PROMOTING METHOD FOR SOLDER JOINTING

    公开(公告)号:JP2001009585A

    公开(公告)日:2001-01-16

    申请号:JP2000124302

    申请日:2000-04-25

    Applicant: IBM

    Abstract: PROBLEM TO BE SOLVED: To joint solders without flux in a low temperature by exposing a bulk solder to excited ions of spattering gas while halogen exists for a given time, making composition ratio of first and second metals smaller than bulk ratio before the treatment, and forming a surface layer which has a desired depth and a surface film having halogen on the surface part. SOLUTION: It is preferable that halogen is fluorine, a first metal is lead, a second metal is tin, and lead whose bulk ratio is at least 90% is included. An alloy solder 32 is exposed to the ions to which spattering gas is excited, so as to form a surface layer 44 and a surface film 42'. A solder cluster 40 has the original composition ratio, but the surface layer 44 has the composition ratio of tin and lead smaller than the bulk ratio and does not include metallic oxides, so as to cause tin enrichment. The surface film 42' is fluorided or halogenized, and is unstable because of its hydrolysis property, and so it is fused on the metal surface without flux.

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