公开(公告)号：WO2008042578B1

公开(公告)日：2008-08-07

申请号：PCT/US2007078574

申请日：2007-09-14

Applicant: LAM RES CORP ,  HUANG CHUNG-HO ,  SETO JACKIE ,  BRIGHT NICOLAS

Inventor： HUANG CHUNG-HO ,  SETO JACKIE ,  BRIGHT NICOLAS

IPC: H01L21/00

CPC classification number: H01J37/3299 ,  H01J37/32935

Abstract: In a plasma processing system., a method for dynamically establishing a baseline is provided. The method includes processing a first substrate The method also includes collecting a first signal data for the first substrate. The method further includes comparing the first signal data against the baseline The method moreover includes including the first signal data in a recalculation of the baseline if the fust signal data is within a confidence level range, which is in between a top level above the baseline and a bottom level below the baseline.

Abstract translation: 在等离子体处理系统中，提供了用于动态建立基线的方法。 该方法包括处理第一衬底。该方法还包括收集第一衬底的第一信号数据。 该方法还包括将第一信号数据与基线进行比较。此外，该方法还包括在第一信号数据重新计算基线时，如果峰值信号数据在置信水平范围内，置信水平范围在基线之上， 底线低于基线。

公开(公告)号：EP2070105A4

公开(公告)日：2011-06-29

申请号：EP07842559

申请日：2007-09-14

Applicant: LAM RES CORP

Inventor： HUANG CHUNG-HO ,  SETO JACKIE ,  BRIGHT NICOLAS

IPC: H01L21/00

CPC classification number: H01J37/3299 ,  H01J37/32935

公开(公告)号：EP1831807A4

公开(公告)日：2009-12-02

申请号：EP05789224

申请日：2005-08-19

Applicant: LAM RES CORP

Inventor： BENJAMIN NEIL ,  GOTTSCHO RICHARD A ,  BRIGHT NICOLAS ,  STEGER ROBERT

IPC: G06F19/00 ,  G05B19/418

CPC classification number: G01R31/3187 ,  G05B19/4184 ,  G05B2219/31362 ,  G05B2219/31463 ,  Y02P90/14 ,  Y02P90/86

公开(公告)号：WO2008017050A3

公开(公告)日：2008-10-30

申请号：PCT/US2007075113

申请日：2007-08-02

Applicant: LAM RES CORP ,  BENJAMIN NEIL ,  GOTTSCHO RICHARD ALAN ,  BRIGHT NICOLAS ,  STEGER ROBERT

Inventor： BENJAMIN NEIL ,  GOTTSCHO RICHARD ALAN ,  BRIGHT NICOLAS ,  STEGER ROBERT

IPC: G06F19/00

CPC classification number: G06Q10/06 ,  G05B2219/31291 ,  G05B2219/31421 ,  G05B2219/45031 ,  Y02P90/10

Abstract: A method of component management in a substrate processing system is disclosed. The substrate processing system has a set of components, at least a plurality of components of the set of components being designated to be smart components, each component of the plurality of components having an intelligent component enhancement (ICE). The method includes querying the plurality of components to request their respective unique identification data from their respective ICEs. The method further includes receiving unique identification data from the plurality of components if any of the plurality of components responds to the querying. The method additionally includes flagging the first component for corrective action if a first component of the plurality of components fails to provide first component unique identification data when the first component identification data is expected.

Abstract translation: 公开了一种基板处理系统中的部件管理方法。 衬底处理系统具有一组组件，该组组件中的至少多个组件被指定为智能组件，多个组件的每个组件具有智能组件增强（ICE）。 该方法包括查询多个组件以从它们各自的ICE请求它们各自的唯一标识数据。 该方法还包括如果多个组件中的任何组件响应于查询，则从多个组件接收唯一的标识数据。 该方法另外包括：如果在预期第一组件识别数据时多个组件的第一组件不能提供第一组件唯一标识数据，则标记第一组件以用于校正动作。

公开(公告)号：WO2008042578A3

公开(公告)日：2008-06-19

申请号：PCT/US2007078574

申请日：2007-09-14

Applicant: LAM RES CORP ,  HUANG CHUNG-HO ,  SETO JACKIE ,  BRIGHT NICOLAS

Inventor： HUANG CHUNG-HO ,  SETO JACKIE ,  BRIGHT NICOLAS

IPC: H01L21/00

CPC classification number: H01J37/3299 ,  H01J37/32935

Abstract: In a plasma processing system., a method for dynamically establishing a baseline is provided. The method includes processing a first substrate The method also includes collecting a first signal data for the first substrate. The method further includes comparing the first signal data against the baseline The method moreover includes including the first signal data in a recalculation of the baseline if the fust signal data is within a confidence level range, which is in between a top level above the baseline and a bottom level below the baseline.

