公开(公告)号：WO2005020264A2

公开(公告)日：2005-03-03

申请号：PCT/US2004027064

申请日：2004-08-20

Applicant: LAM RES CORP ,  DHINDSA RAJINDER ,  SADJADI REZA S M ,  KOZAKEVICH FELIX ,  TRUSSELL DAVE ,  LI LUMIN ,  LENZ ERIC ,  RUSU CAMELIA ,  SRINIVASAN MUKUND ,  EPPLER AARON ,  TIETZ JIM ,  MARKS JEFFREY

Inventor： DHINDSA RAJINDER ,  SADJADI REZA S M ,  KOZAKEVICH FELIX ,  TRUSSELL DAVE ,  LI LUMIN ,  LENZ ERIC ,  RUSU CAMELIA ,  SRINIVASAN MUKUND ,  EPPLER AARON ,  TIETZ JIM ,  MARKS JEFFREY

IPC: H01J37/32 ,  H01J

CPC classification number: H01J37/32174 ,  H01J37/32082 ,  H01J37/32165

Abstract: A workpiece is processed with a plasma in a vacuum plasma processing chamber by exciting the plasma at several frequencies such that the excitation of the plasma by the several frequencies simultaneously causes several different phenomena to occur in the plasma. The chamber includes central top and bottom electrodes and a peripheral top and/or bottom electrode arrangement that is either powered by RF or is connected to a reference potential by a filter arrangement that passes at least one of the plasma excitation ftequencies to the exclusion of other frequencies.

Abstract translation: 通过以几个频率激发等离子体，在真空等离子体处理室中用等离子体处理工件，使得等离子体被几个频率激发同时导致在等离子体中发生几种不同的现象。 腔室包括中心顶部和底部电极以及由RF供电的外围顶部和/或底部电极装置，或者通过将至少一个等离子体激发频率传递到排除另一个等离子体激发频率的滤波器装置连接到参考电位 频率。

公开(公告)号：WO2007078572A3

公开(公告)日：2009-02-05

申请号：PCT/US2006046780

申请日：2006-12-08

Applicant: LAM RES CORP ,  DHINDSA RAJINDER ,  KOZAKEVICH FELIX ,  LI LUMIN ,  TRUSSELL DAVE

Inventor： DHINDSA RAJINDER ,  KOZAKEVICH FELIX ,  LI LUMIN ,  TRUSSELL DAVE

IPC: H01L21/683

CPC classification number: H01J37/32082 ,  H01J37/32174

Abstract: A number of RF power transmission paths are defined to extend from an RF power source through a matching network, through a transmit electrode, through a plasma to a number of return electrodes. A number of tuning elements are respectively disposed within the number of RF power transmission paths. Each tuning element is defined to adjust an amount of RF power to be transmitted through the RF power transmission path within which the tuning element is disposed. A plasma density within a vicinity of a particular RF power transmission path is directly proportional to the amount of RF power transmitted through the particular RF power transmission path. Therefore, adjustment of RF power transmitted through the RF power transmission paths, as afforded by the tuning element, enables control of a plasma density profile across a substrate.

Abstract translation: 多个RF功率传输路径被定义为从RF电源通过匹配网络，通过发射电极，等离子体延伸到多个返回电极。 多个调谐元件分别设置在RF功率传输路径的数量内。 每个调谐元件被定义为调整要通过设置调谐元件的RF功率传输路径传输的RF功率的量。 特定RF功率传输路径附近的等离子体密度与通过特定RF功率传输路径传输的RF功率的量成正比。 因此，由调谐元件提供的通过RF功率传输路径传输的RF功率的调整能够控制跨越衬底的等离子体密度分布。

公开(公告)号：WO2005119731A3

公开(公告)日：2006-05-26

申请号：PCT/US2005018094

申请日：2005-05-25

Applicant: LAM RES CORP ,  DHINDSA RAJINDER ,  KOZAKEVICH FELIX ,  TRUSSELL DAVE

Inventor： DHINDSA RAJINDER ,  KOZAKEVICH FELIX ,  TRUSSELL DAVE

IPC: H01J37/32

CPC classification number: H01J37/32174 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/32935 ,  H01J37/3299

Abstract: A plasma processor chamber includes a bottom electrode and a top electrode assembly having a center electrode surrounded by a grounded electrode. RF excited plasma between the electrodes induces a DC bias on them. A measure of the bottom electrode DC bias controls the capacitance of a first series resonant circuit connected between the center electrode and ground. A measure of the center electrode DC bias controls the capacitance of a second series resonant circuit connected between the bottom electrode and ground.

Abstract translation: 等离子体处理器室包括底电极和顶电极组件，其具有被接地电极包围的中心电极。 电极之间的RF激发等离子体在其上引起DC偏压。 底部电极直流偏置的测量控制连接在中心电极和地之间的第一串联谐振电路的电容。 中心电极直流偏压的测量控制连接在底电极和地之间的第二串联谐振电路的电容。

公开(公告)号：EP1661171A4

公开(公告)日：2009-03-11

申请号：EP04781695

申请日：2004-08-20

Applicant: LAM RES CORP

Inventor： DHINDSA RAJINDER ,  SADJADI REZA S M ,  KOZAKEVICH FELIX ,  TRUSSELL DAVE ,  LI LUMIN ,  LENZ ERIC ,  RUSU CAMELIA ,  SRINIVASAN MUKUND ,  EPPLER AARON ,  TIETZ JIM ,  MARKS JEFFREY

IPC: H01J37/32 ,  B23B3/10 ,  H01L21/311 ,  H01L21/467 ,  H05H1/46

CPC classification number: H01J37/32174 ,  H01J37/32082 ,  H01J37/32165

Abstract: A workpiece (18) is processed with a plasma (8) in a vacuum plasma processing chamber (10) by exciting the plasma at several frequencies (51, 52, 54, 56, 58), such that the excitation of the plasma by the several frequencies simultaneously causes several different phenomena to occur in the plasma. The chamber includes top central (14, 36, 36a) and bottom electrodes (13, 16) and a peripheral top (42) and/or bottom electrode (34) arrangement that is either powered by RF or is connected to a reference potential by a filter arrangement that passes at least one of the plasma excitation ftequencies to the exclusion of other frequencies. Controller 24 is employed to direct parameter control of various motors (M), valves (V), frequencies (58), power (59), temperature control means (25, 45) and set points (50).

公开(公告)号：SG133600A1

公开(公告)日：2007-07-30

申请号：SG2007045271

申请日：2004-08-20

Applicant: LAM RES CORP US

Inventor： DHINDSA RAJINDER ,  SADJADI REZA S M ,  KOZAKEVICH FELIX ,  TRUSSELL DAVE ,  LI LUMIN ,  LENZ ERIC ,  RUSU CAMELIA ,  SRINIVASAN MUKUND ,  EPPLER AARON ,  TIETZ JIM ,  MARKS JEFFREY

IPC: H01J37/32

Abstract: A method of processing a workpiece (18) with a plasma in a vacuum plasma processing chamber (10) having a bottom electrode (13) below the workpiece, comprising the step of exciting a plasma with electric energy at several frequencies, i.e. three or more, such that the excitation of the plasma by applying energy at the several frequencies simultaneously causes several different phenomena to occur in the plasma, wherein the phenomena affct plasma ion energy, plasma ion densityand plasma chemistry. An apparatus for carrying out this method comprises an electric energy source arrangement (51) for supplying the several frequencies (F1, F2, F3) to the bottom electrode.