公开(公告)号：KR20100113043A

公开(公告)日：2010-10-20

申请号：KR20100032831

申请日：2010-04-09

Applicant: ASML NETHERLANDS BV

Inventor： EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  STEFFENS KOEN ,  KANEKO TAKESHI ,  CORCORAN GREGORY MARTIN MASON

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70916 ,  H01L21/0274

Abstract: PURPOSE: An immersion lithography device and a manufacturing method thereof are provided to effectively and efficiently remove undesirable droplets from the surface of a substrate or a substrate table. CONSTITUTION: An immersion lithography device comprises the following: a projection system having an optical axis; a substrate table formed to maintain a substrate, defining the facing surface of the substrate and the substrate table itself; and a fluid handling structure for supplying an immersion liquid to an immersion space located on the surface facing the projection system. The fluid handling structure includes a fluid removal device(400), and a droplet removal device to remove droplets(200) form the immersion liquid.

Abstract translation: 目的：提供一种浸没式光刻设备及其制造方法，以有效且有效地从基板或基板台的表面除去不需要的液滴。 构成：浸没光刻设备包括以下：具有光轴的投影系统; 形成为保持衬底的衬底台，限定衬底的面对表面和衬底台本身; 以及用于将浸没液体供应到位于面向投影系统的表面上的浸没空间的流体处理结构。 流体处理结构包括流体去除装置（400）和用于去除液滴（200）形成浸液的液滴去除装置。

公开(公告)号：JP2010267961A

公开(公告)日：2010-11-25

申请号：JP2010106827

申请日：2010-05-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： METSENAERE CHRISTOPHE DE ,  KUNST RONALD C ,  BERKVENS PAUL PETRUS JOANNES ,  SCHNEIDERS MAURITIUS GERARDUS ELISABETH ,  VAN DE WINKEL JIMMY MATHEUS WILHELMUS ,  CORCORAN GREGORY MARTIN MASON

IPC: H01L21/027

CPC classification number: G03B27/52 ,  G03F7/70341 ,  G03F7/70725 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide an improved apparatus for predicting force exerted to a substrate by immersion liquid and controlling canceling force such as disturbance force exerted by a positioner. SOLUTION: The immersion lithographic apparatus has a pressure sensor configured to measure the pressure of the immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls the positioner to exert force on a substrate table to compensate for the force exerted on the substrate table by the immersion liquid. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于通过浸没液体预测施加到基板的力并且控制诸如由定位器施加的干扰力的抵抗力的改进的装置。 解决方案：浸没式光刻设备具有压力传感器，该压力传感器被配置为测量浸没液体在基板和投影系统之间的空间中的压力。 控制系统响应于由压力传感器产生的压力信号，并且控制定位器在衬底台上施加力以补偿由浸没液体施加在衬底台上的力。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010251744A

公开(公告)日：2010-11-04

申请号：JP2010085599

申请日：2010-04-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  STEFFENS KOEN ,  KANEKO TAKESHI ,  CORCORAN GREGORY MARTIN MASON

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a device capable of removing undesired droplets from a surface of a substrate and/or a substrate table more effectively and efficiently. SOLUTION: A fluid handling system for an immersion lithography apparatus has a fluid removal device to remove immersion liquid from an immersion space, and a droplet removal device to remove a droplet of immersion liquid, wherein: the droplet removal device is located further from an optical axis than the fluid removal device, and the droplet removal device includes a porous member which faces, e.g., the substrate being exposed and/or the substrate table. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供能够更有效和高效地从基板和/或基板台的表面去除不需要的液滴的装置。 解决方案：用于浸没式光刻设备的流体处理系统具有用于从浸没空间中去除浸没液体的流体去除装置和用于去除浸液的液滴的液滴去除装置，其中：液滴去除装置位于更远处 从液体去除装置的光轴，并且液滴去除装置包括面向例如正在暴露的基板和/或基板台的多孔构件。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：SG188036A1

公开(公告)日：2013-03-28

申请号：SG2012052569

申请日：2012-07-17

Applicant: ASML NETHERLANDS BV

Inventor： KUNNEN JOHAN GERTRUDIS CORNELIS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  VERSPAGET COEN CORNELIS WILHELMUS ,  VAN DER HAM RONALD ,  THOMAS IVO ADAM JOHANNES ,  HOUBEN MARTIJN ,  LAURENT THIBAULT SIMON MATHIEU ,  CORCORAN GREGORY MARTIN MASON ,  BLOKS RUUD HENDRIKUS MARTINUS JOHANNES ,  PIETERSE GERBEN ,  GUNTER PIETER LEIN JOSEPH ,  REMIE MARINUS JAN ,  DERKS SANDER CATHARINA REINIER

Abstract: LITHOGRAPHIC APPARATUS, SUPPORT TABLE FOR A LITHOGRAPHICA support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.(Figure 8)