Abstract translation: 在等离子体处理系统中，提供了用于动态建立基线的方法。 该方法包括处理第一衬底。该方法还包括收集第一衬底的第一信号数据。 该方法还包括将第一信号数据与基线进行比较。该方法还包括如果第四信号数据处于置于基线以上的最高电平和第二信号数据之间的置信水平范围内的基线的重新计算中， 底线以下的底部水平。

公开(公告)号：WO2008017050A9

公开(公告)日：2008-03-20

申请号：PCT/US2007075113

申请日：2007-08-02

Applicant: LAM RES CORP ,  BENJAMIN NEIL ,  GOTTSCHO RICHARD ALAN ,  BRIGHT NICOLAS ,  STEGER ROBERT

Inventor： BENJAMIN NEIL ,  GOTTSCHO RICHARD ALAN ,  BRIGHT NICOLAS ,  STEGER ROBERT

IPC: G06F19/00

CPC classification number: G06Q10/06 ,  G05B2219/31291 ,  G05B2219/31421 ,  G05B2219/45031 ,  Y02P90/10

Abstract: A method of component management in a substrate processing system is disclosed. The substrate processing system has a set of components, at least a plurality of components of the set of components being designated to be smart components, each component of the plurality of components having an intelligent component enhancement (ICE). The method includes querying the plurality of components to request their respective unique identification data from their respective ICEs. The method further includes receiving unique identification data from the plurality of components if any of the plurality of components responds to the querying. The method additionally includes flagging the first component for corrective action if a first component of the plurality of components fails to provide first component unique identification data when the first component identification data is expected.

Abstract translation: 公开了一种衬底处理系统中的部件管理方法。 衬底处理系统具有一组组件，该组组件中的至少多个组件被指定为智能组件，该多个组件中的每个组件具有智能组件增强（ICE）。 该方法包括查询多个组件以从它们各自的ICE请求它们各自的唯一标识数据。 该方法还包括如果多个组件中的任何组件响应于查询，则从多个组件接收唯一标识数据。 该方法还包括如果多个部件中的第一部件在预期第一部件识别数据时未能提供第一部件唯一识别数据，则标记第一部件以进行纠正动作。

公开(公告)号：WO2004027411A8

公开(公告)日：2004-07-29

申请号：PCT/US0328433

申请日：2003-09-10

Applicant: LAM RES CORP

Inventor： GOTKIS YEHIEL ,  OWCZARZ ALEKSANDER ,  HEMKER DAVID ,  BRIGHT NICOLAS ,  KISTLER RODNEY

IPC: B24B37/04 ,  B24B49/02 ,  B24B49/10 ,  H01L21/321 ,  H01L21/66 ,  G01N27/72

CPC classification number: B24B37/042 ,  B24B49/02 ,  B24B49/10 ,  H01L21/3212 ,  H01L22/00

Abstract: A system and method of measuring a metallic layer on a substrate within a multi-step substrate process includes modifying a metallic layer on the substrate such as forming a metallic layer or removing at least a portion of the metallic layer. At least one sensor is positioned a predetermined distance from the surface of the substrate. The surface of the substrate is mapped to determine a uniformity of the metallic layer on the surface of the substrate.

