Abstract:
PROBLEM TO BE SOLVED: To provide a multilayer interconnection structure using a LCP dielectric layer and a method for forming the structure. SOLUTION: Each of a first and second LCP (liquid crystal polymer) dielectric layers is bonded directly to each of a first and second opposed layers of a heat conduction layer without an extrinsic adhesive material that bonds the heat conduction layer to either of a first and second LCP dielectric layers. Alternatively, each of a first and second 2S1P substructures is bonded directly to each of a first and second opposed layers of a LCP dielectric bonding layer without an extrinsic adhesive material that bonds the LCP dielectric bonding layer to either of the first and second 2S1P substructures. COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide an effective circuit board at low cost, and to provide a method for manufacturing it, in order to produce the circuit boards having high electrical performance and thin lines with narrow interval, on a large scale. SOLUTION: This circuit board contains an almost flat top surface and a conductive layer arranged on the surface. The conductive layer contains at least one side wall in itself, and the opening of the conductive layer is formed there. The conductive layer contains an end part kept which is away from the opening. The end part makes an acute angle with the almost flat top surface of the board. At least one sidewall makes an almost right angle with the almost flat top surface of the board. COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To joint solders without flux in a low temperature by exposing a bulk solder to excited ions of spattering gas while halogen exists for a given time, making composition ratio of first and second metals smaller than bulk ratio before the treatment, and forming a surface layer which has a desired depth and a surface film having halogen on the surface part. SOLUTION: It is preferable that halogen is fluorine, a first metal is lead, a second metal is tin, and lead whose bulk ratio is at least 90% is included. An alloy solder 32 is exposed to the ions to which spattering gas is excited, so as to form a surface layer 44 and a surface film 42'. A solder cluster 40 has the original composition ratio, but the surface layer 44 has the composition ratio of tin and lead smaller than the bulk ratio and does not include metallic oxides, so as to cause tin enrichment. The surface film 42' is fluorided or halogenized, and is unstable because of its hydrolysis property, and so it is fused on the metal surface without flux.
Abstract:
EN984-029 PROCESS FOR REMOVING CONTAMINANT Contaminant is removed from holes by etching in a gaseous plasma by first removing contaminant from the vicinity of the edges of the hole. Next, a mask is provided in the vicinity of the edges to prevent etching by contacting with a gaseous plasma which is different from the gaseous plasma employed in the first etching step. The holes are then etched in a gaseous plasma to remove contaminant from the interior of the holes in the vicinity of the center of the holes, whereby the mask protects the edges from being etched.