independently controllable.

Abstract translation: 要解决的问题：为了减少在光刻设备中使用浸液时的局部热负荷的影响。 解决方案：构造成支撑衬底的支撑台包括用于支撑衬底的支撑部分和用于向支撑部分提供热能和/或从其移除热能的调节系统。 调节系统包括可独立控制的多个调节单元。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2010135787A

公开(公告)日：2010-06-17

申请号：JP2009268224

申请日：2009-11-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KNAAPEN THIJS EGIDIUS JOHANNES ,  BRULS RICHARD JOSEPH ,  VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KAMPHUIS MARTIJN HENDRIK ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MAAS RUDOLF ADRIANUS JOANNES ,  STAVENGA MARCO KOERT ,  VERSPAGET COEN CORNELIS WILHELMUS ,  PELLENS RUDY JAN MARIA ,  VAN DER HOEVEN JAN CORNELIS ,  ANSTOTZ DAVID LUCIEN ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  MARCUS JOHANNES VAN DER ZANDEN ,  BADAM VIJAY KUMAR ,  DE GROOT CASPER RODERIK

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus reducing latent adverse effect of liquid drops remained on a substrate table after light-exposure of a substrate. SOLUTION: The lithographic apparatus having a table including a target and/or a sensor and a liquid displacement device displacing a liquid from the target and/or the sensor using a localized gas flow is disclosed. The liquid displacement device can be disposed at various positions. For example, the liquid displacement device can be mounted on a liquid handling device at a light-exposure station and can be disposed adjacent to a transfer passage between the light-exposure station and a measuring station or adjacent to a load/unload station or the sensor in the transfer passage. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其减少了在曝光基板之后残留在基板台上的液滴的潜在不利影响。 公开了具有包括靶和/或传感器的台的液晶显示装置以及使用局部气流从液体和/或传感器移出液体的液体排量装置。 液体置换装置可以设置在各种位置。 例如，液体移动装置可以安装在曝光站处的液体处理装置上，并且可以设置在靠近曝光站和测量站之间或与装载/卸载站相邻的传送通道或者 传感器在传输通道中。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：SG188036A1

公开(公告)日：2013-03-28

申请号：SG2012052569

申请日：2012-07-17

Applicant: ASML NETHERLANDS BV

Inventor： KUNNEN JOHAN GERTRUDIS CORNELIS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  VERSPAGET COEN CORNELIS WILHELMUS ,  VAN DER HAM RONALD ,  THOMAS IVO ADAM JOHANNES ,  HOUBEN MARTIJN ,  LAURENT THIBAULT SIMON MATHIEU ,  CORCORAN GREGORY MARTIN MASON ,  BLOKS RUUD HENDRIKUS MARTINUS JOHANNES ,  PIETERSE GERBEN ,  GUNTER PIETER LEIN JOSEPH ,  REMIE MARINUS JAN ,  DERKS SANDER CATHARINA REINIER

Abstract: LITHOGRAPHIC APPARATUS, SUPPORT TABLE FOR A LITHOGRAPHICA support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.(Figure 8)