Abstract translation: 在多步骤衬底工艺中测量衬底上的金属层的系统和方法包括改变衬底上的金属层，例如形成金属层或去除金属层的至少一部分。 至少一个传感器被定位在离基板表面预定距离处。 映射衬底的表面以确定衬底表面上的金属层的均匀性。

公开(公告)号：WO2006121741A3

公开(公告)日：2007-02-15

申请号：PCT/US2006017067

申请日：2006-05-02

Applicant: LAM RES CORP ,  SADJADI S M REZA ,  BRIGHT NICOLAS

Inventor： SADJADI S M REZA ,  BRIGHT NICOLAS

IPC: G03F1/14

CPC classification number: G03F1/36

Abstract: An apparatus comprising computer readable media is provided. The computer readable media comprises computer readable code for receiving a feature layout and computer readable code for applying shrink correction on the feature layout. The computer readable code for applying the shrink correction comprises providing corner cutouts, adjusting line width and length, shape modifications, etc. for forming features in a patterned layer.

Abstract translation: 提供了一种包括计算机可读介质的装置。 计算机可读介质包括用于接收特征布局的计算机可读代码和用于在特征布局上应用收缩校正的计算机可读代码。 用于施加收缩校正的计算机可读代码包括提供拐角切口，调整线宽和长度，形状修改等，以形成图案化层中的特征。

公开(公告)号：WO0137311A3

公开(公告)日：2001-10-11

申请号：PCT/US0042158

申请日：2000-11-14

Applicant: LAM RES CORP ,  BAILEY ANDREW D III ,  SCHOEPP ALAN M ,  BRIGHT NICOLAS

Inventor： BAILEY ANDREW D III ,  SCHOEPP ALAN M ,  BRIGHT NICOLAS

IPC: H05H1/46 ,  C23C16/507 ,  H01J37/32 ,  H01L21/205 ,  H01L21/3065

CPC classification number: H01J37/32623 ,  H01J37/32688

Abstract: A plasma confinement arrangement for controlling the volume of a plasma while processing a substrate inside a process chamber using a plasma enhanced process is disclosed. The arrangement includes a first magnetic bucket having a plurality of first magnetic elements. The first magnetic elements being configured for producing a first magnetic field inside the process chamber. The arrangement further includes a second magnetic bucket having a plurality of second magnetic elements. The second magnetic elements being configured for producing a second magnetic field inside the process chamber. The second magnetic field being configured to combine with the first magnetic field to produce a resultant magnetic field between the first magnetic bucket and the second magnetic bucket. The resultant magnetic field being configured to permit by-product gas from the processing to pass through while substantially confining the plasma within a volume defined at least by the process chamber and the resultant magnetic field.

Abstract translation: 公开了一种等离子体限制装置，用于在使用等离子体增强过程处理处理室内的衬底的同时控制等离子体的体积。 该装置包括具有多个第一磁性元件的第一磁性桶。 第一磁性元件被配置用于在处理室内产生第一磁场。 该装置还包括具有多个第二磁性元件的第二磁性桶。 第二磁性元件构造成用于在处理室内产生第二磁场。 第二磁场被配置为与第一磁场组合以在第一磁性铲斗和第二磁性铲斗之间产生合成的磁场。 所得到的磁场被配置为允许来自处理的副产物气体通过，同时基本上将等离子体限制在至少由处理室限定的体积和所得的磁场中。

公开(公告)号：AT373193T

公开(公告)日：2007-09-15

申请号：AT00914757

申请日：2000-02-29

Applicant: LAM RES CORP

Inventor： KROEKER TONY ,  MOORING BENJAMIN ,  BRIGHT NICOLAS

IPC: F16K51/02 ,  F16K3/18 ,  H01L21/00 ,  H01L21/677

Abstract: A dual sided slot valve is in a vacuum body between adjacent process and transport modules. Separate valves are provided for each of two valve body slots, one body slot being separately closed or opened independently of the other. The separate valves allow a vacuum in the transport module while an adjacent process module is open to the atmosphere for servicing. The valve allows access to an open valve for servicing the open valve in that one actuator motor stops the valve in an open, but not vertically-spaced, position relative to the respective slot. The open valve is more easily reached by a gloved hand of a service worker. A separate actuator motor moves the valve vertically down from the open position and away from the slot to expose the sealing surface around the slot for cleaning. The vertical distance of the vertically-moved valve from an access opening makes it difficult for the worker's glove to reach the valve for service. However, in the vertically-moved position the valve does not interfere with the ability to clean around the valve door. The dual sided slot valves are offset relative to each other to reduce the distance occupied by the valve body between the adjacent transport and process modules.