Plasma generation apparatus and generation method of the same
    1.
    发明授权
    Plasma generation apparatus and generation method of the same 无效
    等离子体生成装置及其生成方法

    公开(公告)号:KR101148082B1

    公开(公告)日:2012-05-24

    申请号:KR20100113220

    申请日:2010-11-15

    CPC classification number: H01J37/32825 A61L2/14 H05H1/24 H05H3/04 H05H7/14

    Abstract: PURPOSE: An apparatus for generating plasma and a method thereof are provided to supply a small vacuum chamber using atmospheric pressure plasma by using metal tunneling of an electronic beam. CONSTITUTION: An apparatus for generating plasma includes a vacuum container(110) and an electron emission unit(120) generating electronics inside the vacuum container. The apparatus for generating plasma includes an acceleration part(130) accelerating an emitted electronics in the electron emission unit inside the vacuum container and a metal foil(140) tunneling accelerated electronics. The electronics tunneling the metal foil forms plasma outside the vacuum container. The vacuum container is able to be formed into metal or a dielectric.

    Abstract translation: 目的:提供一种用于产生等离子体的装置及其方法,以通过使用电子束的金属隧道来提供使用大气压等离子体的小型真空室。 构成:用于产生等离子体的装置包括在真空容器内产生电子装置的真空容器(110)和电子发射单元(120)。 用于产生等离子体的装置包括加速部分(130),其加速真空容器内部的电子发射单元中的发射电子元件,以及金属箔(140),其加速电路。 穿过金属箔的电子器件在真空容器外部形成等离子体。 真空容器能够形成金属或电介质。

    Single Crystal Manufacturing Method, Single Crystal Manufacturing Apparatus, and Single Crystal
    2.
    发明公开
    Single Crystal Manufacturing Method, Single Crystal Manufacturing Apparatus, and Single Crystal 有权
    单晶制造方法,单晶制造装置和单晶

    公开(公告)号:KR20120057303A

    公开(公告)日:2012-06-05

    申请号:KR20100118977

    申请日:2010-11-26

    Abstract: PURPOSE: A single crystal manufacturing method, a single crystal manufacturing apparatus, and a single crystal are provided to be single crystallized while an original component is maintained by preventing a content of a sample from being escaped by partially or completely covering an amorphous or polycrystalline sample by using a graphene. CONSTITUTION: A graphene layer partially or completely covering an amorphous or polycrystalline sample is formed(S100). The amorphous or polycrystalline sample is floated in the air in a treatment container(S110). Provided is a nitrogen-containing gas decomposed by using plasma for the treatment container(S120). Energy is applied to the sample(S130). The sample is crystallized by getting heat(S140).

    Abstract translation: 目的:提供单晶制造方法,单晶制造装置和单晶以单一结晶,同时通过防止样品的含量通过部分或完全覆盖无定形或多晶样品而逸出,从而保持原始组分 通过使用石墨烯。 构成:形成部分或完全覆盖无定形或多晶样品的石墨烯层(S100)。 无定形或多晶样品浮在处理容器中的空气中(S110)。 提供通过使用等离子体分解用于处理容器的含氮气体(S120)。 对样品施加能量(S130)。 样品通过加热结晶(S140)。

    Opto-electric device, forming method of opto-electric device
    3.
    发明公开
    Opto-electric device, forming method of opto-electric device 有权
    光电装置,光电装置的形成方法

    公开(公告)号:KR20120057169A

    公开(公告)日:2012-06-05

    申请号:KR20100118791

    申请日:2010-11-26

    Abstract: PURPOSE: A photoelectric device and a forming method thereof are provided to fundamentally eliminate deformity due to lattice mismatch by forming a thick GaN(Gallium nitride) layer on different kinds of substrates. CONSTITUTION: A first semiconductor layer(13) is formed on a substrate(12). A second semiconductor layer(15) is formed on a semiconductor layer. An active layer(14) is interposed between the first semiconductor layer and the second semiconductor layer. An active layer has a multiple quantum well structure. A first contact hole(18) exposes the first semiconductor layer. A first electrode(16) is arranged in a first contact hole.

    Abstract translation: 目的:提供一种光电器件及其形成方法,从而通过在不同种类的衬底上形成厚的GaN(氮化镓)层从根本上消除由于晶格失配引起的畸形。 构成:在衬底(12)上形成第一半导体层(13)。 在半导体层上形成第二半导体层(15)。 在第一半导体层和第二半导体层之间插入有源层(14)。 有源层具有多量子阱结构。 第一接触孔(18)露出第一半导体层。 第一电极(16)布置在第一接触孔中。

    A CALIBRATION/TEST APPARATUS AND METHOD FOR MASS FLOW CONTROLLER WITHOUT MOVEMENT FROM VACUUM SYSTEM
    4.
    发明公开
    A CALIBRATION/TEST APPARATUS AND METHOD FOR MASS FLOW CONTROLLER WITHOUT MOVEMENT FROM VACUUM SYSTEM 无效
    大容量流量控制器的校准/测试装置和方法,无需从真空系统运动

    公开(公告)号:KR20090025828A

    公开(公告)日:2009-03-11

    申请号:KR20070090963

    申请日:2007-09-07

    CPC classification number: G01F25/0007 G01F1/76 G01F3/221

    Abstract: A calibration/test device and method of a mass flowmeter equipped on a vacuum system are provided to improve efficiency of quality control by calibrating/testing the mass flowmeter with comparing it with a reference mass flowmeter attached to a mobile correction device. A calibration/test device of a mass flowmeter equipped on a vacuum system comprises a vacuum valve(14) and a mass flowmeter valve(16) to be corrected, which are serially installed in a pipeline, a connection port(18) connecting the vacuum valve and the mass flowmeter valve, and a mobile mass flowmeter correction device(100) connected to the connection port. The mobile mass flowmeter correction device includes a vacuum chamber(110) connected to the connection port, a chamber valve(114) connecting the vacuum chamber and the connection port, a reference mass flowmeter(116) connecting the chamber valve and the connection port, a reference mass flowmeter valve(118) regulating the gas flux, an air escape(120) exhausting the gas, a gate valve(122) connected between the vacuum chamber and the air escape, and a measuring unit measuring the physical properties of the gas flowing within the vacuum chamber.

    Abstract translation: 提供了配备在真空系统上的质量流量计的校准/测试装置和方法,以通过与连接到移动校正装置的参考质量流量计进行比较来校准/测试质量流量计来提高质量控制的效率。 配备在真空系统上的质量流量计的校准/测试装置包括串联安装在管道中的真空阀(14)和待校正的质量流量计阀(16),连接真空的连接口(18) 阀和质量流量计阀,以及连接到连接端口的移动质量流量计校正装置(100)。 移动质量流量计校正装置包括连接到连接端口的真空室(110),连接真空室和连接口的室阀(114),连接室阀和连接口的参考质量流量计(116) 调节气体通量的参考质量流量计阀(118),排出气体的排气口(120),连接在真空室和排气口之间的闸阀(122)以及测量气体物理性质的测量单元 在真空室内流动。

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