公开(公告)号：NL2004216A

公开(公告)日：2010-09-28

申请号：NL2004216

申请日：2010-02-10

Applicant: ASML NETHERLANDS BV

Inventor： BIJNEN FRANCISCUS ,  HAREN RICHARD ,  WEI XIUHONG

IPC: G03F9/00

Abstract: An alignment measurement arrangement includes a source, an optical system and a detector. The source generates a radiation beam with a plurality of wavelength ranges. The optical system receives the radiation beam, produces an alignment beam, directs the alignment beam to a mark located on an object, receives alignment radiation back from the mark, and transmits the received radiation. The detector receives the alignment radiation and detects an image of the alignment mark and outputs a plurality of alignment signals, r, each associated with one of the wavelength ranges. A processor, in communication with the detector, receives the alignment signals, determines signal qualities of the alignment signals; determines aligned positions of the alignment signals, and calculates a position of the alignment mark based on the signal qualities, aligned positions, and a model relating the aligned position to the range of wavelengths and mark characteristics, including mark depth and mark asymmetry.

公开(公告)号：NL2009719A

公开(公告)日：2013-06-05

申请号：NL2009719

申请日：2012-10-29

Applicant: ASML NETHERLANDS BV

Inventor： WEI XIUHONG ,  BIJNEN FRANCISCUS ,  HAREN RICHARD ,  KERKHOF MARCUS ,  MOS EVERHARDUS ,  SIMONS HUBERTUS ,  EDART REMI ,  DECKERS DAVID ,  SCHOUMANS NICOLE ,  LYULINA IRINA

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2009345A

公开(公告)日：2013-04-02

申请号：NL2009345

申请日：2012-08-23

Applicant: ASML NETHERLANDS BV

Inventor： SANDEN STEFAN ,  HAREN RICHARD ,  SIMONS HUBERTUS ,  EDART REMI ,  WEI XIUHONG ,  KUBIS MICHAEL ,  LYULINA IRINA

IPC: G03F7/20